Method for manufacturing electro-optical substrate
To provide a method for manufacturing an electro-optical substrate having high reliability with high yield. The method for manufacturing an electro-optical substrate including a composite base plate obtained by joining a support plate to a semiconductor plate having single-crystal silicon precursor layer (semiconductor precursor layer) can include a step of forming a light-shielding layer, having a predetermined pattern, on the support plate, a step of forming an insulating layer on the light-shielding layer having the predetermined pattern, a step of providing semiconductor layers on the insulating layer, a step of oxidizing parts of the semiconductor layers to form oxide layers, and a step of removing the oxide layers. The oxide layers can have a thickness smaller than that of the insulating layer.
1. A method for manufacturing an electro-optical substrate including a composite base plate obtained by joining a support plate to a semiconductor plate having semiconductor layers, comprising:
forming a light-shielding layer, having a predetermined pattern, on a support plate;
forming an insulating layer on the light-shielding layer having the predetermined pattern;
providing semiconductor layers on the insulating layer;
partially oxidizing the semiconductor layer to form an oxide layer; and
completely removing the oxide layer, the oxid layer having a thickness smaller than that of the insulating layer.
2. The method for manufacturing an electro-optical substrate according to claim 1 , further comprising:
patterning the semiconductor layer; and
oxidizing parts of the semiconductor layers having a predetermined pattern to form the oxide layer,
the patterning step and oxidizing step being performed after the semiconductor layer-providing step.
3. The method for manufacturing an electro-optical substrate according to claim 1 , the oxide layers having a thickness smaller than that of parts of the insulating layer disposed in areas above which the semiconductor layer is not placed, and which are disposed on the light-shielding layer.
4. The method for manufacturing an electro-optical substrate according to claim 1 , further comprising:
forming a silicon nitride layer or silicon oxide nitride layer between the light-shielding layer and the insulating layer.
5. The method for manufacturing an electro-optical substrate according to claim 1 , the semiconductor layer-providing step including a sub-step of joining a single-crystal semiconductor plate including the semiconductor layers to a support plate including the insulating layer.
6. The method for manufacturing an electro-optical substrate according to claim 1 , the light-shielding layer containing a high-melting metal or a silicide containing a high-melting metal.
7. A method for manufacturing an electro-optical apparatus including a semiconductor element, comprising manufacturing an electro-optical substrate including the semiconductor element by the manufacturing method according to claim 1 .