IP Library Granted Patent US 7,213,331
Granted Patent B2
US 7,213,331 · App. 10/689,471 · Granted May 8, 2007

Method for forming stencil

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Quick Facts
Patent No.
US 7,213,331
App. No.
10/689,471
Granted
May 8, 2007
Kind
B2
Abstract

A method of forming a stencil for the manufacture of semiconductor devices includes defining a plurality of slightly spaced segmental annular openings in a stencil plate. The spacing between the segmental annular openings define spokes extending from a central portion of said stencil connected via those spokes to the rest of the stencil plate. The spokes extend past two adjacent annular segments.

Claims (7)

1. A method of making a stencil plate for depositing material on a semiconductor device comprising:

forming a plurality of segmental annular openings in a stencil plate to define a central portion of the plate, a plurality of spokes, and a remainder of said stencil plate, said spokes connecting said central portion to the remainder of said plate between adjacent segmental annular openings, said stencil plate having a thickness from about 3 to about 10 mils, wherein said stencil plate adapted to be removable positioned over a semiconductor device for depositing material on the semiconductor before removing the stencil from over the device,

depositing the material in said openings and under said central portion of said plate to form an interrupted circular annulus resinous member.

2. The method of claim 1 including forming said spokes to have a length of about 1 mil.

3. The method of claim 1 including forming said central portion in a circular shape.

4. The method of claim 1 including forming at least four openings and at least four spokes.

5. The method of claim 1 including maintaining a gap between said stencil and said device.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 4, 2010
From: MICRON TECHNOLOGY, INC.
To: ROUND ROCK RESEARCH, LLC
Reel/Frame 023786/0416 →