IP Library Granted Patent US 6,841,051
Granted Patent B2
US 6,841,051 · App. 10/763,627 · Granted Jan 11, 2005

High-power ion sputtering magnetron

Assignee: Sputtering Components, Inc.
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Quick Facts
Patent No.
US 6,841,051
App. No.
10/763,627
Granted
Jan 11, 2005
Kind
B2
Abstract

A high-power ion sputtering magnetron having a rotary cathode comprising a conducting member disposed within the rotary cathode being made of an electrically conductive material for conducting electrical current from the power supply to the rotary cathode. The ion sputtering magnetron also has an electromagnetic field shield disposed between the conducting member and the drive shaft portion. The field shield is made of an electromagnetic field-permeable material such as a ferrous material for reducing damage to parts adjacent to the conducting member that are susceptible to inductive magnetic heating.

Claims (24)

1. A rotary cathode device, comprising:

a conducting member disposed within a rotary cathode for coupling electrical current from a power supply to a brush assembly, the conducting member being made of an electrically conductive material; and

an electromagnetic field shield disposed between the conducting member and an outer surface of the rotary cathode.

2. A rotary cathode device of claim 1 wherein the conducting member comprises a coolant conduit.

3. A rotary cathode device of claim 1 the electromagnetic field shield forms at least part of a drive shaft portion of the rotary cathode.

4. A rotary cathode device of claim 1 wherein the electromagnetic field shield comprises electromagnetic field-permeable material.

5. A rotary cathode device of claim 1 further comprising a drive shaft portion of the rotary cathode, the electromagnetic field shield being disposed between the conducting member and the drive shaft portion.

6. A rotary cathode device of claim 5 wherein the drive shaft portion has a bore passing there through such that the drive shaft portion includes an interior surface adjacent the bore, the electromagnetic field shield being adjacent to at least a portion of the interior surface of the drive shaft portion.

7. A rotary cathode device of claim 1 further comprising a drive shaft portion of the rotary cathode which forms at least a portion of the outer surface of the rotary cathode, the electromagnetic field shield being adjacent to at least a portion of an outer surface of the drive shaft portion.

8. A high-power ion sputtering magnetron having a rotary cathode device of claim 1 .

9. A rotary cathode device connectable to a power supply of electrical current, said rotary cathode device comprising:

a coolant conduit disposed within the rotary cathode device made of an electrically conductive material for connecting the electrical current from the power supply to the rotary cathode; and

a drive shaft portion made of a ferrous material for absorbing the electromagnetic field to reduce heat damage to parts adjacent to the coolant conduit that are susceptible to inductive magnetic heating.

10. A high-power ion sputtering magnetron, comprising:

a rotary cathode disposed upon the magnetron device, the rotary cathode comprising a conducting member disposed within the rotary cathode for coupling electrical current from a power supply to a brush assembly, the conducting member being made of an electrically conductive material, the rotary cathode further comprising an electromagnetic field shield disposed between the conducting member and an outer surface of the rotary cathode.

11. A magnetron device of claim 10 wherein the conducting member comprises a coolant conduit.

12. A magnetron device of claim 10 wherein the electromagnetic field shield forms at least part of a drive shaft portion of the rotary cathode rotatably disposed upon the magnetron device.

13. A magnetron device of claim 10 wherein the electromagnetic field shield comprises electromagnetic field-permeable material.

14. A magnetron device of claim 10 wherein the rotary cathode further comprises a drive shaft portion of the rotary cathode, the electromagnetic field shield being disposed between the conducting member and the drive shaft portion.

15. A magnetron device of claim 14 wherein the rotary cathode drive shaft portion has a bore passing there through such that the drive shaft portion includes an interior surface adjacent the bore, the electromagnetic field shield being adjacent to at least a portion of the interior surface of the drive shaft portion.

16. A magnetron device of claim 10 wherein the rotary cathode further comprises a drive shaft portion of the rotary cathode which forms at least a portion of the outer surface of the rotary cathode, the electromagnetic field shield being adjacent to at least a portion of an outer surface of the drive shaft portion.

17. A high-power ion sputtering magnetron connectable to an electrical power supply, said magnetron device comprising:

a rotary cathode rotatably mounted upon the magnetron device, said rotary cathode comprising a conducting member disposed within the rotary cathode, said conducting member being made of an electrically conductive material for connecting the electrical current from the power supply to the rotary cathode; and

a drive shaft portion rotatably mounted to the magnetron device, said drive shaft portion being made of a ferrous material for absorbing the electromagnetic field to reduce heat damage to parts adjacent to the conducting member that are susceptible to inductive magnetic heating.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 12, 2019
From: SPUTTERING COMPONENTS INC
To: BUEHLER AG
Reel/Frame 049446/0744 →
RELEASE OF SECURITY INTEREST Recorded Apr 24, 2018
From: DE LOWE REVOCABLE TRUST, TINA L. DE LOWE
To: SPUTTERING COMPONENTS, INC.
Reel/Frame 046033/0823 →
SECURITY AGREEMENT Recorded Jul 29, 2011
From: SPUTTERING COMPONENTS, INC.
To: DE LOWE REVOCABLE TRUST, TINA L.
Reel/Frame 026676/0325 →
Continuity (2)
Continuation 1009855900 · Mar 14, 2002
Related Publication 20040149576A1 · Aug 5, 2004