Fluorine removal by ion exchange
View Patent ↗A method for removing fluorine gas from a selected environment comprises contacting the fluorine gas with water to generate a solution of hydrofluoric acid and contacting the solution of hydrofluoric acid with an ion exchange resin having an active state operative to exchange selected ions therein for fluoride ions in the solution. The apparatus ( 200 ) may include a dual resin setup ( 222, 223 ) such that one of the ion-exchange resin can be in the service cycle while the other of the ion-exchange resins undergoes the regeneration and rinse/refill cycles.
1. A method for removing fluorine gas from a selected environment, comprising the steps of:
(a) contacting the fluorine gas from the environment with a selected quantity of water in an ion-exchange resin, thereby to generate an acidic solution of hydrofluoric acid;
(b) contacting said acidic solution of hydrofluoric acid with the ion-exchange resin having an active state operative to exchange selected ions therein for fluoride ions in said acidic solution when in contact therewith; and
(c) regenerating said ion-exchange resin when it becomes exhausted by contacting said ion-exchange resin with a regenerant solution to exchange the fluoride ions in said ion-exchange resin for the selected ions contained in the regenerant solution thereby forming a selected regenerant waste product containing the fluoride ions, and
wherein said regenerant solution is selected from the group consisting of ammonium hydroxide solution, waste ammonium hydroxide solution, and any combination thereof.
2. The method according to claim 1 wherein the regenerant solution is a waste ammonium hydroxide solution.
3. The method according to claim 1 wherein the waste ammonium hydroxide solution is generated from one or more processes associated with the fluorine gas from a selected environment.
4. The method according to claim 1 wherein in step (a) a vacuum pump is used to supply the fluorine gas to the environment with the selected quantity of water in the ion-exchange resin.
5. The method according to claim 2 wherein the waste ammonium hydroxide solution is generated from a chemical-mechanical polishing (“CMP”) process.