Thermal processing apparatus for substrate employing photoirradiation
View Patent ↗A lamp house storing a plurality of flash lamps and a chamber storing and holding a semiconductor wafer are fitted to each other in an openable/closable manner. The lamp house and the chamber are fixed to a closed state with male screws. In order to process a semiconductor wafer, a shutter plate is drawn out to open an irradiation window. In this state, the shutter plate shields a space located above the male screws so that the male screws cannot be detached for opening the lamp house and the chamber. In order to open the lamp house and the chamber, the shutter plate must be inserted for shielding the irradiation window while opening the space located above the male screws. Thus, a thermal processing apparatus capable of preventing the lamps from breaking during maintenance thereof is provided.
1. A thermal processing apparatus that heats a substrate by irradiating said substrate with light, comprising:
a chamber for storing and holding said substrate, and including a chamber window that allows the passage of light into the chamber;
a lamp house storing a lamp and comprising an irradiation window passing light emitted from said lamp therethrough, the lamp house being fitted to said chamber in an openable/closable manner;
a locking mechanism that enables fixing said chamber and said lamp house to a closed state in which said chamber window and said irradiation window oppose each other; and
a shielding plate insertable into the lamp house to shield said chamber window and to enable said locking mechanism to be operated to allow opening of said chamber and said lamp house.
2. The thermal processing apparatus according to claim 1 , wherein said shielding plate is opaque with respect to said light emitted from said lamp.
3. The thermal processing apparatus according to claim 2 , wherein said lamp is a xenon flash lamp.
4. A thermal processing apparatus that heats a substrate by irradiating said substrate with light, comprising:
a chamber for storing and holding said substrate, and including a chamber window that allows the passage of light into the chamber;
a lamp house storing a lamp and comprising an irradiation window passing light emitted from said lamp therethrough, the lamp house being fitted to said chamber in an openable/closable manner;
a locking mechanism that enables fixing said chamber and said lamp house to a closed state in which said chamber window and said irradiation window oppose each other; and
a shielding plate that is capable of blocking access to said locking mechanism and capable of being drawn out in said closed state while shielding said irradiation window by inserting said shielding plate into said lamp housing thereby allowing release of said locking mechanism and enabling opening of said chamber and said lamp house.
5. The thermal processing apparatus according to claim 4 , wherein said shielding plate is opaque with respect to said light emitted from said lamp.
6. The thermal processing apparatus according to claim 5 , wherein said lamp is a xenon flash lamp.
7. The thermal processing apparatus according to claim 1 , wherein the locking mechanism comprises screws.
8. The thermal processing apparatus according to claim 1 , including a hinge mechanism by which the chamber and the lamp house are mechanically coupled to one another.
9. The thermal processing apparatus according to claim 4 , wherein the locking mechanism comprises screws.
10. The thermal processing apparatus according to claim 4 , including a hinge mechanism by which the chamber and the lamp house are mechanically coupled to one another.