Process and composition for removing residues from the microstructure of an object
View Patent ↗A process for removing residues from the microstructure of an object is provided, which comprises steps of preparing a remover including carbon dioxide, an additive for removing the residues and a co-solvent dissolving the additive in said carbon dioxide at a pressurized fluid condition; and bringing the object into contact with the remover so as to remove the residues from the object. A composition for removing residues from the microstructure of an object is also provided.
1. A composition for removing residues from the microstructure of an object comprising:
carbon dioxide;
an additive for removing the residues;
an inhibitor for suppressing residues; and
a co-solvent for dissolving said additive and said inhibitor in said carbon dioxide at a pressurized fluid condition,
wherein the inhibitor comprises a polyhydric alcohol,
wherein polyhydric alcohol is a dihydric alcohol,
wherein the dihydric alcohol is selected from ethylene glycol, propylene glycol, trimethyleneglycol, diethyleneglycol,
dipropyleneglycol, 1,2-butanediol, 1,2-butanediol, 1,4-butanediol, 2,3-butanediol, pentamethyleneglycol, hexyleneglycol, octyleneglycol, and mixtures thereof, and
wherein the dihydric alcohol comprises propylene glycol.
2. A composition for removing residues from the microstructure of an object comprising:
carbon dioxide;
an additive for removing the residues;
an inhibitor for suppressing residues; and
a co-solvent for dissolving said additive and said inhibitor in said carbon dioxide at a pressurized fluid condition,
wherein the co-solvent is the solvent, and wherein the solvent is dimethylacetamide.
3. A composition for removing residues from the microstructure of an object comprising:
carbon dioxide;
an additive for removing the residues;
an inhibitor for suppressing residues; and
a co-solvent for dissolving said additive and said inhibitor in said carbon dioxide at a pressurized fluid condition,
wherein the additive comprises a quaternaryammoniumfluorides, and
wherein the co-solvent is the mixture of co-solvents ethanol and dimethylacetamide.
4. A composition for removing residue from the microstructure of an object, comprising: carbon dioxide, a fluoride containing additive, a co-solvent or mixture of co-solvents capable of dissolving the fluoride containing additive, and an inhibitor comprising a polyhydric alcohol,
wherein the polyhydric alcohol comprises propylene glycol.
5. A composition for removing residue from the microstructure of an object, comprising: carbon dioxide, tetramethylammoniumfluoride, ethanol, dimethylacetamide, and propylene glycol.