IP Library Granted Patent US 7,261,775
Granted Patent B2
US 7,261,775 · App. 10/765,502 · Granted Aug 28, 2007

Methods of growing a group III nitride crystal

Assignee: Ricoh Company, Ltd.
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Quick Facts
Patent No.
US 7,261,775
App. No.
10/765,502
Granted
Aug 28, 2007
Kind
B2
Abstract

A method of growing a group III nitride crystal grows a group III nitride crystal from a solution in which an alkaline metal, a group III metal and nitrogen are dissolved, and includes, in the solution, a material which increases solubility of the nitrogen into the solution.

Claims (33)

1. A method of growing a group III nitride crystal, comprising:

providing a solution in which an alkaline metal, a group III metal and nitrogen are dissolved,

wherein the solution further comprises an additional material which increases solubility of the nitrogen into the solution; and

growing a group III nitride crystal from the solution.

2. The method as claimed in claim 1 , wherein the material which increases solubility of the nitrogen into the solution is selected from a group consisting of Li, Ca and alkaline earth metals.

3. The method as claimed in claim 2 , wherein the material which increases solubility of the nitrogen into the solution is Li, and the Li is included in the solution by adding a nitrogen compound to the solution.

4. The method as claimed in claim 1 , wherein the group III nitride crystal is grown on a seed crystal.

5. The method as claimed in claim 1 , wherein the group III nitride crystal which is grown is plate-shaped or columnar.

6. A method of growing a group III nitride crystal, comprising:

preparing, as a solvent, a solution which includes an alkaline metal; and

growing a group III nitride crystal by dissolving a group III nitride into the solution and recrystallizing the group III nitride, wherein the group III nitride crystal which is grown is plate-shaped or columnar.

7. The method as claimed in claim 6 , wherein growing the group III nitride crystal further comprises setting a concentration of the group III nitride within the solution to become greater than or equal to a saturated concentration, so as to recrystallize the group III nitride and grow the group III nitride crystal.

8. The method as claimed in claim 7 , wherein the concentration of the group III nitride within the solution is set to become greater than or equal to the saturated concentration by decreasing a temperature of the solution.

9. The method as claimed in claim 6 ,

wherein the solution further comprises an additional material which increases solubility of nitrogen into the solution.

10. The method as claimed in claim 9 , wherein the material which increases solubility of nitrogen into the solution is selected from a group consisting of alkaline metals other than the alkaline metal included in the solution.

11. The method as claimed in claim 9 , wherein the material which increases solubility of nitrogen into the solution is selected from a group consisting of Li, Ca and alkaline earth metals.

12. The method as claimed in claim 11 , wherein the material which increases solubility of nitrogen into the solution is Li, and the Li is included in the solution by adding a nitrogen compound to the solution.

13. The method as claimed in claim 6 , wherein the group III nitride crystal is grown on a seed crystal.

14. A method of growing a group III nitride crystal, comprising:

providing a solution in which an alkaline metal, a group III metal and nitrogen are dissolved,

wherein the solution further comprises an additional material which controls a ratio of a growth rate of a group III nitride crystal in a first direction approximately parallel to a c-axis thereof and a growth rate of the group III nitride crystal in a second direction approximately perpendicular to the c-axis direction thereof; and

growing the group III nitride crystal from the solution.

15. The method as claimed in claim 14 , wherein the material which controls the ratio of growth rates controls the growth rate of the group III nitride crystal in the second direction to become higher than that in the first direction.

16. The method as claimed in claim 15 , wherein the material which controls the ratio of growth rates is Li.

17. The method as claimed in claim 14 , wherein the material which controls the ratio of growth rates controls the growth rate of the group III nitride crystal in the first direction to become higher than that in the second direction.

18. The method as claimed in claim 17 , wherein the material which controls the ratio of growth rates is selected from a group consisting of Ni, Mn, Fe and Co.

19. The method as claimed in claim 14 , wherein the group III nitride crystal is grown on a principal plane of a plate-shaped seed crystal, and the material which controls the ratio of growth rates controls the growth rate of the group III nitride crystal in a direction approximately parallel to the principal plane to become higher than that in a direction approximately perpendicular to the principal plane.

20. The method as claimed in claim 19 , wherein the plate-shaped seed crystal is a plate-shaped group III nitride having a c-plane as the principal plane thereof.

21. A method of growing a group III nitride crystal, comprising:

providing a solution in which an alkaline metal, a group III metal and nitrogen are dissolved,

wherein the solution further comprises Li which controls a ratio of a growth rate of a group III nitride crystal in a first direction approximately parallel to a c-axis thereof and a growth rate of the group III nitride crystal in a second direction approximately perpendicular to the c-axis direction thereof, and wherein the alkaline metal dissolved in the solution is one other than Li; and

growing the group III nitride crystal from the solution.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 18, 2020
From: SCIOCS COMPANY LIMITED
To: SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 053526/0021 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 21, 2019
From: RICOH COMPANY, LTD.
To: SCIOCS COMPANY LIMITED
Reel/Frame 048391/0473 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 20, 2004
From: IWATA, HIROKAZU; SARAYAMA, SEIJI; YAMANE, HISANORI; SHIMADA, MASAHIKO; AOKI, MASATO
To: RICOH COMPANY, LTD.
Reel/Frame 015586/0882 →
Priority Claims (6)
JP 2003-019716 · Jan 29, 2003 · national
JP 2003-071302 · Mar 17, 2003 · national
JP 2003-081836 · Mar 25, 2003 · national
JP 2004-011536 · Jan 20, 2004 · national
JP 2004-012906 · Jan 21, 2004 · national
JP 2004-013562 · Jan 21, 2004 · national
Continuity (1)
Related Publication 20040226503A1 · Nov 18, 2004