Imprint lithography system and method
View Patent ↗System, method and process for imprinting a substrate using controlled deformation of a substrate and/or a template. The substrate and/or template may be positioned in single wave formation or double wave formation during an imprint lithography process.
1. An apparatus, comprising:
a vacuum chuck adapted to support a substrate, the vacuum chuck having:
an outer land adapted to support an outer diameter of the substrate, the outer land having a first height; and,
an inner land spaced apart from the outer land and adapted to support an inner diameter of the substrate, the inner land having a second height less than the first height of the outer land;
wherein the first height and the second height are determined to provide a retained substrate in a single wave formation and to provide a biasing of vacuum force towards the outer diameter of the substrate.
2. The apparatus of claim 1 , further comprising a template chuck adapted to support an imprint lithography template, the template chuck having a plurality of lands and throughways forming chambers.
3. The apparatus of claim 2 , wherein at least one chamber provides pressure to the imprint lithography template and at least one chamber provides vacuum to the imprint lithography template.
4. The apparatus of claim 3 , wherein the chambers are adapted to provide the imprint lithography template in a single wave formation.
5. The apparatus of claim 3 , wherein the chambers are adapted to provide the imprint lithography template in a double wave formation.
6. The apparatus of claim 1 , wherein the outer land is tapered.
7. The apparatus of claim 1 , further comprising a holding system providing a force to the outer diameter of the substrate.
8. The apparatus of claim 7 , wherein the holding system includes a contact head having a chamfered edge, the chamfered edge contacting the outer diameter of the substrate.
9. An apparatus for holding a substrate having a chamfered edge angled relative to its surface, comprising:
a holding system adapted to secure the chamfered edge of the substrate, the holding system having a body and a contact head connected to the body and adapted to provide a force to constrain a substrate at its periphery, the contact head having at least one surface positioned at an obtuse angle relative the body such that the surface aligns with and engages the chamfered edge of the substrate thereby avoiding interference of the holding system with the substrate surface.
10. The apparatus of claim 9 , further comprising a base adjustably attached to the body, the base providing radial motion of the body about one or more axes.
11. The apparatus of claim 10 , wherein the motion range of the body about the base may be between approximately 50 microns and 1 mm.
12. The apparatus of claim 1 wherein the first height is greater than the second height.
13. The apparatus of claim 1 further comprising a first recess between the inner and outer lands.
14. The apparatus of claim 13 wherein the inner land further defines a second recess.
15. The apparatus of claim 9 further comprising a substrate chuck adapted to support the substrate.
16. The apparatus of claim 10 wherein the base is adjustably attached to the body by a preloaded air bearing.