IP Library Granted Patent US 7,709,999
Granted Patent B2
US 7,709,999 · App. 10/582,229 · Granted May 4, 2010

Thin film piezoelectric resonator and method of manufacturing the same

Assignee: Kabushiki Kaisha Toshiba
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Quick Facts
Patent No.
US 7,709,999
App. No.
10/582,229
Granted
May 4, 2010
Kind
B2
Abstract

A thin film piezoelectric resonator includes a substrate having a cavity; a first electrode extending over the cavity; a piezoelectric film placed on the first electrode; and a second electrode placed on the piezoelectric film, the second electrode having a periphery partially overlapping on the cavity and tapered to have an inner angle of 30 degrees or smaller defined by a part of the periphery thereof and a bottom thereof.

Claims (35)

1. A thin film piezoelectric resonator comprising:

a substrate having a cavity;

a first electrode extending over the cavity;

a piezoelectric film placed on the first electrode; and

a second electrode placed on the piezoelectric film, the second electrode having a part of a periphery which overlaps on the cavity and is tapered, the second electrode having an inner angle of 30 degrees or smaller defined by a part of the periphery thereof and a bottom thereof.

2. The thin film piezoelectric resonator of claim 1 , wherein the part of the periphery of the second electrode is tapered and has an inner angle of 15 degrees or larger.

3. The thin film piezoelectric resonator of claim 1 , wherein the cavity goes through the substrate.

4. The thin film piezoelectric resonator of claim 1 , wherein the cavity includes an acoustic reflecting layer embedded therein.

5. The thin film piezoelectric resonator of claim 1 , further comprising an insulator which extends over the second electrode including the periphery thereof and the piezoelectric film where the second electrode is absent, and has a dielectric constant different from a dielectric constant of the second electrode.

6. The thin film piezoelectric resonator of claim 1 , wherein the insulator is made of a silicon oxide film, a silicon nitride film or an aluminum nitride film.

7. The thin film piezoelectric resonator of claim 2 , further comprising an insulator which extends over the second electrode including the periphery thereof and the piezoelectric film where the second electrode is absent, and has a dielectric constant different from a dielectric constant of the second electrode.

8. The thin film piezoelectric resonator of claim 2 , wherein the insulator is made of a silicon oxide film, a silicon nitride film or an aluminum nitride film.

9. A thin film piezoelectric resonator comprising:

a substrate having a cavity;

a first electrode extending over the cavity;

a piezoelectric film placed on the first electrode;

a second electrode placed on the piezoelectric film and having a part of a periphery thereof which overlaps on the cavity, and

an insulator placed on the second electrode and the piezoelectric film where the second electrode is absent, and being thin on the center of the second electrode and thick on the periphery of the second electrode.

10. The thin film piezoelectric resonator of claim 9 , wherein the insulator is thick in a range of 1 μm to 10 μm on the periphery of the second electrode, and is thin on the remaining part of the second electrode.

11. The thin film piezoelectric resonator of claim 9 , wherein the insulator is thick in a range of 2 μm to 5 μm on the periphery of the second electrode, and is thin at the remaining part of the second electrode.

12. The thin film piezoelectric resonator of claim 9 , wherein the insulator is made of a silicon oxide film, a silicon nitride film or an aluminum nitride film.

13. The thin film piezoelectric resonator of claim 9 , wherein an acoustic reflecting layer is embedded in the cavity.

14. A thin film piezoelectric resonator comprising:

a substrate having a cavity;

a first electrode extending over the cavity;

a piezoelectric film placed on the first electrode;

a second electrode placed on the piezoelectric film and having a part of a periphery which overlaps on the cavity, is tapered, and has an inner angle of 30 degrees or smaller defined by a part of the periphery thereof and a bottom thereof; and

an insulator placed on the second electrode and the piezoelectric film where the second electrode is absent, and being thin on the center of the second electrode and thick on the periphery of the second electrode.

15. The thin film piezoelectric resonator of claim 14 , wherein the periphery of the second electrode is tapered and has an inner angle of 15 degrees or larger.

16. A thin film piezoelectric resonator comprising:

a substrate having a cavity;

a first electrode extending over the cavity;

a piezoelectric film placed on the first electrode;

a second electrode placed on the piezoelectric film and having a periphery which overlaps on the cavity, and

an insulator placed on the second electrode and the piezoelectric film where the second electrode is absent, and having the thickness varying on the piezoelectric film and on the periphery of the second electrode.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 12, 2008
From: ITAYA, KAZUHIKO; OHARA, RYOICHI; SANO, KENYA; YASUMOTO, TAKAAKI; YANASE, NAOKO
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 021822/0336 →
Priority Claims (1)
JP 2005-229815 · Aug 8, 2005 · national
Continuity (1)
Related Publication 20090033177A1 · Feb 5, 2009