High withstand voltage field effect semiconductor device with a field dispersion region
It is intended to provide a high withstand voltage field effect type semiconductor device that relaxes electric fields in a semiconductor substrate without thickening thickness of a drift region and achieves withstand-ability against high voltage without sacrificing ON-voltage, switch-OFF characteristics, and miniaturization. A field effective type semiconductor device comprises emitter regions 100, 104 and gate electrodes 106 and the like on a surface (upper surface in FIG. 2 ), a collector region 101 and the like on the other surface (lower surface in FIG. 2 ), wherein N − field dispersion regions 111 of low impurity concentration are arranged between P body regions 103 facing to gate electrodes 106 and an N drift region 102 below P body regions 103 . Thereby, electric field between collector and emitter is relaxed and high withstand voltage field effect type semiconductor device is realized. Another field dispersion region can be arranged between the N drift region 102 and P + collector region 101 below the N drift region 102.
1. A high withstand voltage field effect type semiconductor device comprising:
a body region arranged in a semiconductor substrate;
a gate electrode facing to the body region;
a drift region arranged below the body region in the semiconductor substrate, the drift region having a conduction type opposite to that of the body region;
a field dispersion region arranged between the body region and the drift region, the field dispersion region having a conduction type which is the same as that of the drift region and having a low net impurity concentration; and
emitter regions arranged discretely at an opposite side of the drift regions, with the body region arranged between the emitter regions and the drift region, the emitter regions having a conduction type opposite to that of the body region; and
wherein field dispersion regions are arranged discretely corresponding to the emitter regions.
2. A high withstand voltage field effect type semiconductor device according to claim 1 further comprising:
a buffer region arranged at an opposite side of the body region with the drift region arranged between the buffer region and the body region, the buffer region having a same conduction type as the drift region; and
a second field dispersion region arranged between the drift region and the buffer region, the second field dispersion region having a same conduction type as the drift region and having a low net impurity concentration.
3. A high withstand voltage field effect type semiconductor device according to claim 2 ,
wherein a thickness of the buffer region is smaller than a dispersion length of minority carrier.
4. A high withstand voltage field effect type semiconductor device according to claim 2 :
further comprising a collector region arranged at an opposite side of the drift region with the buffer region arranged between the collector region and the drift region, the collector region having an opposite conduction type to that of the drift region; and
wherein a net impurity concentration of the buffer region is the same as or lower than half of a net impurity concentration of the collector region.
5. A high withstand voltage field effect type semiconductor device according to claim 4 ,
wherein a thickness of the buffer region is smaller than a dispersion length of minority carrier.
6. A high withstand voltage field effect type semiconductor device comprising:
a body region arranged in a semiconductor substrate;
a gate electrode facing to the body region;
a drift region arranged below the body region in the semiconductor substrate, the drift region having a conduction type opposite to that of the body region;
a field dispersion region arranged between the body region and the drift region, the field dispersion region having a conduction type which is the same as that of the drift region and having a low net impurity concentration; and
emitter regions arranged discretely at an opposite side of the drift regions, with the body region arranged between the emitter regions and the drift region, the emitter regions having a conduction type opposite to that of the body region,
wherein field dispersion regions are arranged discretely corresponding to the emitter regions;
wherein the gate electrode is trench-structured; and
wherein the field dispersion region is formed extending to a bottom of the gate electrode.
7. A high withstand voltage field effect type semiconductor device according to claim 6 further comprising:
a buffer region arranged at an opposite side of the body region with the drift region arranged between the buffer region and the body region, the buffer region having a same conduction type as the drift region; and
a second field dispersion region arranged between the drift region and the buffer region, the second field dispersion region having a same conduction type as the drift region and having a low net impurity concentration.
8. A high withstand voltage field effect type semiconductor device according to claim 7 :
further comprising a collector region arranged at opposite side of the drift region with the buffer region arranged between the collector region and the drift region, the collector region having an opposite conduction type to that of the drift region; and
wherein a net impurity concentration of the buffer region is the same as or lower than half of a net impurity concentration of the collector region.
9. A high withstand voltage field effect type semiconductor device comprising:
a body region arranged in a semiconductor substrate;
a gate electrode facing to the body region;
a drift region arranged below the body region in the semiconductor substrate, the drift region having a conduction type opposite to that of the body region;
a field dispersion region arranged between the body region and the drift region, the field dispersion region having a conduction type which is the same as that of the drift region and having a low net impurity concentration;
a buffer region arranged at an opposite side of the body region with the drift region arranged between the buffer region and the body region, the buffer region having a same conduction type as the drift region; and
a second field dispersion region arranged between the drift region and the buffer region, the second field dispersion region having a same conduction type as the drift region and having a low net impurity concentration.
10. A high withstand voltage field effect type semiconductor device according to claim 9 ,
wherein a thickness of the buffer region is smaller than a dispersion length of minority carrier.
11. A high withstand voltage field effect type semiconductor device according to claim 9 ,
further comprising a carrier life time control region including at least the buffer region.
12. A high withstand voltage field effect type semiconductor device according to claim 9 :
further comprising a collector region arranged at an opposite side of the drift region with the buffer region arranged between the collector region and the drift region, the collector region having an opposite conduction type as that of the drift region; and
wherein a net impurity concentration of the buffer region is the same as or lower than half of a net impurity concentration of the collector region.
13. A high withstand voltage field effect type semiconductor device according to claim 12 ,
wherein a thickness of the buffer region is smaller than a dispersion length of minority carrier.
14. A high withstand voltage field effect type semiconductor device comprising:
a body region arranged in a semiconductor substrate;
a gate electrode facing to the body region;
a drift region arranged below the body region in the semiconductor substrate, the drift region having a conduction type opposite to that of the body region;
a field dispersion region arranged between the body region and the drift region, the field dispersion region having a conduction type which is the same as that of the drift region and having a low net impurity concentration;
a buffer region arranged at an opposite side of the body region with the drift region arranged between the buffer region and the body region, the buffer region having a same conduction type as the drift region; and
a second field dispersion region arranged between the drift region and the buffer region, the second field dispersion region having a same conduction type as the drift region and having a low net impurity concentration, wherein
the gate electrode is trench-structured; and
the field dispersion region is formed extending to bottom of the gate electrode.
15. A high withstand voltage field effect type semiconductor device according to claim 14 ,
wherein a thickness of the buffer region is smaller than a dispersion length of minority carrier.
16. A high withstand voltage field effect type semiconductor device according to claim 14 :
further comprising a collector region arranged at opposite side of the drift region with the buffer region arranged between the collector region and the drift region, the collector region having an opposite conduction type to that of the drift region; and
wherein a net impurity concentration of the buffer region is the same as or lower than half of a net impurity concentration of the collector region.
17. A high withstand voltage field effect type semiconductor device according to claim 16 ,
wherein a thickness of the buffer region is smaller than a dispersion length of minority carrier.