Optically absorptive material for alignment marks

1. An imprint lithography template for patterning formable material positioned on a substrate comprising:

a body having a first side and a second side;

a mold having a patterned surface, the mold positioned on the first side of the body, the patterned surface having a feature area defining a first pattern;

a template alignment mark formed in the patterned surface outside of the feature area, the template alignment mark having a plurality of features that include a highly optically absorptive material having an extinction coefficient k value greater than 2.8 at 600 nm.

2. The template of claim 1 wherein the highly absorptive material absorbs at least 60% of incident light.

3. The template of claim 2 wherein the incident light is from 500 to 800 nm.

4. The template of claim 3 wherein the highly absorptive material transmits ultraviolet (UV) radiation.

5. The template of claim 4 wherein the highly absorptive material has an extinction coefficient k value greater than 3.3 at 600 nm.

6. The template of claim 1 wherein the template alignment mark features include a plurality of recessions with the highly absorptive material located in the recessions.

7. The template of claim 1 wherein the highly absorptive material further comprises aluminum (Al), aluminum alloys including Al x Si y , Al x Si y Ti z , Al x Cu y , AlxCr y ; rhodium (Rh), chromium (Cr), iridium (Ir), niobium (Nb), titanium (Ti); nickel (Ni), palladium (Pd), platinum (Pt), silver (Ag), gold (Au), copper (Cu), or iron (Fe).

8. The template of claim 1 wherein the highly absorptive material further comprises aluminum (Al), rhodium (Rh), chromium (Cr), or niobium (Nb).

9. The template of claim 1 wherein the highly absorptive material further comprises aluminum (Al).