Method for producing ink jet head
A method for producing an ink jet head including, on a substrate, a piezoelectric element for discharging an ink from a discharge port, and an ink flow path communicating with the discharge port so as to correspond to the piezoelectric element, the method comprising in this order a step of providing, on the substrate, a mold material corresponding to the ink flow path, a step of providing a wall material of the ink flow path so as to cover the mold material, a step of eliminating a portion of the substrate corresponding to the piezoelectric element thereby forming a space in the substrate, and a step of eliminating the mold material thereby forming the ink flow path.
1. A method for producing an ink jet head including, on a substrate, a piezoelectric element for discharging an ink from a discharge port, and an ink flow path communicating with said discharge port so as to correspond to said piezoelectric element, the method comprising in this order:
a step of providing a selectively etchable sacrifice layer on said substrate;
a step of forming an etching-resistant etching stop layer so as to cover said sacrifice layer;
a step of forming a film of said piezoelectric element on said etching stop layer;
a step of forming a vibrating plate on the film of said piezoelectric element;
a step of providing, on said substrate, a mold material corresponding to said ink flow path;
a step of providing a wall material of said ink flow path so as to cover said mold material;
a step of eliminating a portion of said substrate corresponding to said piezoelectric element thereby forming a space in said substrate; and
a step of eliminating said mold material thereby forming said ink flow path.
2. An ink jet head producing method according to claim 1 , wherein, in said step of forming the space in the substrate, a crystal axis anisotropic etching is executed on said substrate from a rear face thereof until said sacrifice layer is removed, and said etching stop layer is then removed.