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App. No. 10/875,596 · Confirmation No. 1205

Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof

Abandoned -- Failure to Respond to an Office Action View Publication ↗
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 Code Description Pages PDF
2006-02-24 ABN Abandonment 2 View
2005-09-29 LET. Miscellaneous Incoming Letter 2 View
2005-09-29 OATH Oath or Declaration filed 4 View
2005-07-06 CTNF Non-Final Rejection 7 View
2005-07-06 892 List of references cited by examiner 1 View
2005-07-06 BIB Bibliographic Data Sheet 2 View
2005-07-06 SRFW Search information including classification, databases and other search related notes 1 View
2004-10-12 CFILE Request for Corrected Filing Receipt 4 View
2004-08-27 PEFR Applicant Response to Pre-Exam Formalities Notice 6 View
2004-08-27 OATH Oath or Declaration filed 4 View
2004-08-13 PEFN Pre-Exam Formalities Notice 2 View
2004-08-12 WFEE Fee Worksheet (SB06) 1 View
2004-06-24 TRNA Transmittal of New Application 9 View
2004-06-24 SPEC Specification 31 View
2004-06-24 CLM Claims 4 View
2004-06-24 ABST Abstract 1 View
2004-06-24 DRW Drawings-only black and white line drawings 11 View
2004-06-24 OATH Oath or Declaration filed 4 View
2004-06-24 WFEE Fee Worksheet (SB06) 1 View
2004-06-24 WFEE Fee Worksheet (SB06) 1 View
2004-06-24 WFEE Fee Worksheet (SB06) 1 View
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Quick Facts
App. No.
10/875,596
Filed
2004-06-24
Pub. No.
US20050202347A1
Art Unit
1752