C implants for improved SiGe bipolar yield
View Patent ↗A method for improving the SiGe bipolar yield as well as fabricating a SiGe heterojunction bipolar transistor is provided. The inventive method includes ion-implanting carbon, C, into at one of the following regions of the device: the collector region, the sub-collector region, the extrinsic base regions, and the collector-base junction region. In a preferred embodiment each of the aforesaid regions include C implants.
1. A SiGe heterojunction bipolar transistor having improved SiGe bipolar yield comprising:
a semiconductor substrate of a first conductivity type including at least a sub-collector region and a collector region;
a SiGe base layer located on said substrate, said SiGe base layer comprising at least a collector-base junction region located over the collector region and an intrinsic base region, wherein said intrinsic base region is abutted by germanium-containing extrinsic base regions that are located in upper surface regions of said SiGe base layer, yet not in direct contact with said intrinsic base region; and
an emitter region located on a portion of said intrinsic base region, said emitter region comprising at least an emitter polysilicon region, wherein at least one region of said structure selected from said collector, said sub-collector, said extrinsic base regions and said collector-base junction region includes a C implant.
2. The SiGe heterojunction bipolar transistor of claim 1 wherein said substrate is a semiconducting material selected from the group consisting of Si, Ge, SiGe, GaAs, InAs, InP and layered semiconductors.
3. The SiGe heterojunction bipolar transistor of claim 1 wherein said substrate further includes isolation regions.
4. The SiGe heterojunction bipolar transistor of claim 3 wherein said isolation regions are LOCOS regions or trench isolation regions.
5. The SiGe heterojunction bipolar transistor of claim 1 wherein said SiGe base layer is an epi-SiGe layer.
6. The SiGe heterojunction bipolar transistor of claim 5 wherein said SiGe base layer includes polycrystalline SiGe regions abutting a single-crystal SiGe region.
7. The SiGe heterojunction bipolar transistor of claim 1 wherein said emitter region includes a patterned insulator layer.
8. The SiGe heterojunction bipolar transistor of claim 7 wherein said patterned insulator layer is composed of an insulator material selected from the group consisting of SiO 2 , Si oxynitride and multi-layers thereof.
9. The SiGe heterojunction bipolar transistor of claim 1 wherein said sub-collector region and said collector region are both doped with implanted C.
10. The SiGe heterojunction bipolar transistor of claim 1 wherein said sub-collector, said collector, said extrinsic base and said collector-base junction are all doped with implanted C.
11. A SiGe heterojunction bipolar transistor having improved SiGe bipolar yield comprising:
a semiconductor substrate of a first conductivity type including at least a sub-collector region and a collector region;
a SiGe base layer located on said substrate, said SiGe base layer comprising at least a collector-base junction region located over the collector region and an intrinsic base region, wherein said intrinsic base region is abutted by non-germanium containing extrinsic base regions that are located in upper surface regions of said SiGe base layer, yet not in direct contact with said intrinsic base region; and
an emitter region located on a portion of said intrinsic base region, said emitter region comprising at least an emitter polysilicon region, wherein at least one region of said structure selected from said collector, said sub-collector, said extrinsic base regions and said collector-base junction region includes a C implant.
12. The SiGe heterojunction bipolar transistor of claim 11 wherein said substrate is a semiconducting material selected from the group consisting of Si, Ge, SiGe, GaAs, InAs, InP and layered semiconductors.
13. The SiGe heterojunction bipolar transistor of claim 11 wherein said substrate further includes isolation regions.
14. The SiGe heterojunction bipolar transistor of claim 13 wherein said isolation regions are LOCOS regions or trench isolation regions.
15. The SiGe heterojunction bipolar transistor of claim 11 wherein said SiGe base layer is an epi-SiGe layer.
16. The SiGe heterojunction bipolar transistor of claim 15 wherein said SiGe base layer includes polycrystalline SiGe regions abutting a single-crystal SiGe region.
17. The SiGe heterojunction bipolar transistor of claim 11 wherein said emitter region includes a patterned insulator layer.
18. The SiGe heterojunction bipolar transistor of claim 17 wherein said patterned insulator layer is composed of an insulator material selected from the group consisting of SiO 2 , Si oxynitride and multi-layers thereof.
19. The SiGe heterojunction bipolar transistor of claim 11 wherein said sub-collector region and said collector region are both doped with implanted C.
20. The SiGe heterojunction bipolar transistor of claim 11 wherein said sub-collector, said collector, said extrinsic base and said collector-base junction are all doped with implanted C.