Cleaning gas and etching gas
View Patent ↗A chamber-cleaning gas and an etching gas used for a silicon-containing film according to the present invention comprise a perfluoro cyclic ether having 2 to 4 carbon atoms which are ether-linked with carbon atoms. The chamber-cleaning gas and the etching gas hardly generate a harmful waste gas, such as CF 4 , which is one of the causes for global warming so that they are good for environment. Further, they are a non-toxic gas or a volatile liquid, and are easy to use and are excellent in treatment of waste gas. Additionally, the chamber-cleaning gas of the present invention has an excellent cleaning rate.
1. A chamber-cleaning gas comprising a perfluoro cyclic ether having 2 to 4 oxygen atoms which are ether-linked with carbon atoms, O 2 and optionally another gas,
wherein a molar ratio of the perfluoro cyclic ether to O 2 (perfluoro cyclic ether/O 2 ) satisfies the formula:
0.1≦perfluoro cyclic ether/O 2 ≦9.
2. The chamber-cleaning gas as claimed in claim 1 , wherein the perfluoro cyclic ether is represented by the following formula (1):
in which m is an integer of 0 to 2 and n is an integer of 0 to 3, provided that m and n are not simultaneously zero, they are not simultaneously m=0 and n=1, they are not simultaneously m=1 and n=0, and they are not simultaneously m=2 and n=3.
3. The chamber-cleaning gas as claimed in claim 1 , wherein the perfluoro cyclic ether is a cyclic ether having a five- to eight-membered ring.
4. The chamber-cleaning gas as claimed in claim 1 , wherein the total amount of the perfluoro cyclic ether and O 2 is 10 to 100 mol % based on 100 mol % of the total gas amount.
5. The chamber-cleaning gas as claimed in claim 4 , wherein the total amount of the perfluoro cyclic ether and O 2 is 70 to 100 mol % based on 100 mol % of the total gas amount.
6. The chamber-cleaning gas as claimed in claim 1 , wherein the molar ratio of the perfluoro cyclic ether to O 2 (perfluoro cyclic ether/O 2 ) satisfies the formula:
0.10≦perfluoro cyclic ether/O 2 ≦6.
7. The chamber-cleaning gas as claimed in claim 1 , wherein the perfluoro cyclic ether is at least one compound selected from the group consisting of perfluoro-1,3-dioxolane (c-C 3 F 6 O 2 ), perfluoro-1,4-dioxane (c-C 4 F 8 O 2 ) and perfluoro-1,3,5-trioxane (c-C 3 F 6 O 3 ).
8. The chamber-cleaning gas as claimed in claim 1 , wherein the other gas comprises at least one inert gas selected from the group consisting of N 2 , He, Ne, Ar, Kr, Xe and Rn.
9. The chamber-cleaning gas as claimed in claim 1 , which is used for cleaning a chamber of a CVD apparatus.
10. The chamber-cleaning gas as claimed in claim 1 , which is used for removing a silicon-containing deposit.
11. The chamber-cleaning gas as claimed in claim 10 , wherein the silicon-containing deposit comprises at least one compound selected from the group consisting of:
(1) silicon;
(2) a compound comprising silicon and at least one element of oxygen, nitrogen, fluorine and carbon; and
(3) a compound comprising a metal silicide with high melting point.
12. An etching gas used for a silicon-containing film comprising a perfluoro cyclic ether having 2 to 4 oxygen atoms which are ether-linked with carbon atoms, O 2 and optionally another gas,
wherein a molar ratio of the perfluoro cyclic ether to O 2 (perfluoro cyclic ether/O 2 ) satisfies the formula:
0.1≦perfluoro cyclic ether/O 2 ≦9.
13. The etching gas used for a silicon-containing film as claimed in claim 12 , wherein the perfluoro cyclic ether is represented by the formula (1):
in which m is an integer of 0 to 2 and n is an integer of 0 to 3, provided that m and n are not simultaneously zero, they are not simultaneously m=0 and n=1, they are not simultaneously m=1 and n=0, and they are not simultaneously m=2 and n=3.
14. The etching gas used for a silicon-containing film as claimed in claim 12 , wherein the perfluoro cyclic ether is a cyclic ether having a five- to eight-membered ring.
15. The etching gas used for a silicon-containing film as claimed in claim 12 , wherein the total amount of the perfluoro cyclic ether and O 2 is 10 to 100 mol % based on 100 mol % of the total gas amount.
16. The etching gas used for a silicon-containing film as claimed in claim 12 , wherein the perfluoro cyclic ether is at least one compound selected from group consisting of perfluoro-1,3-dioxolane (c-C 3 F 6 O 2 ), perfluoro-1,4-dioxane (c-C 4 F 8 O 2 ) and perfluoro-1,3,5-trioxane (c-C 3 F 6 O 3 ).