Nitrogen-enriched low-k barrier layer for a copper metallization layer
The effect of resist poisoning may be eliminated or at least substantially reduced in the formation of a low-k metallization layer, in that a nitrogen-containing barrier layer is provided with a surface modified by plasma treatment. Consequently, diffusion of nitrogen and nitrogen compounds in vias formed in the low-k dielectric layer is significantly suppressed, so that in a subsequent photolithography step interaction of nitrogen and nitrogen compounds with the photoresist is remarkably reduced.
1. A method, comprising:
forming a nitrogen-enriched silicon carbide-containing layer over a substrate;
modifying at least an exposed surface of said nitrogen-enriched silicon carbide containing layer by treating the exposed surface with an inert plasma atmosphere;
forming a low-k dielectric layer over said nitrogen-enriched silicon carbide-containing layer;
performing a patterning process to form a via in said low-k dielectric layer by means of a first resist mask;
after forming said via, performing an out-gassing step to remove contaminants from said nitrogen-enriched silicon carbide-containing layer; and
after performing said out-gassing step, performing a patterning process to form a trench in said low-k dielectric layer by means of a second resist mask.
2. The method of claim 1 , wherein said plasma atmosphere is established without interrupting a vacuum condition generated during the formation of said nitrogen-enriched silicon carbide-containing layer.
3. The method of claim 1 , wherein said inert plasma atmosphere is substantially established from helium.
4. The method of claim 1 , wherein said nitrogen-enriched silicon carbide-containing layer is formed by plasma enhanced vapor deposition.
5. The method of claim 1 , further comprising, prior to modifying the surface, purging said substrate with a gas used to establish said plasma atmosphere.
6. The method of claim 5 , further comprising, prior to modifying the surface, establishing a stabilized gaseous atmosphere including a gas used to subsequently establish said plasma atmosphere.
7. A method of forming a metallization layer, the method comprising:
depositing a nitrogen-containing low-k barrier layer over a substrate;
modifying a surface of said nitrogen-containing low-k barrier layer by introducing noble gas atoms into a region of said nitrogen-containing low-k barrier layer by exposing said nitrogen containing low-k barrier layer to a plasma treatment comprising a noble gas;
depositing a low-k dielectric layer over said nitrogen-containing low-k barrier layer;
patterning said low-k dielectric layer by a lithography process, wherein said modified surface reduces resist poisoning in said lithography process, wherein patterning said low-k dielectric layer includes forming a via in said low-k dielectric layer by means of a first resist mask;
after forming said via, performing an out-gassing step to remove contaminants from said nitrogen-containing low-k barrier layer;
after performing said out-gassing step, forming a trench in an upper portion of said low-k dielectric layer by means of a second resist mask; and
forming a metal region in said via and said trench in said patterned low-k dielectric layer.
8. The method of claim 7 , wherein said nitrogen-containing low-k barrier layer comprises silicon carbide.
9. The method of claim 7 , wherein depositing said nitrogen-containing low-k barrier layer and modifying a surface thereof is performed without exposing said substrate to an ambient atmosphere.
10. The method of claim 7 , wherein said plasma treatment includes establishing a plasma atmosphere on the basis of a noble gas.
11. The method of claim 10 , further comprising stabilizing a gas atmosphere including helium prior to establishing said plasma atmosphere.
12. The method of claim 10 , further comprising purging said substrate with a noble gas prior to establishing said plasma atmosphere.
13. The method of claim 7 , further comprising determining a degree of said resist poisoning.
14. The method of claim 13 , further comprising controlling, on the basis of said determined degree, at least one process parameter for said plasma treatment.
15. A method, comprising:
forming a barrier layer comprised of a nitrogen-enriched silicon carbide-containing layer over a substrate
exposing a surface of said barrier layer to a plasma ambient comprising a noble gas to thereby increase a concentration of atoms of said noble gas in a region of said barrier layer having a depth, wherein said depth ranges from approximately 0.3–3 nm;
forming at least one low-k dielectric layer above said barrier layer after said surface of said barrier layer is exposed to said plasma ambient;
patterning said at least one low-k dielectric layer by a lithography process, wherein said exposed surface reduces resist poisoning in said lithography process, wherein patterning said at least one low-k dielectric layer includes:
forming a via in said at least one low-k dielectric layer by means of a first resist mask;
after forming said via, performing an out-gassing step to remove contaminants from said nitrogen-enriched silicon carbide-containing barrier; and
after performing said out-gassing step, forming a trench in an upper portion of said at least one low-k dielectric layer by means of a second resist mask; and
forming a conductive interconnection in said at least one low-k dielectric layer.
16. The method of claim 15 , wherein said nitrogen-enriched silicon carbide containing layer is comprised of approximately 10–30 weight percent nitrogen.
17. The method of claim 15 , wherein said noble gas is comprised of at least one of helium, argon and krypton.