Polisher and polishing method
A polisher for polishing a curved surface such as a concave surface of a spectacle lens has a structure in which a polishing pad 3 comprising water passing grooves 5 having a width W of 0.1 to 5 mm is adhered to a dome-shaped elastic base member 2 . The polishing pad 3 is composed of a plurality of pads 31 , and the water passing grooves 5 are formed at the gaps between the pads 31 , whereby the width W of the water passing grooves 5 are made small. It is effective to make the pads 31 polygonal in shape. The polishing pad 3 covers the moving region 6 of the work 8 to be polished. The polishing pad 3 is adhered through a high-tack adhesive layer 4 . A polishing method is adopted in which such a polisher 1 is used and the work 8 is polished by pressing the polishing pad 3 against the work 8 , whereby the polishing pad 3 adhered to the elastic base member 2 can be prevented from being stripped by an end edge of the work 8 , and generation of defective polish can be prevented.
1. A polisher comprising:
a polishing pad which is adhered to a surface of an elastic base member through a high-tack adhesive layer having a 180° peel strength of equal to or more than 1000 g/25 mm,
the polishing pad comprising water passing grooves having a width of 0.1 to 5 mm.
2. A polisher as set forth in claim 1 ,
wherein said polishing pad is provided with a plurality of pads, and
said water passing grooves are formed between said plurality of pads.
3. A polisher as set forth in claim 2 , wherein said pads are polygonal in shape.
4. A polisher as set forth in claim 2 , wherein said polishing pad is comprised of a pad having notch portions and pads disposed in said notch portions.
5. A polisher as set forth in claim 1 , wherein said polishing pad is provided on said elastic base member so as to cover at least the region where a work to be polished is brought into a rubbing motion during polishing of said work.
6. A polisher as set forth in claim 1 , wherein
a primer layer and/or a low-tack adhesive layer is intermediately provided between said high-tack adhesive layer and said polishing pad.
7. A polisher as set forth in claim 1 , wherein
said high-tack adhesive layer is a double-faced adhesive tape.
8. A polisher as set forth in claim 1 , wherein said elastic base member has a curved surface shape.
9. A polisher as set forth in claim 1 , wherein said elastic base member is provided with an elastic sheet.
10. A polisher wherein a polishing pad is adhered to a surface of an elastic base member through a high-tack adhesive layer having a 180° peel strength according to JIS Z 0237 of equal to or more than 1000 g/25 mm.
11. A polisher as set forth in claim 10 , wherein said polishing pad is adhered so as to cover at least the region where a work to be polished is brought into a rubbing motion during polishing of said work.
12. A polisher as set forth in claim 10 , wherein said elastic base member is comprised of an elastic sheet having a curved surface shape.
13. A polishing method comprising:
polishing a work to be polished by pressing a polishing pad of a polisher against a work surface of said work,
said polisher having said polishing pad adhered to a surface of an elastic base member through a high-tack adhesive layer having a 180° peel strength of equal to or more than 1000 g/25 mm, and
said polishing pad comprising water passing grooves having a width of 0.1 to 5 mm.
14. A polishing method as set forth in claim 13 , wherein polishing is conducted while pressing an inside surface of said elastic base member which is comprised of an elastic sheet and dome-shaped by a pressure fluid.
15. A polishing method as set forth in claim 13 , wherein said work is oscillated while said polisher and said work are rotated respectively about their axes.
16. A polishing method as set forth in claim 13 ,
wherein said polishing pad is provided with a plurality of pads, and
said water passing grooves are formed between said plurality of pads.
17. A polishing method as set forth in claim 16 , wherein said pads are polygonal in shape.
18. A polishing method as set forth in claim 16 , wherein said polishing pad is provided with a pad having notch portions and pads disposed in said notch portions.
19. A polishing method as set forth in claim 13 , wherein said polishing pad is provided on said elastic base member so as to cover at least the region where said work is brought into a rubbing motion during polishing of said work.