Film lamination apparatus and method and a manufacturing method of a semiconductor apparatus
View Patent ↗In a film lamination apparatus and method, there is no one-side contact of a pressing roller that presses a film to be laminated. The film is laminated using a rotatable pressing roller having a heater incorporated therein. The pressing roller is pressed onto the film placed on a semiconductor substrate while generating heat by the heater inside the pressing roller. The pressing roller is rolled on the film so as to laminate the film on the semiconductor substrate by partially heating the film by the pressing roller while moving the pressing roller.
1. A film lamination method for laminating a film on a principal surface of a semiconductor substrate by using a rotatable roller having a diameter of about 20-50 mm, a heat-generating part therein and an elastically deformable resin layer on an outer surface thereof, the film lamination method comprising:
pressing the roller onto the film placed on the principal surface of the semiconductor substrate while generating heat by the heat-generating part;
rolling the roller on the film so as to laminate the film on the semiconductor substrate by heat only from the heat-generating part while absorbing unevenness of the outer surface of the roller and unevenness of a surface of the film by elastic deformation of the elastically deformable resin layer;
wherein said roller presses the film with a pressing load of 10-20N;
wherein the heat-generating part is heated to about 200° C.; and
about 5 seconds after the roller is pressed to an area of the principal surface of the semiconductor substrate said area returns to a temperature about equal to the area's temperature prior to contact with the roller.
2. The film lamination method as claimed in claim 1 , wherein said roller includes a cylindrical metal body and the resin layer formed on an outer surface of the cylindrical metal member, and wherein the heat-generating part is provided in a central portion of the cylindrical metal member so as to extend in an axial direction of the cylindrical metal member.
3. The film lamination method as claimed in claim 2 , wherein said resin layer is formed of a fluoride resin.
4. A manufacturing method of a semiconductor device, comprising the steps of:
grinding another principal surface of the semiconductor substrate so as to thin the semiconductor substrate;
applying an attachment film onto the another principal surface of the semiconductor substrate; and
individualizing the semiconductor substrate into a plurality of semiconductor elements,
wherein the attachment film is laminated on the semiconductor substrate by pressing the attachment film placed on the another principal surface of the semiconductor substrate by a rotatable roller having a diameter of about 20-50 mm, a heat-generating part therein and an elastically deformable resin layer on an outer surface thereof, and rolling the roller on the attachment film while generating heat by only the heat-generating part while absorbing unevenness of the outer surface of the roller and unevenness of a surface of the film by elastic deformation of the elastically deformable resin layer;
wherein said roller presses the film with a pressing load of 10-20N;
wherein the heat-generating part is heated to about 200° C.; and
about 5 seconds after the roller is pressed to an area of the principal surface of the semiconductor substrate said area returns to a temperature about equal to the area's temperature prior to contact with the roller.
5. The film lamination method as claimed in claim 1 , wherein the difference in temperature between said heat generating part and said film during rolling is about 20° C.