Patent Application
Provisional
Small
App. No. 60/447,509
· Confirmation No. 1334
Mask material and technique for interference and phase-based lithography
Inventor:
Mark C. Peterman
Provisional Application Expired
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⬇ PDF
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2003-02-14 | TRNA |
Transmittal of New Application | 2 | View | |
| 2003-02-14 | SPEC |
Specification | 3 | View | |
| 2003-02-14 | CLM |
Claims | 2 | View | |
| 2003-02-14 | ABST |
Abstract | 1 | View | |
| 2003-02-14 | LET. |
Miscellaneous Incoming Letter | 8 | View | |
| 2003-02-14 | DRW |
Drawings-only black and white line drawings | 1 | View |
Inventors
Mark C. Peterman
Palo Alto, CA
Attorneys & Agents of Record
Prosecution
- Customer No.
- 30869
- Docket No.
- S02-295/PROV
- Confirmation No.
- 1334
No recorded assignments were found for this patent.
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Quick Facts
- App. No.
- 60/447,509
- Filed
- 2003-02-14
External Links