Anti-reflective coating conformality control
View Patent ↗A method for forming an anti-reflective coating on a semiconductor substrate, including providing a first vessel containing an anti-reflective coating component and a second vessel containing a solvent. The anti-reflective coating component from the first vessel and the solvent from the second vessel are supplied to a mixing chamber. The anti-reflective coating component and the solvent are mixed in the mixing chamber to form a product. The product is transferred to the semiconductor substrate. The product is applied to the semiconductor substrate to form the anti-reflective coating. A system for forming an anti-reflective coating on a semiconductor substrate, including a first vessel for containing an anti-reflective coating component and a second vessel for containing a solvent. The system also includes a mixing chamber for mixing the anti-reflective coating component with the solvent to form a product, and a fluid transport system connecting the mixing chamber and the substrate for supplying the product from the mixing chamber to the semiconductor substrate to form the anti-reflective coating.
1. A method for forming an anti-reflective coating on a semiconductor substrate, comprising:
providing a first vessel containing an anti-reflective coating component;
providing a second vessel containing a solvent;
supplying the anti-reflective coating component from the first vessel and the solvent from the second vessel to a mixing chamber;
mixing the anti-reflective coating component and the solvent in the mixing chamber to form a product;
transferring the product to the semiconductor substrate; and
applying the product to the semiconductor substrate to form the anti-reflective coating, wherein the anti-reflective coating is a conformal coating.
2. The method of claim 1 , wherein the anti-reflective coating has a degree of conformality and the degree of conformality is controlled by controlling a time between mixing the anti-reflective coating component and the solvent.
3. The method of claim 1 , further comprising heating the product before transferring the product to the substrate.
4. The method of claim 3 , wherein the anti-reflective coating has a degree of conformality and the degree of conformality is controlled by the heating of the product before transferring the product to the substrate.
5. The method of claim 1 , wherein the product is transferred to the semiconductor substrate by a pump.
6. The method of claim 1 , further comprising the step of aging the product to control a degree of conformality of the anti-reflective coating.
7. A method for forming an anti-reflective coating on a semiconductor substrate, comprising:
providing a first vessel containing an anti-reflective coating component;
providing a second vessel containing a solvent;
supplying the anti-reflective coating component from the first vessel and the solvent from the second vessel to a mixing chamber;
mixing the anti-reflective coating component and the solvent in the mixing chamber to form a product;
transferring the product to the semiconductor substrate; and
applying the product to the semiconductor substrate to form the anti-reflective coating, wherein the anti-reflective coating is a planarizing coating.
8. The method of claim 7 , further comprising heating the product before transferring the product to the substrate.
9. The method of claim 8 , wherein the anti-reflective coating has a degree of planarization and the degree of planarization is controlled by the heating of the product before transferring the product to the substrate.
10. The method of claim 7 , further comprising the step of aging the product to control a degree of planarization of the anti-reflective coating.
11. The method of claim 7 , wherein the product is transferred to the semiconductor substrate by a pump.
12. A system for forming an anti-reflective coating on a semiconductor substrate comprising:
a first vessel for containing an anti-reflective coating component;
a second vessel for containing a solvent;
a mixing chamber for mixing the anti-reflective coating component with the solvent to form a product; and
a fluid transport system connecting the mixing chamber and the substrate for supplying the product from the mixing chamber to the semiconductor substrate to form the anti-reflective coating.
13. The system of claim 12 , wherein the anti-reflective coating is a conformal coating.
14. The system of claim 12 , wherein the anti-reflective coating is a planarizing coating.
15. The system of claim 12 , wherein the same anti-reflective coating component and solvent is used to form the coating, wherein the coating is selected from the group of coatings consisting of planarizing and conformal anti-reflective coatings.
16. The system of claim 12 , further comprising a heat exchanger for heating the product before transferring the product to the substrate.
17. The system of claim 12 , further comprising a pump for transferring the product to the semiconductor substrate.
18. A method for forming an anti-reflective coating on a semiconductor substrate comprising:
providing an anti-reflective coating component;
providing a solvent;
mixing the anti-reflective coating component with the solvent at a ratio to form a product with a desired viscosity; and
coating the semiconductor substrate with the product to form the anti-reflective coating,
wherein the semiconductor substrate is coated with the product at a predetermined time after the product is formed.
19. The method of claim 18 , wherein the coating is a conformal coating.
20. The method of claim 18 , further comprising heating the product before coating the substrate with the product to form a planarizing coating.