Photosensitve resin composition
A photosensitive resin composition comprises an alkali soluble acrylic resin, a photosensitizer containing a quinone diazide group, a solvent and if necessary a hardening agent containing epoxy groups, wherein said solvent is a mixture of propylene glycol monomethyl ether acetate and a solvent having smaller vapor pressure than that of propylene glycol monomethyl ether acetate at the normal temperature and the atmospheric pressure and said composition further contains a phenolic compound represented by general formula (I) below. The photosensitive resin composition can be used suitably as a material for forming an interlayer dielectric or a planarization film, etc. of semiconductor devices, flat panel displays or the like. wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 and R 7 represent independently H, a C 1-4 alkyl group or whereupon each of m and n is independently an integer of 0 to 2, each of a, b, c, d, e, f, g and h is an integer of 0 to 5 satisfying a+b≦5, c+d≦5, e+f≦5 and g+h≦5, and i is an integer of 0 to 2.
1 . A photosensitive resin composition comprising an alkali-soluble resin, a photosensitizer having a quinone diazide group and a solvent, wherein the alkali-soluble resin is an acrylic resin, the solvent is a mixture of propylene glycol monomethyl ether acetate and a solvent having smaller vapor pressure than that of propylene glycol monomethyl ether acetate under normal temperature and atmospheric pressure, and the photosensitive resin composition further comprises a phenolic compound represented by the general formula (I):
wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 and R 7 represent independently H, a C 1-4 alkyl group or
whereupon each of m and n is independently an integer of 0 to 2, each of a, b, c, d, e, f, g and h is an integer of 0 to 5 satisfying a+b≦5, c+d≦5, e+f≦5 and g+h≦5, and i is an integer of 0 to 2.
2 . The photosensitive resin composition according to claim 1 , wherein the solvent having smaller vapor pressure than that of propylene glycol monomethyl ether acetate under normal temperature and atmospheric pressure is at least one member selected from the group consisting of ethyl 2-hydroxpropionate, propylene glycol n-butyl ether and propylene glycol.
3 . The photosensitive resin composition according to claim 2 , wherein the mixing ratio of propylene glycol monomethyl ether acetate and a solvent that is at least one member selected from the group consisting of ethyl 2-hydroxpropionate, propylene glycol n-butyl ether and propylene glycol is from 95:5 to 50:50.
4 . The photosensitive resin composition according to claim 1 , wherein the acrylic resin comprises a constitutional unit derived from an alkyl (meth)acrylate and a constitutional unit derived from (meth)acrylic acid.
5 . The photosensitive resin composition according to claim 4 , wherein the acrylic resin comprises 5 to 30 mole-% of a constitutional unit derived from (meth)acrylic acid.
6 . The photosensitive resin composition according to claim 1 , wherein the photosensitizer having a quinone diazide group is a reaction product between the compound of general formula (I) and a naphthoquinone diazide compound.
7 . The photosensitive resin composition according to claim 6 , wherein the phenolic compound represented by the general formula (I) is a compound represented by the formula (II):
8 . The photosensitive resin composition according to claim 1 , which further comprises a hardening agent having epoxy groups.
9 . The photosensitive resin composition according to claim 1 , wherein the acrylic resin has a weight average molecular weight of 20,000 to 40,000 as determined by polystyrene standards.
10 . The photosensitive resin composition according to claim 6 , wherein the phenolic compound represented by the general formula (I) is a compound represented by the formula (III):