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App. No. 10/776,685 · Confirmation No. 3817

Optical lithography using both photomask surfaces

Inventor: Mark C. Peterman
Abandoned -- Failure to Respond to an Office Action View Publication ↗
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 Code Description Pages PDF
2007-02-22 ABN Abandonment 2 View
2006-06-14 CTFR Final Rejection 7 View
2006-06-14 892 List of references cited by examiner 1 View
2006-06-14 SRFW Search information including classification, databases and other search related notes 1 View
2006-05-01 A... Amendment/Request for Reconsideration-After Non-Final Rejection 2 View
2006-05-01 CLM Claims 8 View
2006-05-01 REM Applicant Arguments/Remarks Made in an Amendment 1 View
2006-05-01 WFEE Fee Worksheet (SB06) 1 View
2006-02-10 CTNF Non-Final Rejection 6 View
2006-02-10 1449 List of References cited by applicant and considered by examiner 1 View
2006-02-10 892 List of references cited by examiner 1 View
2006-02-10 BIB Bibliographic Data Sheet 2 View
2006-02-10 FWCLM Index of Claims 1 View
2006-02-10 SRFW Search information including classification, databases and other search related notes 1 View
2006-01-31 SRNT Examiner's search strategy and results 1 View
2004-07-01 OATH Oath or Declaration filed 1 View
2004-05-12 PEFN Pre-Exam Formalities Notice 2 View
2004-02-10 TRNA Transmittal of New Application 1 View
2004-02-10 SPEC Specification 12 View
2004-02-10 CLM Claims 3 View
2004-02-10 ABST Abstract 1 View
2004-02-10 DRW Drawings-only black and white line drawings 2 View
2004-02-10 OATH Oath or Declaration filed 2 View
2004-02-10 IDS Information Disclosure Statement (IDS) Form (SB08) 3 View
2004-02-10 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
10/776,685
Filed
2004-02-10
Pub. No.
US20040223206A1
Art Unit
1756