GCIB processing of integrated circuit interconnect structures
View Patent ↗Method for removing and/or redistributing material in the trenches and/or vias of integrated circuit interconnect structures by a gas cluster ion beam (GCIB) is described to improve the fabrication process and quality of metal interconnects in an integrated circuit. The process entails opening up an undesired ‘necked in’ region at the entrance to the structure, re-depositing the barrier metal from thicker areas such as the neck or bottom of the structure to the side walls and/or removing some of the excess and undesired material on the bottom of the structure by sputtering. The GCIB process may be applied after the barrier metal deposition and before the copper seed layer/copper electroplating or the process may be applied after the formation of the copper seed layer and before electroplating. The method may extend the usability of the known interconnect deposition technologies to next generation integrated circuits and beyond.
1. Method of processing a recess extending into a semiconductor substrate and having undesired material which reduces the size of an opening of the recess, comprising the step of controllably directing an accelerated gas cluster ion beam at the undesired material.
2. The method of claim 1 , wherein the accelerated gas cluster ion beam etches the undesired material so as to remove some or all of the undesired material.
3. The method of claim 2 , wherein the undesired material is a barrier material.
4. The method of claim 2 , wherein the undesired material is a seed material.
5. The method of claim 2 , wherein the undesired material is a metal including at least one component selected from the group consisting of Ta, TiN, TaN, WN and Cu.
6. The method of claim 2 , wherein the gas cluster ion beam comprises inert gas cluster ions.
7. The method of claim 2 , wherein the gas cluster ion beam comprises gas cluster ions selected from the group consisting of Ar, F, SF 6 , CF 4 , O, and H.
8. The method of claim 2 , wherein the gas cluster ion beam comprises gas cluster ions selected from the group consisting of Cl 2 and BCl 3 .
9. The method of claim 2 , wherein the gas cluster ion beam comprises an inert gas component, a halogen-bearing gas component, and a component selected from the group consisting of O and H.
10. The method of claim 2 , wherein:
the recess is a substantially cylindrical via having a central axis; and
the gas cluster ion beam is directed approximately parallel to said central axis.
11. The method of claim 2 , wherein:
the recess is a trench having an imaginary median surface; and
the gas cluster ion beam is directed approximately parallel to the imaginary median surface.
12. A method of redistributing a material unevenly distributed at an opening of or within a recess extending into a semiconductor substrate, comprising the step of directing an accelerated gas cluster ion beam at the material.
13. The method of claim 12 , wherein:
the recess further includes a sidewall and a bottom; and
the accelerated gas cluster ion beam moves a portion of the material to improve the evenness of the unevenly distributed material.
14. The method of claim 13 , wherein the unevenly distributed material is a barrier material.
15. The method of claim 13 , wherein the unevenly distributed material is a seed material.
16. The method of claim 13 , wherein:
the unevenly distributed material is thicker in a region near the opening and thinner in a region within the recess; and
the accelerated gas cluster ion beam redistributes a portion of the material from the thicker region to the thinner region.
17. The method of claim 13 , wherein:
the recess further includes a bottom corner where the sidewall and bottom join;
the unevenly distributed material has a discontinuity at or near the bottom corner; and
the accelerated gas cluster ion beam redistributes a portion of the unevenly distributed material to fill the discontinuity.
18. The method of claim 13 , wherein the unevenly distributed material is a metal including at least one component selected from the group consisting of Ta, TiN, TaN, WN, and Cu.
19. The method of claim 13 , wherein the gas cluster ion beam comprises inert gas cluster ions.
20. The method of claim 13 , wherein the gas cluster ion beam comprises gas cluster ions selected from the group consisting of Ar, F, SF 6 , CF 4 , O, and H.
21. The method of claim 13 , wherein the gas cluster ion beam comprises gas cluster ions selected from the group consisting of Cl 2 and BCl 3 .
22. The method of claim 13 , wherein the gas cluster ion beam comprises an inert gas component, a halogen-bearing gas component, and a component selected from the group consisting of O and H.
23. The method of claim 13 , wherein:
the recess is a substantially cylindrical via having a central axis; and
the gas cluster ion beam is directed approximately parallel to said central axis.
24. The method of claim 12 , wherein:
the recess is a trench having an imaginary median surface; and
the gas cluster ion beam is directed approximately parallel to the imaginary median surface.
25. A method of processing a recess extending into a semiconductor substrate and having a void formed therein by an undesired material obstructing an opening of the recess, comprising the step of directing an accelerated gas cluster ion beam at the undesired material.
26. The method of claim 25 , wherein the accelerated gas cluster ion beam etches the undesired material so as to reopen the obstructed opening of the recess.
27. The method of claim 25 , wherein the unevenly distributed material is a barrier material.
28. The method of claim 25 , wherein the unevenly distributed material is a seed material.
29. The method of claim 25 , wherein the unevenly distributed material is a metal including at least one component selected from the group consisting of Ta, TiN, TaN, WN, and Cu.
30. The method of claim 25 , wherein the gas cluster ion beam comprises inert gas cluster ions.
31. The method of claim 25 , wherein the gas cluster ion beam comprises gas cluster ions selected from the group consisting of Ar, F, SF 6 , CF 4 , O, and H.
32. The method of claim 25 , wherein the gas cluster ion beam comprises gas cluster ions selected from the group consisting of Cl 2 and BCl 3 .
33. The method of claim 25 , wherein the gas cluster ion beam comprises an inert gas component, a halogen-bearing gas component, and a component selected from the group consisting of O and H.
34. The method of claim 25 , wherein:
the recess is a substantially cylindrical via having a central axis; and
the gas cluster ion beam is directed approximately parallel to the central axis.
35. The method of claim 25 , wherein:
the recess is a trench having an imaginary median surface; and
the gas cluster ion beam is directed approximately parallel to the imaginary median surface.