Method of manufacturing semiconductor device
View Patent ↗The present invention relates to a method of manufacturing a semiconductor device. After an undoped amorphous silicon layer is formed, it is crystallized by means of a spike rapid thermal process so that the grain growth of a small size is facilitated. Therefore, while the grain size is formed uniformly and small, a grain cross-section of the small size, as a columnar structure, induces crystals grown in a direction perpendicular to the interface. It is therefore possible to reduce the surface roughness and accomplish an electrically uniform characteristic over the entire area.
1. A method of manufacturing a semiconductor device, comprising the steps of:
forming an amorphous silicon layer on a semiconductor substrate on which various components for forming a semiconductor device are formed; and
previously crystallizing the amorphous silicon layer by means of a spike rapid thermal annealing process, to form a crystallized amorphous polysilicon layer of which grain size is small and uniform,
wherein the spike rapid thermal annealing process is performed in an instant heating mode under a N 2 gas atmosphere at a step-up speed of 100° C./s to 300° C./s.
2. The method as claimed in claim 1 , wherein the amorphous silicon layer is an undoped amorphous polysilicon layer.
3. The method as claimed in claim 1 , wherein the amorphous silicon layer is formed at a temperature in the range of 300° C. to 600° C.
4. The method as claimed in claim 1 , wherein the spike rapid thermal process is performed at a temperature of 900° C. to 1050° C. and the annealing process of the spike rapid thermal process is controlled so that the grain size formed in a columnar shape becomes smaller than 600 Å.
5. A method of manufacturing a semiconductor device, comprising the steps of:
forming a tunnel oxide film on a semiconductor substrate;
forming an amorphous silicon layer on the tunnel oxide film;
previously crystallizing the amorphous silicon layer by means of a spike rapid thermal annealing process, to form a crystallized amorphous polysilicon layer of which grain size is small and uniform;
forming a pad nitride film on the crystallized amorphous polysilicon layer;
removing the pad nitride film, the crystallized amorphous polysilicon layer and the tunnel oxide film on an isolation region;
forming a trench in the semiconductor substrate of the isolation region;
forming thermal oxide films at sidewalls and bottoms of the trench by means of a sidewall oxidization process;
burying the trench with an insulating material to form a device isolation film; and
forming a polysilicon layer on the entire surface of the structure and then removing a portion of the polysilicon layer on the device isolation film to form a floating gate consisting of the crystallized amorphous polysilicon layer and the polysilicon layer,
wherein the spike rapid thermal annealing process is performed in an instant heating mode under a N 2 gas atmosphere at a step-up speed of 100° C./s to 300° C./s.
6. The method as claimed in claim 5 , wherein the amorphous silicon layer is an undoped amorphous polysilicon layer.
7. The method as claimed in claim 5 , wherein the amorphous silicon layer is formed at a temperature in the range of 300° C. to 600° C.
8. The method as claimed in claim 5 , wherein the spike rapid thermal process is performed at a temperature of 900° C. to 1050° C. and the annealing process of the spike rapid thermal process is controlled so that the grain size formed in a columnar shape becomes smaller than 600 Å.
9. The method as claimed in claim 5 , wherein the sidewall oxidization process is performed at a temperature where a second recrystallization that a grain of the crystallized amorphous polysilicon layer is excessively grown can be prevented.