Micromachined assembly with a multi-layer cap defining a cavity
View Patent ↗This invention comprises a process for fabricating a micro mechanical structure in a sealed cavity having a multi-layer high stiffness cap. The high stiffness material used for the cap protects the underlying microstructure from destructive environmental forces inherent in the packaging process and from environmental damage.
1. A MEM device comprising:
a substrate;
a microstructure formed on said substrate; and
a high-stiffness thin-film cap structure forming at least one wall of a sealed cavity encapsulating said microstructure, having a thickness between about 5 and 50 μm, and a Young's modulus of at least about 80 GPa.
2. The MEMS device of claim 1 , wherein the thin-film cap structure comprises a cap layer and a cap over-layer including one or more additional layers of high-stiffness material.
3. The MEMS device of claim 2 , wherein the cap layer comprises a high-stiffness material deposited in the presence of a first bias voltage.
4. The MEMS device of claim 2 , wherein a first layer of the one or more additional layers of the cap over-layer comprises a high-stiffness material deposited in the absence of a bias voltage.
5. The MEMS device of claim 2 , wherein a second layer of the one or more additional layer of the cap over-layer comprises a high-stiffness material deposited in the presence of a second bias voltage, the thin-film cap structure constructed using thin-film deposition technologies.
6. The MEMS device of claim 1 further comprising an outer seal layer, said outer seal layer covering the outermost layer of high-stiffness cap structure.
7. The MEMS device of claim 1 wherein said high-stiffness material is selected from a group consisting of ionic bonded materials, covalently bonded material and or mixed ionic and covalently bonded materials.
8. The MEMS device of claim 1 wherein said one or more layers of high-stiffness material can withstand pressures above 600 psi and temperatures up to 300degrees C. when the total thickness of all deposited layers is less than approximately 50 microns.
9. The MEMS device of claim 1 wherein said one or more layers of high-stiffness material can withstand a uniform pressure of unto 60 atmospheres without deflecting more than one micron from its original position.