IP Library Granted Patent US 6,939,778
Granted Patent B2
US 6,939,778 · App. 10/417,299 · Granted Sep 6, 2005

Method of joining an insulator element to a substrate

Assignee: The Regents of the University of Michigan
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Quick Facts
Patent No.
US 6,939,778
App. No.
10/417,299
Granted
Sep 6, 2005
Kind
B2
Abstract

Bonding methods and articles produced thereby are provided wherein an insulator, such as glass, is bonded to a solder with the assistance of an electric field.

Claims (15)

1. A method of joining an insulator element to a substrate with a molten solder therebetween, the method comprising:

migrating ions in the insulator element towards a bond interface with a molten solder to oxidize a component of the molten solder to form a chemical bond between the insulator element and the molten solder.

2. The method as claimed in claim 1 wherein the insulator element is a glass element.

3. The method as claimed in claim 2 , wherein the substrate is a silicon substrate.

4. The method as claimed in claim 1 , wherein the component of the solder is silicon.

5. The method as claimed in claim 4 , further comprising placing a source of silicon in close surface contact with the solder to provide a silicon component of the solder.

6. The method as claimed in claim 5 , wherein the substrate is a silicon substrate and the source of silicon is the silicon substrate.

7. The method as claimed in claim 5 , wherein the source of silicon is a polysilicon layer between the insulator and the substrate.

8. The method as claimed in claim 4 , wherein the solder is a silicon-gold solder.

9. The method as claimed in claim 1 , wherein the insulator element is a glass wafer and the substrate is a silicon wafer.

10. The method as claimed in claim 1 , further comprising placing a source of silicon in close surface contact with a layer of metal between the insulator element and the substrate and heating the source of silicon and the layer of metal until silicon from the source alloys with the metal to form the solder.

11. The method as claimed in claim 10 , wherein the substrate is a silicon substrate and the source of silicon is the silicon substrate.

12. The method as claimed in claim 10 , wherein the source of silicon is a polysilicon layer between the substrate and the insulator element.

13. The method as claimed in claim 1 , further comprising forming feedthroughs on the substrate.

14. A method as claimed in claim 1 , wherein the molten solder is a molten eutectic solder.

Assignments (2)
CONFIRMATORY LICENSE Recorded May 19, 2011
From: UNIVERSITY OF MICHIGAN
To: NATIONAL SCIENCE FOUNDATION
Reel/Frame 026307/0194 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 30, 2003
From: HARPSTER, TIMOTHY J.; NAJAFI, KHALIL
To: REGENTS OF THE UNIVERSITY OF MICHIGAN, THE
Reel/Frame 014216/0591 →
Continuity (2)
Provisional Application 6037342500 · Apr 18, 2002
Related Publication 20040029336A1 · Feb 12, 2004