IP Library Granted Patent US 7,332,628
Granted Patent B2
US 7,332,628 · App. 10/548,836 · Granted Feb 19, 2008

Process for producing carbonyl fluoride

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Quick Facts
Patent No.
US 7,332,628
App. No.
10/548,836
Granted
Feb 19, 2008
Kind
B2
Abstract

The process for producing carbonyl fluoride according to the invention is a process for safely and easily producing high-purity carbonyl fluoride having a low content of carbon tetrafluoride, and comprises feeding carbon monoxide and fluorine to a reactor and allowing carbon monoxide to react with fluorine under the conditions of a reactor internal pressure of less than atmospheric pressure.

Claims (26)

1. A process for producing carbonyl fluoride, comprising feeding carbon monoxide and fluorine to a reactor and allowing carbon monoxide to react with fluorine under the conditions of a reactor internal pressure of less than atmospheric pressure.

2. A process for producing carbonyl fluoride, comprising feeding carbon monoxide and fluorine to a reactor in a molar ratio (CO/F 2 ) of not less than 1.0 to allow carbon monoxide to react with fluorine.

3. A process for producing carbonyl fluoride, comprising previously mixing fluorine with nitrogen and feeding carbon monoxide and the mixed gas of fluorine and nitrogen to a reactor in a molar ratio of carbon monoxide to fluorine (CO/F 2 ) of not less than 1.0 to allow carbon monoxide to react with fluorine.

4. A process for producing carbonyl fluoride, comprising:

(I) a reaction step of feeding at least carbon monoxide and fluorine to a reactor to allow carbon monoxide to react with fluorine, and

(II) a purification step of purifying crude carbonyl fluoride obtained in the reaction step (I),

wherein the crude carbonyl fluoride contains at least fluorine, and the purification step (II) is a step of purifying the carbonyl fluoride by mixing the crude carbonyl fluoride with a compound (A) which is reactive to fluorine but inactive to carbonyl fluoride to form a reaction product (a) of fluorine and the compound (A) and removing the reaction product (a).

5. The process for producing carbonyl fluoride as claimed in claim 4 , wherein carbon monoxide is allowed to react with fluorine under the conditions of a reactor internal pressure of less than atmospheric pressure.

6. The process for producing carbonyl fluoride as claimed in claim 1 , wherein carbon monoxide and fluorine are fed to a reactor in a molar ratio (CO/F 2 ) of not less than 1.0.

7. The process for producing carbonyl fluoride as claimed in claim 1 , wherein fluorine is previously mixed with nitrogen, and carbon monoxide and the mixed gas of fluorine and nitrogen are fed to a reactor.

8. The process for producing carbonyl fluoride as claimed in claim 3 , wherein the mixing molar ratio of fluorine to nitrogen (F 2 /N 2 ) is not more than 1.5.

9. The process for producing carbonyl fluoride as claimed in claim 1 , wherein the temperature inside the reactor is not higher than the endurable temperature of the reactor.

10. The process for producing carbonyl fluoride as claimed in claim 1 , wherein the yield of carbonyl fluoride is not less than 95% by mol.

11. The process for producing carbonyl fluoride as claimed in a claim 1 , wherein the reaction selectivity of carbon tetrafluoride is not more than 2.0% by mol.

12. The process for producing carbonyl fluoride as claimed in claim 4 , wherein carbon monoxide and fluorine and fed to a reactor in a molar ratio (CO/F 2 ) of not less than 1.0.

13. The process for producing carbonyl fluoride as claimed in claim 4 , wherein fluorine is previously mixed with nitrogen, and carbon monoxide and the mixed gas of fluorine and nitrogen are fed to a rector.

14. The process for producing carbonyl fluoride as claimed in claim 5 , wherein fluorine is previously mixed with nitrogen, and carbon monoxide and the mixed gas of fluorine and nitrogen are fed to a rector.

15. The process for producing carbonyl fluoride as claimed in claim 7 , wherein the mixing molar ratio of fluorine to nitrogen (F 2 /N 2 ) is not more than 1.5.

16. The process for producing carbonyl fluoride as claimed in claim 2 , wherein the temperature inside the reactor is not higher than the endurable temperature of the reactor.

17. The process for producing carbonyl fluoride as claimed in claim 3 , wherein the temperature inside the reactor is not higher than the endurable temperature of the reactor.

18. The process for producing carbonyl fluoride as claimed in claim 4 , wherein the temperature inside the reactor is not higher than the endurable temperature of the reactor.

19. The process for producing carbonyl fluoride as claimed in claim 2 , wherein the yield of carbonyl fluoride is not less than 95% by mol.

20. The process for producing carbonyl fluoride as claimed in claim 3 , wherein the yield of carbonyl fluoride is not less than 95% by mol.

21. The process for producing carbonyl fluoride as claimed in claim 4 , wherein the yield of carbonyl fluoride is not less than 95% by mol.

22. The process for producing carbonyl fluoride as claimed in claim 2 , wherein the reaction selectivity of carbon tetrafluoride is not more than 2.0% by mol.

23. The process for producing carbonyl fluoride as claimed in claim 3 , wherein the reaction selectivity of carbon tetrafluoride is not more than 2.0% by mol.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 8, 2019
From: HITACHI KOKUSAI ELECTRIC INC.
To: KOKUSAI ELECTRIC CORPORATION
Reel/Frame 050000/0483 →
CHANGE OF NAME Recorded Aug 7, 2018
From: ASAHI GLASS COMPANY, LIMITED
To: AGC INC.
Reel/Frame 046730/0786 →
CORPORATE ADDRESS CHANGE Recorded May 3, 2013
From: KANTO DENKA KOGYO CO., LTD.
To: KANTO DENKA KOGYO CO., LTD.
Reel/Frame 030342/0625 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 29, 2007
From: RESEARCH INSTITUTE OF INNOVATIVE TECHNOLOGY FOR THE EARTH
To: ASAHI GLASS COMPANY, LIMITED; KANTO DENKA KOGYO CO., LTD.; SHOWA DENKO KABUSHIKI KAISHA; DAIKIN INDUSTRIES, LTD.; HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 020179/0395 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 12, 2005
From: MITSUI, YUKI; YONEMURA, TAISUKE; OHIRA, YUTAKA; SEKIYA, AKIRA
To: RESEARCH INSTITUTE OF INNOVATIVE TECHNOLOGY FOR THE EARTH; NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
Reel/Frame 017340/0282 →