Process for producing an alumina coating comprised mainly of α crystal structure
The present invention provides a process for producing an alumina coating comprised mainly of α crystal structure on a base material.
1. A process for producing an alumina coating comprised mainly of α crystal structure, comprising:
coating a base material with a metal component comprising Al and Ti and one or more of B, C, N and O to form a primary coating,
oxidizing the primary coating to form an oxide-containing layer, and
forming an alumina coating comprised mainly of α crystal structure on the oxide-containing layer.
2. The process according to claim 1 , wherein the outermost surface side of the oxide-containing layer is substantially comprised of alumina.
3. The process according to claim 1 , wherein the primary coating comprises TiAlN.
4. The process according to claim 1 , wherein the primary coating comprises a nitride, cemented carbide, carbonitride, boride, nitroxide, or carbonitroxide comprising Al and Ti, and at least one element selected from the group consisting of elements of the groups IVa (except Ti), Va, and VIa and Si.
5. The process according to claim 1 , wherein the primary coating comprises TiAlCrN.
6. The process according to claim 1 , wherein the oxidizing is carried out in an oxidizing gas-containing atmosphere while retaining a base material temperature at 650-800° C.
7. The process according to claim 1 , wherein the forming of the alumina coating is performed by a PVD method.
8. The process according to claim 1 , wherein the oxidizing the surface of the primary coating and the forming of the alumina coating are carried out within the same apparatus.
9. The process according to claim 1 , wherein the coating of the base material, oxidizing the primary coating, and forming the alumina coating are successively carried out within the same apparatus.
10. A process for producing an alumina coating comprised mainly of α crystal structure, comprising:
coating a base material with a metal component comprising Al and one or more of B, C, N and O to form a primary coating,
oxidizing the primary coating to form an oxide-containing layer, and
forming an alumina coating comprised mainly of α crystal structure on the oxide-containing layer.
11. The process according to claim 10 , wherein the primary coating is comprised of a nitride, cemented carbide, carbonitride, boride, nitroxide, or carbonitroxide comprising Al and at least one element selected from the group consisting of elements of the groups IVa, Va, and VIa and Si.
12. The process according to claim 10 , wherein the oxidizing is carried out in an oxidizing gas-containing atmosphere while retaining a base material temperature at 650-800° C.
13. The process according to claim 10 , wherein forming the alumina coating is performed by a PVD method.
14. The process according to claim 10 , wherein oxidizing the primary coating and forming the alumina coating are carried out within the same apparatus.
15. The process according to claim 10 , wherein the process of forming the primary coating, the process of oxidizing the surface of the primary coating, and the process of forming the alumina coating comprised mainly of α-type crystal structure are successively carried out within the same apparatus.
16. A process for producing an alumina coating comprised mainly of α crystal structure, comprising:
coating a base material with a metal whose standard free energy for oxidation generation is greater than that of aluminum and a compound of one or more of B, C, N, O to form a primary coating,
oxidizing the primary coating to form an oxide-containing layer, and
forming an alumina coating comprised mainly of α crystal structure on the oxide-containing layer.
17. The process according to claim 16 , wherein the metal whose standard free energy for oxidation generation is greater than that of aluminum is Ti.
18. The process according to claim 16 , wherein one or two or more laminate layers selected from the group consisting of TiN, TiC and TiCN are formed as the primary coating.
19. The process according to claim 16 , wherein a composition gradient layer of both material constituting elements to be connected is formed in a connecting interface between the primary coating and the base material, or layers of the primary coating.
20. The process according to claim 16 , wherein a titanium oxide-containing layer is formed as the oxide-containing layer and, in the following formation of alumina, an alumina coating is formed while being accompanied by reduction of the titanium oxide on the surface of the layer.
21. The process according to claim 16 , wherein a TiO 2 -containing layer is formed as the oxide-containing layer and, in the following formation of alumina, an alumina coating is formed while being accompanied by reduction of TiO 2 to Ti 3 O 5 on the surface of the layer.
22. The process according to claim 16 , wherein the oxidizing is carried out in an oxidizing gas-containing atmosphere while retaining a base material temperature at 650-800° C.
23. The process according to claim 16 , wherein forming the alumina coating is performed by a PVD method.
24. The process according to claim 16 , wherein oxidizing the primary coating and forming the alumina coating are carried out within the same apparatus.
25. The process according to claim 16 , wherein forming the primary coating, oxidizing the primary coating, and forming the alumina coating are successively carried out within the same apparatus.
26. A process for producing an alumina coating comprised mainly of α crystal structure comprising:
(1) forming at least one of the following coatings (a)-(c) on a base material:
(a) a coating comprised of a pure metal or alloy:
(b) a coating comprised mainly of a metal solid-dissolving nitrogen, oxygen, carbon or boron:
(c) a coating comprised of a metal nitride, oxide, cemented carbide or boride comprising nitrogen, oxygen, carbon or boron insufficient to a stoichiometric composition,
(2) oxidizing the surface of the coating from (1), and
(3) forming an alumina coating comprised mainly of α crystal structure on the oxidized surface from (2).
27. The process according to claim 26 , wherein the oxidizing is carried out in an oxidizing gas-containing atmosphere while retaining a base material temperature at 650-800° C.
28. The process according to claim 26 , wherein forming the alumina coating is performed by a PVD method.
29. The process according to claim 26 , wherein oxidizing the primary coating and forming the alumina coating are carried out within the same apparatus.
30. The process according to claim 26 , wherein forming the primary coating, oxidizing the primary coating, and forming the alumina coating are successively carried out within the same apparatus.