IP Library Granted Patent US 7,061,627
Granted Patent B2
US 7,061,627 · App. 10/385,863 · Granted Jun 13, 2006

Optical scatterometry of asymmetric lines and structures

Assignee: Therma-Wave, Inc.
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Quick Facts
Patent No.
US 7,061,627
App. No.
10/385,863
Granted
Jun 13, 2006
Kind
B2
Abstract

A method for analyzing asymmetric structures (including isolated and periodic structures) includes a split detector for use in a broadband spectrometer. The split has detector has separate right and left halves. By independently measuring and comparing the right and left scattered rays, information about asymmetries can be determined.

Claims (36)

1. A method of optically inspecting and evaluating a subject including a potentially asymmetric structure, the method comprising:

(a) directing an optical beam to be reflected by the subject;

(b) measuring light reflected by the potentially asymmetric structure at two detector locations where the two detector locations are chosen to detect asymmetries in the reflected optical beam; and

(c) analyzing the measurements made in step b to obtain information about a direction of asymmetry of the potentially asymmetric structure.

2. A method as recited in claim 1 , which further comprises:

(d) separately measuring light that is specularly and non-specularly reflected by the potentially asymmetric structure; and

(e) analyzing the measurements made in steps d to obtain information about the direction of asymmetry of the potentially asymmetric structure.

3. A method of optically inspecting and evaluating a subject including a potentially asymmetric structure, the method comprising:

(a) directing an optical beam to be reflected by the subject;

(b) separately measuring light that is specularly and non-specularly reflected by the potentially asymmetric structure; and

(c) analyzing the measurements made in step b to obtain information about a direction of asymmetry of the potentially asymmetric structure.

4. A method as recited in claim 3 , which further comprises:

(d) measuring light reflected by the potentially asymmetric structure at two detector locations where the two detector locations are chosen to detect asymmetries in the reflected optical beam; and

(e) analyzing the measurements made in step d to obtain information about the direction of asymmetry of the potentially asymmetric structure.

5. An apparatus for evaluating asymmetric line structures on a sample comprising:

a source of light for generating a probe beam;

optics for focusing the beam on the line structure on the sample;

a detector having a least two independent sensor regions and oriented to detect asymmetries in the reflection and scattering of the probe beam light from the sample, each sensor region generating output signals; and

a processor for evaluating a direction of asymmetry in the geometry of the sample based on the output signals.

6. An apparatus for evaluating asymmetric line structures on a sample comprising:

a source of light for generating a probe beam;

optics for focusing the beam on the line structure on the sample;

a detector having a least two independent sensor regions and oriented to detect asymmetries in the reflection and scattering of the probe beam light from the sample, each sensor region generating output signals; and

a processor for evaluating the asymmetries in the geometry of the sample based on the output signals;

wherein the detector includes a split detector having two halves and oriented to monitor radial asymmetries in the reflected probe beam.

7. An apparatus for evaluating asymmetric line structures on a sample comprising:

a source of light for generating a probe beam;

optics for focusing the beam on the line structure on the sample;

a first detector positioned in the path of the specularly reflected probe beam and generating first output signals in response thereto;

a second detector positioned to measure only scattered light outside of the path of the specularly reflected beam and generating second output signals; and

a processor for evaluating a direction of asymmetry in the geometry of the sample based on the first and second output signals.

8. An apparatus for evaluating asymmetric line structures on a sample comprising:

a source of light for generating a probe beam;

optics for focusing the beam on the line structure on the sample with a spread of angles of incidence;

a pair of orthogonal related detector arrays positioned in the path of the specularly reflected probe beam and generating output signals in response thereto; and

a processor containing instructions to evaluate a direction of asymmetry in the geometry of the sample based on the output signals from the arrays.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 31, 2008
From: ROSENCWAIG, ALLAN
To: KLA-TENCOR CORP.
Reel/Frame 021328/0663 →
NOTICE OF OWNERSHIP INTEREST Recorded Sep 27, 2004
From: ROSENCWAIG, ALLAN
To: THERMA-WAVE, INC.
Reel/Frame 015823/0202 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 26, 2003
From: OPSAL, JON
To: THERMA-WAVE, INC.
Reel/Frame 014207/0069 →
Continuity (2)
Provisional Application 6036415400 · Mar 13, 2002
Related Publication 20050041258A1 · Feb 24, 2005