IP Library Granted Patent US 7,498,656
Granted Patent B2
US 7,498,656 · App. 10/813,886 · Granted Mar 3, 2009

Electromagnetic shielding structure

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Quick Facts
Patent No.
US 7,498,656
App. No.
10/813,886
Granted
Mar 3, 2009
Kind
B2
Abstract

An improved electromagnetic shielding structure has been discovered. In one embodiment of the invention, an apparatus includes an inductor and an electrically conductive enclosure that electromagnetically shields the inductor. The electrically conductive enclosure has an aperture at least as large as the inductor. The aperture is substantially centered around a projected surface of the inductor. The apparatus may include one or more electrically conductive links extending across the aperture and electrically coupled to the electrically conductive enclosure. The electrically conductive links reduce an effect of electromagnetic signals external to the electrically conductive enclosure on the inductor.

Claims (29)

1. An apparatus comprising:

an inductor;

an electrically conductive enclosure electromagnetically shielding the inductor, the electrically conductive enclosure having an aperture at least as large as the inductor, the aperture being substantially centered around a projected surface of the inductor;

a plurality of electrically conductive links, individual ones of the plurality of electrically conductive links extending across the aperture; and

at least one additional electrically conductive link,

wherein the plurality of electrically conductive links are electrically coupled to the electrically conductive enclosure and are electrically coupled to each other at a first location within the aperture, and

wherein individual ones of the plurality of electrically conductive links are coupled to each other at least at a second location within the aperture by the at least one additional electrically conductive link, the at least one additional electrically conductive link being within the aperture.

2. The apparatus, as recited in claim 1 , wherein the aperture is substantially parallel to a plane of current flow in the inductor.

3. The apparatus, as recited in claim 1 ,

wherein the plurality of electrically conductive links reduce an effect of electromagnetic signals external to the electrically conductive enclosure on the inductor.

4. The apparatus, as recited in claim 1 , wherein the plurality of electrically conductive links and the at least one additional electrically conductive link reduce coupling in the inductor from external sources by approximately 6 dB.

5. The apparatus, as recited in claim 1 , wherein each of the plurality of electrically conductive links and the at least one additional electrically conductive link are approximately 5 μm wide.

6. The apparatus, as recited in claim 1 , wherein the plurality of electrically conductive links and the at least one additional electrically conductive link are formed in one or more traditional integrated circuit layers.

7. The apparatus, as recited in claim 1 , wherein the electrically conductive enclosure includes a top plate, a bottom plate, and sidewalls.

8. The apparatus, as recited in claim 7 , wherein the aperture is formed in the bottom plate.

9. The apparatus, as recited in claim 7 , wherein the bottom plate is formed in one or more integrated circuit metal layers.

10. The apparatus, as recited in claim 7 , wherein the top plate is formed in a metal layer.

11. The apparatus, as recited in claim 7 , wherein the top plate is formed in a redistribution layer.

12. The apparatus, as recited in claim 7 , wherein the top plate is formed in a package substrate.

13. The apparatus, as recited in claim 1 , wherein the inductor is formed at least partially in one or more metal layers of an integrated circuit die thicker than others of the metal layers.

14. The apparatus, as recited in claim 1 , wherein the inductor is formed at least partially in one or more redistribution layers formed on an integrated circuit die.

15. The apparatus, as recited in claim 1 , wherein the inductor is formed on an integrated circuit die.

16. The apparatus, as recited in claim 15 , wherein a conductor forming the inductor is 10 μm wide.

17. The apparatus, as recited in claim 15 , wherein the aperture and the inductor are effectively spaced at least 10.25 μm apart.

18. The apparatus, as recited in claim 1 , wherein the aperture is formed in an electrically conductive plate of the electrically conductive enclosure.

19. The apparatus, as recited in claim 1 , wherein the aperture has an approximate diameter determined by adding an approximate outer diameter of the inductor to an approximate inner diameter of the inductor.

20. The apparatus, as recited in claim 1 , wherein the at least one additional electrically conductive link intersects individual ones of the plurality of electrically conductive links at ninety degree angles.

21. The apparatus, as recited in claim 1 , wherein the first location is in the center of the aperture and the second location is between the center of the aperture and the perimeter of the aperture.

22. The apparatus, as recited in claim 1 , wherein individual ones of the plurality of electrically conductive links are coupled to at least one portion of the electrically conductive enclosure at a third location, the third location being at the perimeter of the aperture.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 29, 2021
From: SILICON LABORATORIES INC.
To: SKYWORKS SOLUTIONS, INC.
Reel/Frame 057033/0579 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 31, 2004
From: ZHANG, LIGANG; PIETRUSZYNSKI, DAVID; THOMSEN, AXEL; SMITH, KEVIN G.
To: SILICON LABORATORIES, INC.
Reel/Frame 015174/0075 →