IP Library › Assignment 015788/0348
Patent Assignment
Reel/Frame 015788/0348

Assignment of Assignor's Interest

Recorded: 2005-03-17 Pages: 6
Assignor
CLARIANT FINANCE (BVI) LIMITED
Executed: 2005-03-01
Assignee
AZ ELECTRONIC MATERIALS USA CORP.
70 MEISTER AVENUE, SOMERVILLE, NEW JERSEY, 08876
Covered Properties (71)
Negative Photoresist Compositions Comprising a Photosensitive Compound an Alkoxymethylated Melamine and Novolak Resin
Patent: 5,541,036 →
Application: 08/046,728 →
Positive-Working Radiation-Sensitive Mixture
Patent: 5,525,453 →
Application: 08/196,810 →
Radiation Sensitive Composition
Patent: 5,595,855 →
Application: 08/390,045 →
Radiation-Sensitive Mixture Comprising a Basic Iodonium Compound
Patent: 5,663,035 →
Application: 08/420,787 →
Colored, Photosensitive Resin Composition
Patent: 5,641,594 →
Application: 08/507,301 →
Photosensitive Resin Composition for Color Filter Production
Patent: 5,882,843 →
Application: 08/557,841 →
Pattern Forming Material Including Photoacid and Photobase Generators for Large Exposure Latitude
Patent: 5,691,100 →
Application: 08/623,735 →
Radiation-Sensitive Composition
Patent: 5,773,191 →
Application: 08/685,850 →
Polybenzimidazole Material with Low Metallic Concentration and a Process for Production Thereof
Patent: 5,932,688 →
Application: 08/783,008 →
Composition for Anti-Reflection Coating
Patent: 5,853,471 →
Application: 08/838,665 →
Radiation-Sensitive Composition and Recording Medium Using the Same
Patent: 6,110,639 →
Application: 08/860,451 →
Radiation Sensitive Composition
Patent: 5,738,972 →
Application: 08/864,375 →
Process for Manufacturing Sintered Polybenzimidazole Article
Patent: 5,770,142 →
Application: 08/874,860 →
Polybenzimidazole Compounds in Solution and a Process for the Preparation Thereof
Patent: 5,902,876 →
Application: 08/877,851 →
Positive-Working Radiation-Sensitive Mixture
Patent: 5,843,319 →
Application: 08/902,072 →
New Acid-Labile Group Protected Hydroxystyrene Polymers or Copolymers Thereof and Their Application to Radiation Sensitive Materials
Patent: 5,852,128 →
Application: 08/922,321 →
Radiation Sensitive Composition
Patent: 5,962,187 →
Application: 08/955,453 →
Rinsing Solution
Patent: 5,964,951 →
Application: 08/996,510 →
Radiation Absorbing Polymer and Synthesis Thereof
Patent: 6,184,305 →
Application: 09/079,565 →
Composition for Anti-Reflective Coating or Radiation Absorbing Coating and Compounds Used in the Composition
Patent: 6,803,168 →
Application: 09/237,125 →
Detergent for Lithography
Patent: 6,569,251 →
Application: 09/242,790 →
Radiation-Sensitive Resist Composition with High Heat Resistance
Patent: 6,080,522 →
Application: 09/242,942 →
Radiation Absorbing Polymer, Composition for Radiation Absorbing Coating, Radiation Absorbing Coating and Application Thereof as Anti-Reflective Coating
Patent: 6,468,718 →
Application: 09/244,358 →
Novel Process for Preparing Resists
Patent: 6,284,427 →
Application: 09/308,582 →
Antireflection or Light-Absorbing Coating Composition and Polymer Therefor
Patent: 6,329,117 →
Application: 09/319,129 →
Cleaning Method of Containers and Apparatus Thereof
Patent: 6,347,637 →
Application: 09/346,428 →
Light-Absorbing Polymers and Application Thereof to Antireflection Film
Patent: 6,255,405 →
Application: 09/424,128 →
Chemically Amplified Resist Composition
Patent: 6,479,210 →
Application: 09/445,345 →
Publication: US 2001/0036589
Composition for Light Absorption Film Formation Containing Blocked Isocyanate Compound and Antireflection Film Formed Therefrom
Patent: 6,465,148 →
Application: 09/486,843 →
Radiation-Sensitive Composition of Chemical Amplification Type
Patent: 6,358,665 →
Application: 09/529,371 →
Method for Forming Micropattern of Resist
Patent: 6,514,676 →
Application: 09/555,393 →
Radiation-Sensitive Resin Composition
Patent: 6,379,862 →
Application: 09/582,010 →
Radiation-sensitive resin composition
Patent: 6,342,542 →
Application: 09/600,052 →
Method for Forming Resist Pattern
Patent: 6,465,161 →
Application: 09/600,612 →
Photosensitive Resin Composition
Patent: 6,372,403 →
Application: 09/623,119 →
Photosensitive Resin Composition Comprising a Fluorescent Material
Patent: 6,537,719 →
Application: 09/673,547 →
Radiation-Sensitive Resin Composition
Patent: 6,384,103 →
Application: 09/701,851 →
Water-Soluble Resin Composition
Patent: 6,555,607 →
Application: 09/786,245 →
Novel Process for Preparing Resists
Patent: 6,686,121 →
Application: 09/824,198 →
Publication: US 2001/0024765
Photosensitive Composition
Patent: 6,737,212 →
Application: 09/857,553 →
Composition for Antireflection Coating
Patent: 6,692,892 →
Application: 09/889,184 →
Coating Composition
Patent: 6,602,604 →
Application: 09/914,561 →
Publication: US 2002/0182417
Cleaning Method of Containers and Apparatus Thereof
Patent: 6,616,770 →
Application: 09/981,119 →
Publication: US 2002/0026953
Radiation-Sensitive Resin Composition
Patent: 6,716,564 →
Application: 10/011,209 →
Publication: US 2002/0115741
Method for Producing Polybenzimidazole Sintered Compact
Patent: 6,593,449 →
Application: 10/030,412 →
Publication: US 2003/0025246
Aqueous surfactant solution for developing coating film layer
Application: 10/089,414 →
Publication: US 2003/0091732
Photosensitive Ploysilazane Composition, Method of Forming Pattern Therefrom, and Method of Burning Coating Film Thereof
Patent: 6,902,875 →
Application: 10/110,656 →
Publication: US 2003/0113657
High-Resolution Photosensitive Resin Composition Usable with I-Line and Method of Forming Pattern
Patent: 6,806,019 →
Application: 10/203,359 →
Publication: US 2003/0022093
Method for Forming Resist Pattern in Reverse-Tapered Shape
Patent: 7,045,471 →
Application: 10/220,394 →
Publication: US 2003/0022109
Radiation Absorbing Polymer, Composition for Radiation Absorbing Coating, Radiation Absorbing Coating and Application Thereof as Anti-Reflective Coating
Patent: 6,737,492 →
Application: 10/229,219 →
Publication: US 2003/0065119
Blocked Isocyanate Compound-Containing Composition for Forming a Radiation Absorbing Coating and Anti-Reflective Coating Formed Therefrom
Patent: 6,939,661 →
Application: 10/232,081 →
Publication: US 2003/0027078
Method for Sealing Fine Groove with Siliceous Material and Substrate Having Siliceous Coating Formed Thereon
Patent: 6,767,641 →
Application: 10/258,285 →
Development Deffect Preventing Process and Material
Patent: 7,195,863 →
Application: 10/311,787 →
Publication: US 2003/0180667
Method of Forming a Minute Resist Pattern
Patent: 6,933,100 →
Application: 10/323,119 →
Publication: US 2003/0108822
Porous Silica Coating with Low Dielectric Constant, Semiconductor Device and Coating Composition
Patent: 6,746,714 →
Application: 10/370,588 →
Publication: US 2003/0152783
Wafer Holding Ring for Checmial and Mechanical Polisher
Patent: 6,896,602 →
Application: 10/398,600 →
Publication: US 2004/0023609
Silicon-Containing Copolymer and Process for Producing the Same
Patent: 6,946,536 →
Application: 10/399,928 →
Publication: US 2004/0030083
Method for Forming Pattern and Treating Agent for Use Therein
Patent: 7,018,785 →
Application: 10/416,412 →
Publication: US 2004/0053170
Photosensitive resin composition
Application: 10/432,462 →
Publication: US 2004/0043322
Methods of Forming Polybenzimidazole Coating Film and of Forming Film
Patent: 6,896,931 →
Application: 10/432,556 →
Publication: US 2004/0028824
Chemical-amplication-type positive radiation-sensitive resin composition
Application: 10/450,078 →
Publication: US 2004/0033438
Method of forming thick resist pattern
Application: 10/480,342 →
Publication: US 2004/0170917
Etching Method and Composition for Forming Etching Protective Layer
Patent: 7,141,177 →
Application: 10/487,658 →
Publication: US 2004/0238486
Optical film having controlled scattering/ transmitting characteristics and liquid crystal display using it
Application: 10/498,076 →
Publication: US 2005/0018303
Solvent for Treating Polysilazane and Method of Treating Polysilazane with the Solvent
Patent: 7,344,603 →
Application: 10/499,374 →
Publication: US 2005/0027089
Cleaning Agent Composition for a Positive or a Negative Photoresist
Patent: 7,172,996 →
Application: 10/500,752 →
Publication: US 2005/0119142
Photosensitve resin composition
Application: 10/504,226 →
Publication: US 2005/0079436
Active Backscatter Transponder, Communication System Comprising the Same and Method for Transmitting Data by Way of Such an Active Backscatter Transponder
Patent: 7,242,259 →
Application: 10/506,885 →
Publication: US 2005/0170797
Coating composition
Application: 10/608,392 →
Publication: US 2004/0106742
Optical Film Having Controlled Scattering/Transmitting Characteristics
Patent: 7,154,672 →
Application: 10/688,541 →
Publication: US 2004/0085640
Negative photosensitive resin composition and display device using the same
Application: 10/909,718 →
Publication: US 2005/0003300
Related Assignments (25)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignors Interest. Apr 16, 1993
From: IGAWA, AKIHIKO; NISHIKAWA, MASATO; PAWLOWSKI, GEORG; DAMMEL, RALPH
To: HOECHST JAPAN LIMITED
Reel/Frame 006513/0497 →
Assignment of Assignor's Interest Apr 14, 1994
From: PRZYBILLA, KLAUS JUERGEN; KUDO, TAKANORI; MASUDA, SEIYA; KINOSHITA, YOSHIAKI
To: HOECHST JAPAN LIMITED
Reel/Frame 006956/0304 →
Assignment of Assignor's Interest Feb 17, 1995
From: PADMANABAN, MUNIRATHNA; KINOSHITA, YOSHIAKI; SUEHIRO, NATSUMI; KUDO, TAKANORI
To: HOECHST JAPAN LIMITED
Reel/Frame 007364/0973 →
Assignment of Assignor's Interest Apr 12, 1995
From: MASUDA, SEIYA; PADMANABAN, MUNIRATHNA; KUDO, TAKANORI; KINOSHITA, YOSHIAKI
To: HOECHST JAPAN LIMITED
Reel/Frame 007452/0601 →
Assignment of Assignor's Interest Nov 14, 1995
From: KUDO, TAKANORI; NOZAKI, YUKO; NAGAO, KAZUYA; NANJO, YUKI
To: HOECHST JAPAN LIMITED
Reel/Frame 007801/0113 →
Assignment of Assignor's Interest Jul 24, 1996
From: PADMANABAN, MUNIRATHNA; KINOSHITA, YOSHIAKI; FUNATO, SATORU; KAWASAKI, NATSUMI
To: HOECHST JAPAN LIMITED
Reel/Frame 008111/0086 →
Assignment of Assignor's Interest Jan 14, 1997
From: MURATA, MAKOTO
To: HOECHST JAPAN LIMITED
Reel/Frame 009310/0212 →
Assignment of Assignor's Interest Apr 9, 1997
From: YOSHIDA, TAKEO; TANAKA, HATSUYUKI
To: HOECHST JAPAN LIMITED
Reel/Frame 008579/0302 →
Assignment of Assignor's Interest Jun 13, 1997
From: SASAKI, YOSHISATO; KURISAKI, MINORU
To: HOECHST JAPAN LIMITED
Reel/Frame 008609/0399 →
Assignment of Assignor's Interest Jun 26, 1997
From: MASUDA, SEIYA; FUNATO, SATORU; KAWASAKI, NATSUMI
To: HOECHST JAPAN LIMITED
Reel/Frame 008633/0355 →
Assignment of Assignor's Interest Sep 15, 1997
From: MURATA, MAKOTO; NAKAMURA, TORU
To: HOECHST JAPAN LIMITED
Reel/Frame 008699/0720 →
Assignment of Assignor's Interest Oct 21, 1997
From: TAKEDA, TAKASHI
To: CLARIANT INTERNATIONAL LTD.
Reel/Frame 008899/0922 →
Assignment of Assignor's Interest Dec 23, 1997
From: YAMAMOTO, KENJI; IGAWA, AKIHIKO
To: CLARIANT INTERNATIONAL LTD.
Reel/Frame 008916/0294 →
Assignment of Assignor's Interest Feb 26, 1998
From: PADMANABAN, MUNIRATHNA; PAWLOWSKI, GEORG; KINOSHITA, YOSHIAKI; OKAZAKI HIROSHI
To: CLARIANT AG
Reel/Frame 009006/0236 →
Assignment of Assignor's Interest May 15, 1998
From: KANG, WEN-BING; TOKIDA, AKIHIKO; ARAMAKI, KAYO; TANAKA, HATSUYUKI
To: CLARIANT INTERNATIONAL LTD.
Reel/Frame 009186/0319 →
Assignment of Assignor's Interest Jan 26, 1999
From: PADMANABAN, MUNIRATHNA; KANG, WEN-BING; TANAKA, HATSUYUKI; KIMURA, KEN
To: CLARIANT INTERNATIONAL LTD.
Reel/Frame 009746/0111 →
Assignment of Assignor's Interest Feb 4, 1999
From: KANG, WEN-BING; PADMANABAN, MUNIRATHNA; TANAKA, HATSUYUKI; KIMURA, KEN
To: CLARIANT INTERNATIONAL LTD.
Reel/Frame 009652/0672 →
Assignment of Assignor's Interest Feb 23, 1999
From: TAKEDA, TAKASHI
To: CLARIANT INTERNATIONAL, LTD.
Reel/Frame 010253/0509 →
Assignment of Assignor's Interest Feb 26, 1999
From: TANAKA, HATSUYUKI; ITO, HIROMI
To: CLARIANT INTERNATIONAL, LTD.
Reel/Frame 010244/0230 →
Assignment of Assignor's Interest Aug 5, 1999
From: OKAZAKI, HIROSHI; POWLOWSKI, GEORG; FUNATO, SATORU; KINOSHITA, YOSHIAKI
To: CLARIANT INTERNATIONAL, LTD.
Reel/Frame 010141/0813 →
Assignment of Assignor's Interest Aug 9, 1999
From: PADMANABAN, MUNIRATHNA; KANG, WEN-BING; PAWLOWSKI, GEORG; KIMURA, KEN
To: CLARIANT INTERNATIONAL, LTD.
Reel/Frame 010151/0446 →
Assignment of Assignor's Interest Oct 6, 2000
From: CLARIANT INTERNATIONAL LTD.
To: CLARIANT FINANCE (BVI) LIMITED
Reel/Frame 011185/0415 →
Assignment of Assignor's Interest Feb 13, 2001
From: CLARIANT AG
To: CLARIANT FINANCE (BVI) LIMITED
Reel/Frame 011523/0880 →
Assignment of Assignor's Interest Feb 13, 2001
From: CLARIANT INTERNATIONAL LTD.
To: CLARIANT FINANCE (BVI) LIMITED
Reel/Frame 011523/0886 →
Assignment of Assignor's Interest Feb 13, 2001
From: HOECHST JAPAN LIMITED
To: CLARIANT FINANCE (BVI) LIMITED
Reel/Frame 011531/0702 →