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App. No. 10/796,376 · Confirmation No. 1909

Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof

Abandoned -- Failure to Respond to an Office Action View Publication ↗
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 Code Description Pages PDF
2006-06-08 ABN Abandonment 2 View
2005-10-03 CTNF Non-Final Rejection 8 View
2005-10-03 892 List of references cited by examiner 1 View
2005-10-03 SRFW Search information including classification, databases and other search related notes 1 View
2005-09-26 WFEE Fee Worksheet (SB06) 1 View
2004-06-21 DRW Drawings-only black and white line drawings 11 View
2004-06-21 OATH Oath or Declaration filed 4 View
2004-05-26 PEFN Pre-Exam Formalities Notice 2 View
2004-03-09 TRNA Transmittal of New Application 6 View
2004-03-09 SPEC Specification 23 View
2004-03-09 CLM Claims 3 View
2004-03-09 ABST Abstract 1 View
2004-03-09 DRW Drawings-only black and white line drawings 11 View
2004-03-09 OATH Oath or Declaration filed 4 View
2004-03-09 WFEE Fee Worksheet (SB06) 1 View
2004-03-09 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
10/796,376
Filed
2004-03-09
Pub. No.
US20050202351A1
Art Unit
1752