Molecular beam epitaxy equipment
Epitaxy equipment including an epitaxy chamber under vacuum containing a substrate support and at least one cell under vacuum for evaporation of epitaxy material closed by a diaphragm having at least one opening and communicating with the epitaxy chamber by a connecting flange, and a mobile plate positioned opposite the diaphragm such that the distance of the plate from an exterior surface of the diaphragm is variable and has a section corresponding to a section of the diaphragm and a molecular beam is formed at the level of a zone surrounding the plate.
1. Epitaxy equipment comprising:
an epitaxy chamber under vacuum containing a substrate support and at least one cell under vacuum for evaporation of epitaxy material closed by a diaphragm having at least one opening and communicating with the epitaxy chamber by a connecting flange, and
a mobile plate positioned opposite the diaphragm such that the distance of the plate from an exterior surface of the diaphragm is variable and has a cross section corresponding to a cross section of the diaphragm and a molecular beam is formed at a level of a zone surrounding the plate.
2. The epitaxy equipment according to claim 1 , wherein the plate is disc-shaped.
3. The epitaxy equipment according to claim 2 , wherein the distance is 10 millimeters.
4. The epitaxy equipment according to claim 1 , wherein the plate is mobile in a direction perpendicular to the diaphragm.
5. The epitaxy equipment according to claim 1 , wherein the plate is made of metal or a dielectric material.
6. The epitaxy equipment according to claim 1 , wherein the plate is actuated by a control rod traversing a wall of the epitaxy chamber via an airtight passage.
7. The epitaxy equipment according to claim 1 , wherein the diaphragm has perforations.
8. The epitaxy equipment according to claim 1 , wherein the diaphragm has an annular opening.
9. Epitaxy equipment comprising:
an epitaxy chamber under vacuum containing a substrate support and at least one cell under vacuum for evaporation of epitaxy material closed by a diaphragm having at least one opening and communicating with the epitaxy chamber by a connecting flange,
an angularly mobile plate positioned opposite the diaphragm such that the plate forms a dihedron variable with a plane of the diaphragm, the distance of a center of the plate from an exterior surface of the diaphragm being variable,
the plate having a cross section corresponding to a cross section of the diaphragm, and
a molecular beam being formed at a level of a zone surrounding the plate.