IP Library Granted Patent US 6,950,780
Granted Patent B2
US 6,950,780 · App. 10/777,353 · Granted Sep 27, 2005

Database interpolation method for optical measurement of diffractive microstructures

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Quick Facts
Patent No.
US 6,950,780
App. No.
10/777,353
Granted
Sep 27, 2005
Kind
B2
Abstract

A database interpolation method is used to rapidly calculate a predicted optical response characteristic of a diffractive microstructure as part of a real-time optical measurement process. The interpolated optical response is a continuous and (in a preferred embodiment) smooth function of measurement parameters, and it matches the theoretically-calculated optical response at the database-stored interpolation points.

Claims (17)

1. A method of evaluating a diffracting structure formed on a semiconductor sample comprising the steps of:

creating a database, said database including interpolation points and associated theoretical optical response characteristics, each interpolation point corresponding to a sample parameter set and with the associated theoretical optical response characteristics being determined by applying a sample model to each of the parameter sets;

measuring the actual optical response characteristics of the sample; and

iteratively interpolating between the interpolation points using an interpolation model that defines a substantially continuous function which intersects with the interpolation points in order to derive a set of interpolated optical response characteristics that best fit the actual optical response characteristics to evaluate the sample.

2. A method as recited in claim 1 , wherein the optical response characteristics are in the form of one or both of complex reflectance coefficients and scattering matrices.

3. A method as recited in claim 1 , wherein said optical response characteristics are created and measured as a function of wavelength.

4. A method as recited in claim 1 , wherein said interpolation model utilizes one or more of linear, multi-cubic, and quadratic functions.

5. A method of evaluating parameters of a diffracting structure formed on semiconductor samples comprising the steps of:

calculating optical response characteristics for selected parameter sets, each set of parameters corresponding to an interpolation point;

defining a continuous model of the optical responses as a function of the parameters that equals the optical responses at the interpolation points;

measuring an optical signal of a sample; and

evaluating the parameters of the sample by iteratively fitting the optical signal with the interpolation model.

6. A method as recited in claim 5 , wherein the calculating comprises calculating one or both the complex reflectance coefficients and scattering matrices.

7. A method as recited in claim 5 , wherein said optical signals are measured as a function of wavelength.

8. A method as recited in claim 5 , wherein said measuring step comprises measuring reflectance of the sample.

9. A method as recited in claim 5 , wherein said interpolation model comprises one or more of linear, multi-cubic, or quadratic functions.

10. A method as recited in claim 5 , wherein fitting comprises calculating a theoretical optical signal from the model.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 24, 2005
From: THERMA-WAVE, INC.
To: TOKYO ELECTRON LIMITED
Reel/Frame 017136/0621 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 7, 2005
From: THERMA-WAVE, INC.
To: TOKYO ELECTRON LIMITED
Reel/Frame 016851/0953 →