IP Library Granted Patent US 7,708,880
Granted Patent B2
US 7,708,880 · App. 10/477,933 · Granted May 4, 2010

Chemical liquid supply apparatus and a chemical liquid supply method

Assignee: Koganel Corporation
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Quick Facts
Patent No.
US 7,708,880
App. No.
10/477,933
Granted
May 4, 2010
Kind
B2
Abstract

A buffer tank section ( 6 ) includes a liquid accumulation chamber ( 61 ) communicating with, through a liquid introduction flow path ( 42 ), a liquid tank ( 46 ) accumulation chemical liquid. A filter section ( 4 ) includes a filter inlet ( 41 a ) and a filter outlet ( 41 b ), wherein the filter inlet ( 41 a ) communicates with a liquid discharge vent ( 60 d ) of the buffer tank section ( 6 ). In a pump ( 11 ), a pump inlet ( 11 a ) is connected to the filter outlet ( 41 b ) and a pump outlet ( 11 b ) is connected to a discharge nozzle ( 50 ) through a liquid discharge flow path ( 47 ). A return flow path ( 48 ) is connected between the pump outlet ( 11 b ) and the buffer tank section ( 6 ), wherein the chemical liquid, discharged from the pump ( 11 ), is returned to the liquid accumulation chamber ( 61 ). An exhaust flow path ( 49 ) is connected to the buffer tank section ( 6 ), thereby exhausting air in the liquid accumulation chamber ( 61 ).

Claims (9)

1. A chemical liquid supply apparatus comprising:

a liquid tank accommodating chemical liquid;

a closed buffer tank section having a ceiling wall and a bottom wall enclosing therebetween a liquid accumulation chamber, which is connected to said liquid tank through a liquid introduction flow path connected through said ceiling wall, a liquid discharge vent being connected to said liquid accumulation chamber through said bottom wall;

a filter section having a filter inlet connected with said liquid discharge vent of said buffer tank section, and a filter outlet;

a pump having a pump inlet connected to said filter outlet through a pump inlet-side flow path and a pump outlet connected to a liquid discharge flow path to which a discharge nozzle is connected, an expandable and contractible pump chamber being provided in said pump;

a return flow path connected between said pump outlet and said buffer tank section for returning, to said liquid accumulation chamber, the chemical liquid discharged from said pump; and

a valved exhaust flow path connected through said ceiling wall of said buffer tank section for exhausting air from said liquid accumulation chamber,

wherein under conditions where said liquid introduction flow path, pump inlet-side flow path, and liquid discharge flow path are closed, and where said return flow path and said exhaust flow path are opened, gas contained in said liquid accumulation chamber is exhausted via said exhaust flow path by contracting said pump chamber and returning the chemical liquid to said liquid accumulation chamber through said return flow path.

2. The chemical liquid supply apparatus according to claim 1 , further comprising an exhaust flow path connected to said filter section for exhausting gas contained in said filter section.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 14, 2003
From: YAJIMA, TAKEO
To: KOGANEI CORPORATION
Reel/Frame 015152/0919 →
Priority Claims (1)
JP 2001-401216 · Dec 28, 2001 · national
Continuity (1)
Related Publication 20040144736A1 · Jul 29, 2004