Multi-face forming mask device for vacuum deposition
A second metal mask ( 13 ) having a screen part ( 13 A) provided with a plurality of parallel, fine slits ( 13 a ) arranged at very small intervals is placed on a base plate ( 12 ) serving also as a first metal mask and provided with a plurality of windows ( 18 ) defining regions in which a material is to be deposited. One end of the second metal mask ( 13 ) is fastened to the base plate ( 12 ) by a mask clamp ( 20 ) and the other end of the same is fastened to a slider ( 23 ). Resilient force is applied to the slider ( 23 ) by compression coil springs ( 30 ). Thus, the screen part ( 13 A) of the second metal mask ( 13 ) is tensioned and thereby the slits ( 13 a ) are stretched straight and are extended at predetermined pitches. A substrate ( 17 ) placed on the second mask ( 13 ) is subjected to a vacuum evaporation process to form fine patterns on the substrate ( 17 ) in a gang-patterning mode.
1. A gang-patterning mask device for vacuum evaporation having a plurality of affective mask parts arranged on longitudinal and transverse rows, said gang-patterning mask device comprising:
a first mask provided with a plurality of windows; and
a second mask placed on the first mask and having a screen part provided with a plurality of fine slits extending a longitudinal direction;
wherein the screen part of the second mask is formed in an entire region in a transverse direction covering at least all the windows, and
the screen part and the windows define the effective mask parts.
2. The gang-patterning mask device for vacuum evaporation according to claim 1 , wherein
the second mask has a pair of support parts on the transversely opposite sides, respectively, of the screen part.
3. The gang-patterning mask device for vacuum evaporation according to claim 1 , wherein
the windows of the first mask is formed in a shape corresponding to that of the effective mask parts, and the screen part of the second mask extends in a longitudinal direction across the plurality of windows.
4. The gang-patterning mask device for vacuum evaporation according to claim 3 , wherein
the first mask functions as a base plate, and a stretching-and-holding means for longitudinally stretching and holding the second mask is provided on the base plate.
5. The gang-patterning mask device for vacuum evaporation according to claim 4 , wherein
the stretching-and-holding moans includes a slider capable of holding an end part of the second mask and of moving relative to the base plate, and
a moving means for moving the slider relative away from the base plate.
6. The gang-patterning mask device for vacuum evaporation according to claim 5 , wherein
the moving means is an elastic means capable of exerting resilient force.
7. The gang-patterning mask device for vacuum evaporation according to claim 3 , wherein
the first mask is placed on a base plate provided with an opening, and a stretching-and-holding means for longitudinally stretching and holding the second mask is provided on into the base plate.
8. The gang-patterning mask device for vacuum evaporation according to claim 7 , wherein
the opening of the base plate extends over all the windows of the first mask.
9. The gang-patterning mask device for vacuum evaporation according to claim 7 , wherein
the base plate is provided with a plurality of openings extending in a transverse direction, and the openings have a longitudinal length corresponding to that of the windows of the first mask.
10. The gang-patterning mask device for vacuum evaporation according to claim 1 , wherein
the second mask is provided with a plurality of screen parts, and the plurality of screen parts are arranged longitudinally at predetermined intervals.
11. The gang-patterning mask device for vacuum evaporation according to claim 10 , wherein
the screen parts of the second mask have a longitudinal length corresponding to that of the effective mask parts.
12. The gang-patterning mask device for vacuum evaporation according to claim 10 , wherein
the windows of the first mask are formed in a shape corresponding to that of the effective mask parts.
13. The gang-patterning mask device for vacuum evaporation according to claim 10 , wherein
each of the windows of the first mask extends longitudinally across the plurality of effective mask parts.
14. The gang-patterning mask device for vacuum evaporation according to claim 10 , wherein
the first mask functions as a base plate, and a stretching-and-holding means for longitudinally stretching and holding the second mask is provided on the base plate.
15. The gang-patterning mask device for vacuum evaporation according to claim 14 , wherein
the stretching-and-holding means includes a slider capable of holding an end part of the second mask and of moving relative to the base plate, and a moving means for moving the slider away from the base plate.
16. The gang-patterning mask device for vacuum evaporation according to claim 15 , wherein
the moving means is an elastic means capable of exerting resilient force.
17. The gang-patterning mask device for vacuum evaporation according to claim 10 , wherein
the first mask is placed on a base plate provided with an opening, and a stretching-and-holding means for longitudinally stretching and holding the second mask is provided on the base plate.
18. The gang-patterning mask device for vacuum evaporation according to claim 17 , wherein
the opening of the base plate extends over all the windows of the first mask.
19. The gang-patterning mask device for vacuum evaporation according to claim 17 , wherein
the base plate is provided with a plurality of openings extending in a transverse direction, and each opening has a longitudinal length corresponding to that of the windows of the first mask.
20. The gang-patterning mask device for vacuum evaporation according to claim 17 , wherein
the base plate has marginal parts at longitudinally opposite ends to which the second mask is fixed in its a transverse slit is formed on the inner side of one of marginal parts, and the marginal part adjacent to the slit is distorted inward beforehand to hold the second mask in a longitudinally stretched state.
21. The gang-patterning mask device for vacuum evaporation according to claim 20 , wherein
longitudinal notches are formed at the opposite ends of the slit, respectively.