Multi-foil optic
The invention provides a miniaturized multi-foil object for use in a laboratory environment and other practical applications that require small or portable and/or disposable high energy radiation optics. Specifically, the invention finds utility in high energy lithographic systems, such as X-ray or EUV lithography, as a condenser optic or in topographic systems. In lithographic systems, the present invention exhibits square symmetry, a relatively large aperture size, and disposability. Additionally, the multi-foil optic of the invention provides a high throughput efficiency.
1. A multi-foil optic comprising:
a plurality of flat plates each having a reflecting surface, and positioned normal to an arc to provide total external reflection to high energy radiation incident on the plates from a high energy radiation source, to focus the incident high energy radiation on a designated surface, wherein each plate has a thickness in the range of 50-70 μm.
2. The multi-foil optic of claim 1 , wherein the high energy radiation comprises X-ray radiation.
3. The multi-foil optic of claim 1 , wherein the high energy radiation comprises extreme ultraviolet (EUV) radiation.
4. The multi-foil optic of claim 1 , wherein the plates are made of glass.
5. The multi-foil optic of claim 1 , wherein the plates are made of mica.
6. A method for performing high energy radiation lithography, comprising the steps of:
receiving high energy radiation from a high energy radiation source;
focusing the high energy radiation from the high energy radiation source using a multi-foil optic, the multi-foil optic comprising a plurality of flat plates each having a reflecting surface, and positioned normal to an arc to provide total external reflection to high energy radiation incident on the plates from a high energy radiation source, to focus the incident high energy radiation on a designated surface, wherein each plate has a thickness in the range of 50-70 μm; and
receiving the focused high energy radiation from the multi-foil optic onto a lithographic specimen via a lithographic mask.
7. The method of claim 6 , wherein the high energy radiation comprises X-ray radiation.
8. The method of claim 6 , wherein the high energy radiation comprises extreme ultraviolet (EUV) radiation.
9. A high energy lithographic system, comprising:
a high energy source;
a multi-foil optic for focusing high energy radiation from the high energy source, the multi-foil optic comprising a plurality of flat plates each having a reflecting surface, and positioned normal to an arc to provide total external reflection to high energy radiation incident on the plates from a high energy radiation source, to focus the incident high energy radiation on a designated surface, wherein each plate has a thickness in the range of 50-70 μm; and
a mask, which receives focused high energy radiation from the multi-foil optic and selectively blocks some of the radiation to form a pattern on a specimen that is exposed to high energy radiation passing through said mask.
10. The high energy lithographic system of claim 9 , wherein the high energy radiation comprises X-ray radiation.
11. The high energy lithographic system of claim 9 , wherein the high energy radiation comprises extreme ultraviolet (EUV) radiation.
12. The multi-foil optic of claim 1 , further comprising a coating on each of the flat plates.
13. The multi-foil optic of claim 1 , further comprising a multilayer coating on each of the flat plates.
14. The multi-foil optic of claim 1 , wherein the multi-foil optic has a size within a volume of about 5 mm 3 .
15. The method of claim 6 , wherein the multi-foil optic comprises a coating on each of the flat plates.
16. The method of claim 6 , wherein the multi-foil optic comprises a multilayer coating on each of the flat plates.
17. The method of claim 6 , wherein the multi-foil optic has a size within a volume of about 5 mm 3 .
18. The high energy lithographic system of claim 9 , wherein the multi-foil optic comprises a coating on each of the flat plates.
19. The high energy lithographic system of claim 9 , wherein the multi-foil optic comprises a multilayer coating on each of the flat plates.
20. The high energy lithographic system of claim 9 , wherein the multi-foil optic has a size within a volume of about 5 mm 3 .