IP Library Granted Patent US 7,105,816
Granted Patent B2
US 7,105,816 · App. 10/751,987 · Granted Sep 12, 2006

Electron beam device

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Quick Facts
Patent No.
US 7,105,816
App. No.
10/751,987
Granted
Sep 12, 2006
Kind
B2
Abstract

Disclosed here is a high resolution scanning electron microscope having an in-lens type objective lens. The microscope is structured so as to detect transmission electrons scattering at wide angles to observe high contrast STEM images according to each sample and purpose. A dark-field detector is disposed closely to the objective lens magnetic pole. The microscope is provided with means for moving the dark-field detector along a light axis so as to control the scattering angle of each detected dark-field signal.

Claims (24)

1. An electron beam device, comprising:

means for accelerating an electron beam emitted from an electron source;

an objective lens for focusing said accelerated electron beam on a sample;

means for scanning said electron beam on said sample two-dimensionally;

a transmission electron detector for detecting electrons transmitting said sample; and

means for recording or displaying said sample with signals output from said transmission electron detector;

wherein said transmission electron detector is a dark-field detector through a center portion of which transmission electrons pass; and

wherein said electron beam device also includes detector moving means for moving said dark-field detector along a light axis in an area under a lower magnetic pole of said objective lens.

2. The electron beam device according to claim 1 ,

wherein said dark-field detector is structured so as to transmit electrons through its center portion; and

wherein said electron beam device also includes a bright-field detector disposed under said dark-field detector, said bright-field detector being used to detect electrons transmitting said center portion of said dark-field detector.

3. The electron beam device according to claim 2 ,

wherein said device further includes:

a bright-field iris having two or more apertures and being disposed between said dark-field detector and said bright-field detector; and

alignment means for controlling the positions of electrons transmitting said center portion of said dark-field detector on said bright-field iris so that said electrons pass one of said apertures of said bright-field iris.

4. The electron beam device according to claim 1 ,

wherein said dark-field detector is divided into two or more partial detectors in the circumferential direction; and

wherein said electron beam device further includes a calculation device for selecting any of signals detected by partial detectors or adding/subtracting signals detected by said partial detectors to/from a signal to be output.

5. A method for measuring a sample comprising:

focusing an electron beam;

scanning a sample with the focused electron beam two-dimensionally;

detecting transmission electrons that have passed through the sample with a detector; and

recording or displaying a sample image,

wherein the detector is a dark-field detector through a center portion of which transmission electrons pass, said method further comprising moving said dark-field detector along the optical axis, positioning said dark-field detector at a particular position within a movable range of said dark-field detector, detecting transmission electrons that have passed through said sample, and recording or displaying a sample image.

Assignments (2)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 28, 2004
From: KAMIYA, CHISATO; AKATSU, MASAHIRO; SATO, MITSUGU
To: HITACHI HIGH-TECHNOLOGIES CORPORATION
Reel/Frame 015385/0920 →