IP Library Granted Patent US 7,465,362
Granted Patent B2
US 7,465,362 · App. 10/513,607 · Granted Dec 16, 2008

Plasma-assisted nitrogen surface-treatment

Assignee: BTU International, Inc.
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Quick Facts
Patent No.
US 7,465,362
App. No.
10/513,607
Granted
Dec 16, 2008
Kind
B2
Abstract

Methods and systems ( 10 ) for plasma-assisted nitrogen surface-treatments are provided. The method can include subjecting a gas ( 24 ) to electromagnetic radiation ( 26 ) in the presence of a plasma catalyst ( 100, 120, 140 ) to initiate a plasma containing nitrogen. The surface region of an object can be exposed to the plasma for a period of time sufficient to transfer at least some of the nitrogen from the plasma to the object through the surface region.

Claims (32)

1. A method of nitriding a first surface region of an object, the method comprising:

initiating a nitriding plasma by subjecting a gas to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, wherein the plasma contains nitrogen;

exposing the first surface region of the object to the plasma for a period of time sufficient to transfer at least some of the nitrogen from the plasma to the object through the first surface region; and

substantially preventing exposure of a second surface region of the object to the plasma.

2. The method of claim 1 , wherein the plasma catalyst includes at least one of a passive plasma catalyst and an active plasma catalyst.

3. The method of claim 1 , wherein the plasma catalyst comprises nitrogen, and wherein the method further comprises adding nitrogen to the plasma by allowing the plasma to consume the plasma catalyst.

4. The method of claim 1 , wherein the plasma catalyst includes at least one of powdered carbon, carbon nanotubes, carbon nanoparticles, carbon fibers, graphite, solid carbon, and any combination thereof.

5. The method of claim 1 , wherein the plasma catalyst includes at least two different materials in amounts determined by a predetermined ratio profile.

6. The method of claim 1 , wherein the plasma catalyst includes at least one of x-rays, gamma radiation, alpha particles, beta particles, neutrons, protons, and any combination thereof.

7. The method of claim 1 , wherein the plasma catalyst includes at least one of electrons and ions.

8. The method of claim 1 , wherein the plasma catalyst includes at least one of a nitrogen-containing compound, a metal, carbon, a carbon-based alloy, a carbon-based composite, an electrically conductive polymer, a conductive silicone elastomer, a polymer nanocomposite, an organic-inorganic composite, and any combination thereof.

9. The method of claim 1 , wherein the initiating occurs in a cavity, and wherein the gas has an initial pressure level of at least about 760 Torr.

10. The method of claim 1 , wherein the exposing is performed at a pressure of at least about 760 Torr.

11. The method of claim 1 , further comprising diffusing the nitrogen into the object below the first surface region.

12. The method of claim 11 , wherein the diffusing occurs up to a depth of between about 0.01 inches and about 0.1 inches.

13. The method of claim 1 , wherein the initiating occurs using a time-averaged radiation energy density below about 10 W/cm 3 .

14. The method of claim 1 , further comprising:

positioning the object within a cavity such that the second surface region is separated from an inner wall of the cavity by a distance of less than about 25% of the wavelength of the radiation.

15. The method of claim 1 , further comprising positioning the object with respect to a cavity such that the first surface region is located within the cavity and the second surface region is located outside of the cavity.

16. The method of claim 1 , further comprising mode-mixing the radiation.

17. The method of claim 1 , wherein the exposing comprises:

supplying the radiation into a cavity; and

supplying the gas into the cavity.

18. The method of claim 1 , further comprising applying a DC bias to the object.

19. The method of claim 18 , wherein the DC bias is a pulsed DC bias.

20. The method of claim 1 , further comprising introducing the nitrogen into the plasma by supplying a nitrogen-containing gas to the plasma.

21. The method of claim 1 , wherein the initiating further comprises introducing the nitrogen into the plasma after the plasma is formed.

22. The method of claim 21 , wherein the introducing comprises providing at least one of a solid material containing nitrogen and a gaseous material containing nitrogen to the plasma.

23. The method of claim 1 , wherein the object includes iron.

24. The method of claim 1 , further comprising heating at least the first surface region of the object via the plasma to between about 400° C. and about 650° C.

25. The method of claim 1 , further comprising heating at least a portion of the object at a rate of at least about 400° C. per minute until the first surface region reaches a temperature of at least about 400° C.

26. The method of claim 1 , wherein the exposing further comprises moving the first surface region of the object with respect to the plasma.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 12, 2006
From: DANA CORPORATION
To: BTU INTERNATIONAL INC.
Reel/Frame 017777/0430 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 5, 2005
From: KUMAR, DEVENDRA; KUMAR, SATYENDRA
To: DANA CORPORATION
Reel/Frame 016743/0864 →
Continuity (4)
Provisional Application 6043527800 · Dec 23, 2002
Provisional Application 6043067700 · Dec 4, 2002
Provisional Application 6037869300 · May 8, 2002
Related Publication 20060162818A1 · Jul 27, 2006