IP Library Granted Patent US 7,366,009
Granted Patent B2
US 7,366,009 · App. 10/754,880 · Granted Apr 29, 2008

Separate write and read access architecture for a magnetic tunnel junction

Assignee: Honeywell International Inc.
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Quick Facts
Patent No.
US 7,366,009
App. No.
10/754,880
Granted
Apr 29, 2008
Kind
B2
Abstract

A magnetoresistive device is provided with separate read and write architecture. In one embodiment, a magnetic tunnel junction (MTJ) has a nonmagnetic nonconductive barrier layer sandwiched between two ferromagnetic conducting layers. A first read line is coupled to a first ferromagnetic layer and a second read line is coupled to a second ferromagnetic layer such that a voltage difference between the two read lines will produce a current flowing perpendicularly through each layer of the MTJ. A first write line is separated from the first read line by a first insulator and a second write line is separated from the second read line by a second insulator.

Claims (37)

1. A magnetoresistive memory cell comprising:

a magnetic tunneling junction (MTJ) element having a first side and a second side, the MTJ element comprising a barrier layer sandwiched between a magnetic free layer and a magnetic pinned layer in which the magnetic pinned layer is thicker and has a greater coercivity than the magnetic free layer;

a first read line deposited on the first side;

a first write line separated from the first read line by a first insulator, the first insulator deposited on the first read line, and the first write line deposited on the first insulator;

a second read line coupled to the second side, the MTJ element grown on the second read line; and

a second write line separated from the second read line by a second insulator, the second read line being deposited on the second insulator.

2. The memory cell of claim 1 , wherein the second read line runs perpendicular to the first read line.

3. The memory cell of claim 1 , wherein the magnetic pinned layer comprises:

a magnetizable reference layer; and

an anti-ferromagnetic layer for pinning the magnetization direction of the magnetizable reference layer, wherein the magnetization direction of the magnetizable reference layer remains substantially fixed.

4. The memory cell of claim 1 ,

wherein the first write line runs perpendicular to the second write line, and

wherein the first read line runs parallel to the first write line, and

wherein the first read line runs parallel to the second write line.

5. The memory cell of claim 1 ,

wherein the first write line runs perpendicular to the second write line, and

wherein the first read line runs parallel to the second write line, and

wherein the second read line runs parallel to the first write line.

6. A magnetic random access memory (MRAM) comprising:

a matrix of magnetic tunnel junction (MTJ) cells arranged in a plurality of rows and a plurality of columns;

each MTJ cell having a first side and a second side, the magnetic tunnel junction comprising a tunnel barrier layer sandwiched between a storage layer and a pinned layer in which the magnetic pinned layer is thicker and has a greater coercivity than the magnetic free layer;

each row comprising:

a first read line coupled to the first side of each MTJ cell in the row; and

a second write line for applying an external magnetic field to the row;

each column comprising:

a second read line coupled to the second side of each MTJ cell in the columns

each MTJ cell grown on the second read line; and

a first write line for applying an external magnetic field to the column; and

wherein at each MTJ cell, the first write line is separated from the first read line by a first insulator and the second write line is separated from the second read line by a second insulator.

7. The MRAM of claim 6 , wherein:

the pinned layer is a conducting magnetic layer that serves as a magnetic reference;

the storage layer is a conducting magnetic layer that serves as data storage; and

the tunnel barrier layer is a non-magnetic insulating layer that is sandwiched between the pinned layer and the storage layer.

8. The MRAM of claim 7 ,

wherein the pinned layer comprises a NiFe alloy,

wherein the storage layer comprises a NiFe alloy, and

wherein the tunnel barrier comprises an aluminum oxide compound.

Assignments (2)
CONFIRMATORY LICENSE Recorded Jan 27, 2011
From: HONEYWELL INTERNATIONAL INC.
To: UNITED STATES GOVERNMENT; DEFENSE THREAT REDUCTION AGENCY
Reel/Frame 025707/0897 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 22, 2004
From: KATTI, ROMNEY R.
To: HONEYWELL INTERNATIONAL INC.
Reel/Frame 015240/0306 →
Continuity (1)
Related Publication 20050152180A1 · Jul 14, 2005