Device for inhibiting hydrogen damage in ferroelectric capacitor devices
View Patent ↗A ferroelectric capacitor device comprises a substrate, a contact plug passing through the substrate, a first electrode formed on the substrate, the first electrode being electrically connected to said plug, a ferroelectric layer formed on the first electrode, a second electrode formed on the ferroelectric layer, one or more first encapsulation layers on the second electrode, the encapsulation layers extending over the device, and one or more hydrogen storage material layers on the encapsulation layers. One or more second encapsulation layers may be formed on the one or more hydrogen storage material layers.
1. A device comprising:
a substrate;
a contact plug passing through said substrate;
a first electrode formed on said substrate, said first electrode being electrically connected to said plug;
a ferroelectric layer formed on said first electrode;
a second electrode formed on said ferroelectric layer;
one or more first encapsulation layers on said second electrode, said one or more encapsulation layers extending over said device; and
plurality of hydrogen storage material layers on said one or more encapsulation layers.
2. The device of claim 1 , further comprising one or more second encapsulation layers formed on said plurality of hydrogen storage material layers.
3. The device of claim 1 , further comprising a glue layer between said first electrode and said ferroelectric layer.
4. The device of claim 1 , wherein any one of said plurality of hydrogen storage material layers comprises LaNi x , Ti 45 Zr 38 Ni 171 -phase, or amorphous Sm—Co.
5. The device of claim 1 , wherein any one of said one or more first encapsulation layers comprises Si 3 N 4 , or Al 2 O 3 .
6. The device of claim 1 , wherein any one of said one or more first encapsulation layers comprises TiO 2 , HfO 2 , ZrO 2 , or CeO 2 , or any one of their silicates.
7. The device of claim 2 , wherein any one of said one or more second encapsulation layers comprises Si 3 N 4 , or Al 2 O 3 .
8. The device of claim 2 , wherein any one of said second one or more encapsulation layers comprises TiO 2 , HfO 2 , ZrO 2 , or CeO 2 , or any one of their silicates.
9. A ferroelectric capacitor device comprising the device of claim 1 .
10. A ferroelectric Random Access Memory device comprising one or more devices according to claim 1 .
11. The device of claim 1 , wherein each of the plurality of hydrogen material layers is formed of a different hydrogen storage material.