IP Library Granted Patent US 7,180,088
Granted Patent B2
US 7,180,088 · App. 10/731,336 · Granted Feb 20, 2007

Nitride based semiconductor light-emitting device

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Quick Facts
Patent No.
US 7,180,088
App. No.
10/731,336
Granted
Feb 20, 2007
Kind
B2
Abstract

Nitride based semiconductor light-emitting devices are provided with a sufficiently low contact resistance p-type electrode. The nitride based semiconductor light-emitting devices include a p-type GaN contact layer, protrusions with fine recesses (uneven portions) formed on a surface of the p-type GaN contact layer, and a p-type electrode formed on the uneven portions.

Claims (29)

1. A nitride based semiconductor light-emitting device comprising:

a substrate;

a first conductive type nitride based semiconductor layer formed on the substrate;

an active layer with a p-n junction formed on said first conductive type nitride based semiconductor layer, said active layer being made of a nitride based semiconductor layer having the p-n junction;

a second conductive type nitride based semiconductor layer formed on said active layer, said second conductive type nitride based semiconductor layer being provided with protrusions, wherein fine recesses are formed on surfaces of the protrusions;

a first ohmic electrode formed on surfaces of the fine recesses and the protrusions of said second conductive type nitride semiconductor layer; and

a second ohmic electrode formed on said first conductive type nitride based semiconductor layer, wherein light is emitted from the first ohmic electrode.

2. A nitride based semiconductor light-emitting device according to claim 1 , wherein said protrusions have small and large ones.

3. A nitride based semiconductor light-emitting device according to claim 2 , wherein said large protrusions are wider in width than the small protrusions.

4. A nitride based semiconductor light emitting device according to claim 1 , wherein the first ohmic electrode is optically transparent.

5. A nitride based semiconductor light-emitting device comprising:

a substrate;

a first conductive type nitride based semiconductor layer formed on the substrate;

an active layer with a p-n junction formed on said first conductive type nitride based semiconductor layer, said active layer being made of a nitride based semiconductor layer having the p-n junction;

a second conductive type nitride based semiconductor layer formed on said active layer, said second conductive type nitride based semiconductor layer being provided with protrusions whose surfaces include regions out of stoichiometric compositions;

a first ohmic electrode formed on the surface of said second conductive type nitride based semiconductor layer; and

a second ohmic electrode formed on said first conductive type nitride based semiconductor layer.

6. A nitride based semiconductor light-emitting device according to claim 5 , wherein said protrusions have small and large ones.

7. A nitride based semiconductor light-emitting device according to claim 6 wherein said large protrusions are higher in height than the small protrusions.

8. A nitride based semiconductor light-emitting device according to claim 6 , wherein said large protrusions are wider in width than the small protrusions.

9. A nitride based semiconductor light-emitting device, comprising:

a substrate;

a first conductive type nitride based semiconductor layer formed on the substrate;

an active layer with a p-n junction formed on said first conductive type nitride based semiconductor layer, said active layer being made of a nitride based semiconductor layer having the p-n junction;

a second conductive type nitride based semiconductor layer formed on said active layer, said second conductive type nitride based semiconductor layer being provided with at least two sizes of protrusions formed on a surface of the second conductive type nitride based semiconductor layer, wherein fine recesses are formed on surfaces of the protrusions;

a first ohmic electrode formed on surfaces of the fine recesses and the protrusions of said second conductive type nitride based semiconductor layer; and

a second ohmic electrode formed on said first conductive type nitride based semiconductor layer, wherein light is emitted from the first ohmic electrode.

10. A nitride based semiconductor light-emitting device according to claim 9 , wherein said protrusions have small and large ones and said large protrusions are wider in width than the small protrusions.

11. A nitride based semiconductor light emitting device according to claim 9 , wherein the first ohmic electrode is optically transparent.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 30, 2018
From: TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION
To: SAMSUNG ELECTRONICS CO., LTD.
Reel/Frame 046986/0159 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 14, 2018
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA ELECTRONIC DEVICES & STORAGE CORPORATION
Reel/Frame 046364/0164 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 9, 2003
From: SUGAWARA, HIDETO
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 014795/0696 →