Aqueous dispersion for chemical mechanical polishing
View Patent ↗The invention provides an aqueous dispersion for chemical mechanical polishing that can limit scratches of a specific size to a specific number, even with interlayer insulating films with small elastic moduli (silsesquioxane, fluorine-containing SiO 2 , polyimide-based resins, and the like.). When using the aqueous dispersion for chemical mechanical polishing of an interlayer insulating film with an elastic modulus of no greater than 20 GPa as measured by the nanoindentation method, the number of scratches with a maximum length of 1 μm or greater is an average of no more than 5 per unit area of 0.01 mm 2 of the polishing surface. An aqueous dispersion for CMP or an aqueous dispersion for interlayer insulating film CMP according to another aspect of the invention contains a scratch inhibitor agent and an abrasive. The scratch inhibitor may be biphenol, bipyridyl, 2-vinylpyridine, salicylaldoxime, o-phenylenediamine, catechol, 7-hydroxy-5-methyl-1,3,4-triazaindolizine, and the like. The abrasive may consist of inorganic particles, organic particles or organic/inorganic composite particles. The organic/inorganic composite particles may be formed by polycondensation of an alkoxysilane, aluminum alkoxide, titanium alkoxide, and the like in the presence of polymer particles of polystyrene or the like, and bonding of polysiloxane, and the like, on at least the surface of the polymer particles.
1. A chemical mechanical polishing process comprising:
polishing of an interlayer insulating film with an elastic modulus of no greater than 20 GPa as measured by the nanoindentation method, using an aqueous dispersion which comprises a scratch inhibitor and an abrasive comprising organic/inorganic composite particles, wherein
said scratch inhibitor is at least one compound selected from the group consisting of (1) biphenol, (2) bipyridyl, (3) 2-vinylpyridine and 4-vinylpyridine, (4) salicylaldoxime, (5) o-phenylenediamine and m-phenylenediamine, (6) catechol, (7) o-aminophenol, (8) thiourea, (9) an N-alkyl group-containing (meth)acrylamide, (10) an N-aminoalkyl group-containing (meth)acrylamide, (11) a heterocyclic compound with a heteropentacycle and with no aromatic ring forming the skeleton, (12) a heterocyclic compound with a heteropentacycle and with an aromatic ring forming the skeleton, (13) phthalazine, (14) a compound with a heterohexacycle bearing three nitrogen atoms and a derivative of any of compounds (1) through (14), and (15) a surfactant;
each of said organic/inorganic composite particles comprises an organic particle and a coating of inorganic particles on said organic particle;
a zeta potential of said organic particle is opposite in sign to a zeta potential of each of said inorganic particles; and
said organic particle and said inorganic particles are bonded together by electrostatic force.
2. The chemical mechanical polishing process according to claim 1 , wherein said scratch inhibitor is a non-ionic surfactant which is one selected from the group consisting of polyoxyethylene alkyl ether, polyoxyethylene ether of glycerin ester, polyethylene glycol fatty acid ester, glycerin ester and sorbitan ester.
3. The chemical mechanical polishing process according to claim 1 , wherein said scratch inhibitor is 7-hydroxy-5-methyl-1,3,4-triazaindolizine.
4. The chemical mechanical polishing process according to claim 1 , wherein said scratch inhibitor comprises a combination of a compound selected from the group consisting of 7-hvdroxy-5-methyl-1,3,4-triazaindolizine and 5-amino-1H-tetrazole, and a non-ionic surfactant.
5. The chemical mechanical polishing process according to claim 1 , wherein said scratch inhibitor is a surfactant which is present in an amount of from 0.0001 to 0.1 wt %, and another scratch inhibitor, other than the surfactant, present in an amount of from 0.001 to 5 wt %, based on the weight of the aqueous dispersion.
6. The chemical mechanical polishing process according to claim 1 , wherein said abrasive is present in an amount of from 0.1 to 20 parts by weight, based on 100 parts of the aqueous dispersion.
7. The chemical mechanical polishing process according to claim 1 , wherein said aqueous dispersion has a pH of from 2 to 12.
8. The chemical mechanical polishing process according to claim 1 , wherein said organic particle comprises at least one polymer selected from the group consisting of polystyrene, styrene-based copolymers, (meth)acrylic resins, acrylic-based copolymers, polyvinyl chloride, polyacetals, saturated polyesters, polyamides, polyimides, polycarbonates, phenoxy resins, polyolefins and olefin-based copolymers.
9. The chemical mechanical polishing process according to claim 1 , wherein said abrasive consists of at least one selected from the group consisting of said organic/inorganic composite particle and organic particles.
10. The chemical mechanical polishing process according to claim 1 , wherein said abrasive consists of said organic/inorganic composite particle.
11. The chemical mechanical polishing process according to claim 1 , wherein said aqueous dispersion further comprises an oxidizing agent.
12. The chemical mechanical polishing process according to claim 11 , wherein said oxidizing agent is hydrogen peroxide.
13. The chemical mechanical polishing process according to claim 11 , wherein said aqueous dispersion further comprises an organic acid.
14. The chemical mechanical polishing process according to claim 11 , wherein said oxidizing agent is present in an amount of from 0.01 to 3 parts by weight, based on 100 parts of the aqueous dispersion.