IP Library Granted Patent US 7,294,732
Granted Patent B2
US 7,294,732 · App. 10/523,702 · Granted Nov 13, 2007

Silicon compound

Assignee: Chisso Corporation
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Quick Facts
Patent No.
US 7,294,732
App. No.
10/523,702
Granted
Nov 13, 2007
Kind
B2
Abstract

A silicon compound represented by Formula (1). In Formula (1), R 1 is a group independently selected respectively from the group consisting of a hydrogen atom, alkyl, substituted or non-substituted aryl and substituted or non-substituted arylalkyl, and A 1 is an organic group substituted with a halogenated sulfonyl group and is preferably a group represented by Formula (2). In Formula (2), X is halogen; R 2 is alkyl; a is an integer of 0 to 2; and Z 1 is a single bond or alkylene having a carbon number of 1 to 10. The silicon compound provided by the present invention is a silsesquioxane derivative having an excellent living polymerizable radical polymerization initiating function. For example, it is possible to commence polymerization by allowing an acryl base monomer to coexist to form an acryl base polymer making use of one point of the structure of the silsesquioxane in the present invention as a starting point. Because a halogenated sulfonyl group has a strong electrophilicity, it is possible to synthesize various silsesquioxane derivatives by reacting the silicon compound provided by the present invention with various nucleophilic reagents, and it can actively be used as an intermediate useful for organic synthesis.

Claims (50)

1. A silicon compound represented by Formula (1):

in Formula (1), seven R 1 's are groups independently selected respectively from the group consisting of hydrogen, alkyl, substituted or non-substituted aryl and substituted or non-substituted arylalkyl; A 1 is an organic group substituted with a halogenated sulfonyl group; in the alkyl group, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O—, —CH═CH—, cycloalkylene or cycloalkenylene; and in the alkylene moiety of the arylalkyl group, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O— or —CH═CH—.

2. The silicon compound as described in claim 1 , wherein seven R 1 's in Formula (1) are groups independently selected respectively from the group consisting of hydrogen, alkyl having a carbon number of 1 to 45, substituted or non-substituted aryl and substituted or non-substituted arylalkyl; in the alkyl group having a carbon number of 1 to 45, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O—, —CH═CH—, cycloalkylene or cycloalkenylene; and

in the alkylene moiety of the arylalkyl group, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O— or —CH═CH—.

3. The silicon compound as described in claim 1 , wherein seven R 1 's in Formula (1) are groups independently selected respectively from the group consisting of hydrogen and alkyl having a carbon number of 1 to 30; and

in the alkyl group having a carbon number of 1 to 30, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O— or cycloalkylene.

4. The silicon compound as described in claim 1 , wherein seven R 1 's in Formula (1) are groups independently selected respectively from the group consisting of alkenyl having a carbon number of 1 to 20 and a group in which —CH 2 — is optionally replaced by cycloalkenylene in alkyl having a carbon number of 1 to 20;

in the alkenyl having a carbon number of 1 to 20, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O— or cycloalkylene; and

in the group in which —CH 2 — is optionally replaced by cycloalkenylene in alkyl having a carbon number of 1 to 20, hydrogen may be optionally replaced by fluorine.

5. The silicon compound as described in claim 1 , wherein seven R 1 's in Formula (1) are groups independently selected respectively from the group consisting of naphthyl and phenyl in which hydrogen may be optionally replaced by halogen or alkyl having a carbon number of 1 to 10;

in the alkyl group having a carbon number of 1 to 10, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O—, —CH═CH—, cycloalkylene or phenylene.

6. The silicon compound as described in claim 1 , wherein seven R 1 's in Formula (1) are groups independently selected respectively from the group consisting of phenylalkyls in which hydrogen on a benzene ring may be optionally replaced by halogen or alkyl having a carbon number of 1 to 12;

in the alkyl group having a carbon number of 1 to 12, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O—, —CH═CH—, cycloalkylene or phenylene; and

in the alkylene moiety of the phenylalkyl group, which has a carbon number of 1 to 12, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O— or —CH═CH—.

7. The silicon compound as described in claim 1 , wherein seven R 1 's in Formula (1) are groups independently selected respectively from the group consisting of alkyl having a carbon number of 1 to 8, phenyl, non-substituted naphthyl and phenylalkyl;

in the alkyl aroup having 1 to 8 carbon atoms, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O—, —CH═CH—, cycloalkylene or cycloalkenylene;

in the phenyl, hydrogen may be optionally replaced by halogen, methyl or methoxy;

in phenyl in the phenylalkyl group, hydrogen may be optionally replaced by fluorine, alkyl having a carbon number of 1 to 4, ethenyl or methoxy; the alkylene moiety of the phenylalkyl group has a carbon number of 1 to 8, and —CH 2 — in the alkylene moiety may be optionally replaced by —O— or —CH═CH—.

8. The silicon compound as described in claim 1 , wherein seven R 1 's in Formula (1) are one group selected from the group consisting of alkyl having a carbon number of 1 to 8, phenyl, non-substituted naphthyl and phenylalkyl;

in the alkyl having a carbon number of 1 to 8, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O—, —CH═CH—, cycloalkylene or cycloalkenylene;

in the phenyl, hydrogen may be optionally replaced by halogen, methyl or methoxy;

in phenyl in the phenylalkyl group, hydrogen may be optionally replaced by fluorine, alkyl having a carbon number of 1 to 4, ethenyl or methoxy;

the alkylene moiety of the phenylalkyl group has a carbon number of 1 to 8, and —CH 2 —in the alkylene moiety may be optionally replaced by —O— or —CH═CH—.

9. The silicon compound as described in claim 1 , wherein seven R 1 's in Formula (1) are one group selected from the group consisting of phenyl, naphthyl and phenylalkyl;

in the phenyl, hydrogen may be optionally replaced by halogen, methyl or methoxy;

in phenyl in the phenylalkyl group, hydrogen may be optionally replaced by fluorine, alkyl having a carbon number of 1 to 4, ethenyl or methoxy;

the alkylene moiety of the phenylalkyl group has a carbon number of 1 to 8, and —CH 2 — in the alkylene moiety may be optionally replaced by —O—.

10. The silicon compound as described in claim 1 , wherein seven R 1 's in Formula (1) are ethyl, 2-methylpropyl, 2,4,4-trimethylpentyl, 3,3,3-trifluoropropyl, cyclopentyl, cyclohexyl or non-substituted phenyl.

11. The silicon compound as described in claim 1 , wherein seven R 1 's in Formula (1) are non-substituted phenyl.

12. The silicon compound as described in any of claims 1 to 11 , wherein A 1 in Formula (1) described in claim 1 is a group represented by Formula (2):

in Formula (2), X is halogen; R 2 is alkyl having a carbon number of 1 to 3; a is an integer of 0 to 2; Z 1 is a single bond or alkylene having a carbon number of 1 to 10; in the alkylene having a carbon number of 1 to 10, —CH 2 — may be optionally replaced by —O—, —COO— or —OCO—; and both of the bonding positions of halogenated sulfonyl and R 2 on the benzene ring are optional positions.

13. The silicon compound as described in claim 12 , wherein Z 1 in Formula (2) is Z 2 —C 2 H □ —; Z 2 is a single bond,or alkylene having a carbon number of 1 to 8, and —CH 2 — in the alkylene group may be optionally replaced by —O—, —COO— or —OCO—.

14. The silicon compound as described in claim 12 , wherein in Formula (2), Z 1 is —C 2 H 4 —; X is chlorine or bromine; and a is 0.

15. A production process for the silicon compound represented by Formula (1) as described in claim 1 , which comprises reacting a compound represented by Formula (3) with trichlorosilane having a halogenated sulfonyl group:

in Formula (3), seven R 1 's are groups independently selected respectively from the group consisting of hydrogen, alkyl, substituted or non-substituted aryl and substituted or non-substituted arylalkyl; in the alkyl group, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O—, —CH═CH—, cycloalkylene or cycloalkenylene; and in the alkylene moiety of the arylalkyl group, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O— or —CH═CH—.

16. A production process for a silicon compound represented by Formula (5), which comprises reacting a compound represented by Formula (3) with a compound represented by Formula (4):

wherein R 1 in Formula (3) is one group selected from the group consisting of alkyl having a carbon number of 1 to 8, phenyl, non-substituted naphthyl and phenylalkyl; in the alkyl group having a carbon number of 1 to 8, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O—, —CH═CH—, cycloalkylene or cycloalkenylene; hydrogen in the phenyl may be optionally replaced by halogen, methyl or methoxy; in the phenylalkyl, hydrogen on a benzene ring may be optionally replaced by fluorine, alkyl having a carbon number of 1 to 4, ethenyl or methoxy, and —CH 2 — in the alkylene moiety may be optionally replaced by —O—; R 1 in Formula (5) has the same meaning as that of R 1 in Formula (3); in Formula (4), X is halogen; R 2 is alkyl having a carbon number of 1 to 3; a is an integer of 0 to 2; Z 2 is a single bond or alkylene having 1 to 8 carbon atoms; in the alkylene group having a carbon number of 1 to 8, —CH 2 — may be optionally replaced by —O—, —COO— or —OCO—; both of the bonding positions of halogenated sulfonyl and R 2 on the benzene ring are optional positions; and the meanings of X, R 2 , and Z 2 in Formula (5) and the bonding positions of halogenated sulfonyl and R 2 on the benzene ring are the same as those in Formula (4).

17. A production process for the silicon compound represented by Formula (1) as described in claim 1 , which comprises reacting a compound represented by Formula (6) with trichiorosilane having a halogenated sulfonyl group:

in Formula (6), seven R 1 's are groups independently selected respectively from the group consisting of hydrogen, alkyl, substituted or non-substituted aryl and substituted or non-substituted arylalkyl; M is a monovalent alkali metal atom; in the alkyl group, hydrogen may be optionally replaced by fluorine, and —CH 2 —may be optionally replaced by —O—, —CH═CH—, cycloalkylene or cycloalkenylene; and in the alkylene moiety of the arylalkyl group, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O— or —CH═CH—.

18. A production process for a silicon compound represented by Formula (5), which comprises reacting a compound represented by Formula (6) with a compound represented by Formula (4):

in Formula (6), R 1 is one group selected from the group consisting of alkyl having a carbon number of 1 to 8, phenyl, non-substituted naphthyl and phenylalkyl; M is a monovalent alkali metal atom; in the alkyl group having a carbon number of 1 to 8, hydrogen may be optionally replaced by fluorine, and —CH 2 — may be optionally replaced by —O—, —CH═CH—, cycloalkylene or cycloalkenylene; hydrogen in the phenyl may be optionally replaced by halogen, methyl or methoxy; in the phenylalkyl group, hydrogen on a benzene ring may be optionally replaced by fluorine, alkyl having 1 to 4 carbon atoms, ethenyl or methoxy, and —CH 2 —in the alkylene moiety may be optionally replaced by —O—;

R 1 in Formula (5) has the same meaning as that of R 1 in Formula (6); in Formula (4), X is halogen; R 2 is alkyl having 1 to 3 carbon atoms; a is an integer of 0 to 2; Z 2 is a single bond or alkylene having a carbon number of 1 to 8; in the alkylene group having a carbon number of 1 to 8, —CH 2 — may be optionally replaced by —O—, —COO— or —OCO—; both of the bonding positions of halogenated sulfonyl and R 2 on the benzene ring are optional positions; and the meanings of X, R 2 , and Z 2 in Formula (5) and the bonding positions of halogenated sulfonyl and R 2 on the benzene ring are the same as those in Formula (4).

19. A polymer obtained by polymerizing a vinyl base monomer using the silicon compound represented by Formula (1) as described in claim 1 as an initiator and a transition metal complex as a catalyst.

20. A polymer represented by Formula (7) obtained by polymerizing a vinyl base monomer using the silicon compound represented by Formula (1) as described in claim 18 as an initiator and a transition metal complex as a catalyst:

the meanings of R 1 , Z 2 , R 2 , a and X in Formula (7) and the bonding positions of halogenated sulfonyl and R 2 on the benzene ring are the same as those in Formula (6) as described in claim 18 , and P is a vinyl base polymer.

21. The polymer as described in claim 19 or 20 , wherein the vinyl base monomer is at least one selected from the group consisting of a (meth)acrylic acid derivative and a styrene derivative.

22. The polymer as described in claim 19 or 20 , wherein the vinyl base monomer is at least one selected from the group consisting of the (meth)acrylic acid derivatives.

23. A polymerization process for a vinyl base monomer which comprises using the silicon compound represented by Formula (1) as described in claim 1 as an initiator and using a transition metal complex as a catalyst.

24. A production process for the polymer represented by Formula (7):

the meanings of R 1 , Z 2 , R 2 , a and X in Formula (7) and the bonding positions of halogenated sulfonyl and R 2 on the benzene ring are the same as those in Formula (6) as described in claim 18 , and P is a vinyl base polymer, which comprises polymerizing a vinyl base monomer using the compound represented by Formula (5) as described in claim 18 as an initiator and using a transition metal complex as a catalyst.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 27, 2011
From: CHISSO CORPORATION
To: JNC CORPORATION
Reel/Frame 026187/0940 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 9, 2005
From: OHNO, KOHJI; TSUJI, YOSHINOBU; FUKUDA, TAKESHI
To: CHISSO CORPORATION
Reel/Frame 016977/0665 →
Priority Claims (2)
JP 2002-229790 · Aug 7, 2002 · national
JP 2002-378150 · Dec 26, 2002 · national
Continuity (1)
Related Publication 20050288468A1 · Dec 29, 2005