IP Library Granted Patent US 6,903,975
Granted Patent B2
US 6,903,975 · App. 10/786,025 · Granted Jun 7, 2005

Nonvolatile semiconductor memory device

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Quick Facts
Patent No.
US 6,903,975
App. No.
10/786,025
Granted
Jun 7, 2005
Kind
B2
Abstract

A nonvolatile semiconductor memory device includes a memory cell, formed in a well in a substrate and having a source, a drain, a first gate and a second gate. A word line control circuit drives a word line connected to the second gate, a program data holding circuit holds program data, a programming voltage generator circuit applies a programming voltage onto a bit line connected to the drain, and a discrimination circuit verifies the program data. Programming is conducted by applying positive voltages to the second gate and drain, while injecting hot electrons generated in a channel portion in a vicinity of the drain when 0V is applied to the well and source to increase a threshold voltage. Verification is conducted by applying a verify voltage to the second gate, while applying a positive voltage to the drain and 0V to the well and source, thereby verifying whether the positive voltage applied is maintained or comes down to 0V, depending upon the threshold voltage, by means of the discrimination circuit.

Claims (14)

1. A nonvolatile semiconductor memory device, comprising:

a memory cell, including a source layer formed in a semiconductor substrate, a drain layer formed in said semiconductor substrate and apart from said source layer, a floating gate formed above a portion of said semiconductor substrate between said source layer and said drain layer, and a control gate formed above said floating gate;

a word line control circuit to drive a word line connected to said control gate;

a program data holding circuit to hold program data;

a programming voltage generator circuit to apply a programming voltage to a bit line connected to said drain layer; and

a discrimination circuit to verify said program data,

wherein programming of said programming data to said memory cell is conducted by injecting hot electrons generated between said source layer and said drain layer into said floating gate, and

wherein verification of said programmed data is conducted by the following steps:

(a) charging a pre-charge voltage to said bit line;

(b) making said bit line a floating state, after step (a);

(c) applying a verify voltage to said word line, after the step (b); and

(d) discriminating whether said pre-charge voltage is retained or not, depending upon a height of a threshold voltage of said memory cell, after step (c).

2. The nonvolatile semiconductor memory device, according to claim 1 , wherein said discrimination circuit has a verify circuit of a flip-flop type, an insulated-gate type transistor provided between an output node of said verify circuit and said bit line for connecting therebetween, and a circuit formed with a plural number of insulated gate-type transistor groups to convert data verified by said verify circuit, so as to transfer said data to said bit line, wherein the verified data is inverted at least one time in a series of operations of said programming and verification.

3. A nonvolatile semiconductor memory device, according to claim 1 , wherein said semiconductor source layer and said drain layer are each formed of a diffusion layer.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 23, 2015
From: HITACHI DEVICE ENGINEERING CO., LTD.
To: RENESAS TECHNOLOGY CORP.
Reel/Frame 036667/0622 →
MERGER AND CHANGE OF NAME Recorded Sep 23, 2015
From: RENESAS TECHNOLOGY CORP.; NEC ELECTRONICS CORPORATION
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 036667/0733 →
MERGER Recorded Mar 25, 2011
From: RENESAS TECHNOLOGY CORP.
To: RENESAS ELECTRONICS CORPORATION
Reel/Frame 026109/0269 →