Resin-encapsulated semiconductor apparatus and process for its fabrication
View Patent ↗The present invention provides a resin-encapsulated semiconductor apparatus comprising a semiconductor device having a ferroelectric film and a surface-protective film, and an encapsulant member comprising a resin; the surface-protective film being formed of a polyimide. The present invention also provides a process for fabricating a resin-encapsulated semiconductor apparatus, comprising the steps of forming a film of a polyimide precursor composition on the surface of a semiconductor device having a ferroelectric film; heat-curing the polyimide precursor composition film to form a surface-protective film formed of a polyimide; and encapsulating, with an encapsulant resin, the semiconductor device on which the surface-protective film has been formed. The polyimide may preferably have a glass transition temperature of from 240° C. to 400° C. and a Young's modulus of from 2,600 MPa to 6 GPa. The curing may preferably be carried out at a temperature of from 230° C. to 300° C.
1. A resin-encapsulated semiconductor apparatus comprising:
a semiconductor device having a ferroelectric film and a surface-protective film, and
an encapsulant member comprising a resin;
wherein said surface-protective film consists of a heat-cured polyimide prepared by heat-curing a polyimide precursor containing:
a polyimide acid comprising repeating units represented by a chemical formula (I) as given below;
an amine compound having carbon-carbon double bonds; and
a photopolymerization initiator and/or a sensitizer
wherein
an amount of said amine compound is 1 to 400 parts by weight based on 100 parts by weight of said polyimide precursor and a total amount of said photopolymerization initiator and said sensitizer is 0.1 to 30 parts by weight based on 100 parts by weight of said polyimide precursor;
wherein R 1 is at least one of tetravalent aromatic organic groups shown in the following chemical formula group (II) shown below, and R 2 is at least one of divalent aromatic organic groups shown in a chemical formula groups (III) and (IV) shown below;
2. The resin-encapsulated semiconductor apparatus according to claim 1 , wherein said heat-cured polyimide has a glass transition temperature of from 240° C. to 400° C.
3. The resin-encapsulated semiconductor apparatus according to claim 1 , wherein said heat-cured polyimide has a Young's modulus of from 2600 MPa to 6 GPa.
4. The resin-encapsulated semiconductor apparatus according to claim 2 , wherein said heat-cured polyimide has a Young's modulus of from 2600 MPa to 6 CPa.
5. A process for manufacturing a resin-encapsulated semiconductor apparatus comprising a semiconductor device having a ferroelectric film and a surface-protective film, and an encapsulant member comprising a resin, comprising steps of:
forming said surface-protective film consisting of a heat-cured polyimide by heat-curing a polyimide precursor containing:
a polyimide acid comprising repeating units represented by a chemical formula (I) as given below;
an amine compound having carbon—carbon double bonds; and
a photopolymerization initiator and/or a sensitizer
wherein
an amount of said amine compound is 1 to 400 parts by weight based on 100 parts by weight of said polyimide precursor and a total amount of said photopolymerization initiator and said sensitizer is 0.1 to 30 parts by weight based on 100 parts by weight of said polyimide precursor,
wherein R 1 is at least one of tetravalent aromatic organic groups shown in the following chemical formula group (II) shown below, and R 2 is at least one of divalent aromatic organic groups shown in a chemical formula groups (III) and (IV) shown below;