Patent Assignment
Reel/Frame 041772/0733
Assignment of Assignor's Interest
Recorded: 2017-02-20
Pages: 35
Assignor
AIR PRODUCTS AND CHEMICALS, INC.
Executed: 2017-02-14
Assignee
VERSUM MATERIALS US, LLC
8555 S. RIVER PARKWAY, TEMPE, ARIZONA, 85284
Covered Properties
(1069)
Liquid Source Material Container and Method of Use for Semiconductor Device Manufacturing
Patent:
4,134,514 →
Application:
05/746,923 →
Bubbler System
Patent:
4,140,735 →
Application:
05/824,375 →
Method of Packaging Semiconductor Liquid Source Materials for Shipment and Use
Patent:
4,298,037 →
Application:
06/123,563 →
Title Not Available
Application:
06/151,741 →
Production of 1-Hydroxyalkylidene-1, 1-Diphosphonic Acid Esters
Patent:
4,332,736 →
Application:
06/190,009 →
Pressurized, Non-Refillable Recreation Ball Filled with Sulfur Hexafluoride
Patent:
4,358,111 →
Application:
06/250,505 →
Vapor Mass Flow Control System
Patent:
4,393,013 →
Application:
06/288,360 →
Vapor Mass Flow Control System
Patent:
4,436,674 →
Application:
06/484,198 →
Method of Shipping and Using Semiconductor Liquid Source Materials
Application:
06/548,311 →
Process for Manufacturing Thick-Film Electrical Components
Patent:
4,622,240 →
Application:
06/797,092 →
Photoresist Stripper Comprising a Pyrrolidinone, a Diethylene Glycol Ether, a Polyglycol and a Quaternary Ammonium Hydroxide
Patent:
4,744,834 →
Application:
06/857,841 →
Large Breakseal Actuator with Built-in Valve
Patent:
4,696,411 →
Application:
06/865,147 →
Septum Closure
Application:
06/944,189 →
Chemical Refill System
Patent:
4,859,375 →
Application:
06/946,828 →
Disposable Chemical Container
Patent:
4,851,821 →
Application:
06/947,913 →
Ion Beam Implant System
Patent:
4,855,604 →
Application:
06/947,914 →
Vacuum Vapor Transport Control
Patent:
4,842,827 →
Application:
06/948,120 →
A Vacuum Furnace Bottle
Patent:
310,629 →
Application:
07/010,159 →
Concentrated Stable Fluorochemical Aqueous Emulsions Containing Triglycerides
Patent:
4,895,876 →
Application:
07/028,521 →
Stable Fluorochemical Aqueous Emulsions
Patent:
4,866,096 →
Application:
07/028,522 →
Method of Forming Silicon Dioxide Glass Films
Application:
07/036,979 →
N-Fluoro-N-Perfluoromethyl Sulfonamides
Patent:
4,828,764 →
Application:
07/064,268 →
Process for the Manufacture of Copper Thick-Film Conductors Using an Infrared Furnace
Application:
07/100,382 →
Desmear and Etchback Using NF3/02 Gas Mixtures
Patent:
4,787,957 →
Application:
07/101,222 →
Septum Closure
Application:
07/188,089 →
Ion Implant Using Tetrafluoroborate
Patent:
4,851,255 →
Application:
07/190,815 →
Vapor Phase Soldering with Perfluorinated Butyl Derivative Compounds
Patent:
4,881,682 →
Application:
07/203,401 →
Inert Gas Purifier for Bulk Nitrogen Without the Use of Hydrogen or Other Reducing Gases
Patent:
4,869,883 →
Application:
07/211,484 →
Method of Depositing Arsine, Antimony and Phosphine Substitutes
Patent:
4,904,616 →
Application:
07/224,089 →
Perfluorinated Di-Isopropylmethyl Decalin
Patent:
4,827,053 →
Application:
07/227,966 →
Ultra High Purity Reagent Container with Large Breakseal
Patent:
5,041,267 →
Application:
07/248,686 →
Deposition of Silicon Oxide Films Using Alkysilane Liquid Sources
Patent:
4,981,724 →
Application:
07/263,487 →
Chemical Refill System
Patent:
4,979,643 →
Application:
07/327,281 →
Perfluorinated Propyl Derivative Compounds for Vapor Bath Soldering
Patent:
4,901,910 →
Application:
07/329,122 →
Method of Forming Silicon Dioxide Glass Films
Application:
07/336,928 →
Process for the Manufacture of Copper Thick-Film Conductors Using an Infrared Furnace
Patent:
4,965,092 →
Application:
07/345,379 →
Compressed Gas Regulator with Pressurized Sealed Bonnet
Patent:
4,915,127 →
Application:
07/357,752 →
Disposable Chemical Container
Patent:
4,966,207 →
Application:
07/359,245 →
High Step Coverage Silicon Oxide Thin Films
Application:
07/430,832 →
Method of Doping and Implanting Using Arsine, Antimony, and Phosphine Substitutes
Patent:
4,988,640 →
Application:
07/433,080 →
Gas Piston Liquid Flow Controller
Application:
07/452,901 →
Deposition of Silicon Nitride Films from Azidosilane Sources
Patent:
4,992,299 →
Application:
07/473,300 →
Deposition of Silicon Dioxide and Silicon Oxynitride Films Using Azidosilane Sources
Patent:
4,992,306 →
Application:
07/473,503 →
Method for Deposition of Silicon Films from Azidosilane Sources
Patent:
5,013,690 →
Application:
07/473,546 →
Resist Stripping
Patent:
5,102,777 →
Application:
07/473,587 →
Synthesis of Highly Fluorinated Aromatic Compounds
Patent:
5,026,929 →
Application:
07/477,289 →
Synthesis of Volatile Fluorinated and Non-Fluorinated Metal-Beta- Ketonate and Metal-Beta-Ketoiminato Complexes
Patent:
5,028,724 →
Application:
07/502,092 →
Fluxing Agents Comprising Beta-Diketone and Beta-Ketoimine Ligands and a Process for Using the Same
Patent:
5,009,725 →
Application:
07/502,209 →
Surface Cleaning Using a Cryogenic Aerosol
Patent:
5,062,898 →
Application:
07/534,810 →
Volatile Crown Ligand Beta-Diketonate Alkaline Earth Metal Complexes
Patent:
5,252,733 →
Application:
07/534,811 →
Method of Forming Silicon Dioxide Glass Films
Patent:
5,028,566 →
Application:
07/559,009 →
Delivery of Reactive Gas from Gas Pad to Process Tool
Patent:
5,137,047 →
Application:
07/572,834 →
Fluorinated Sulfonamide Derivatives
Patent:
5,227,493 →
Application:
07/576,291 →
Fluorinated Diazabicycloalkane Derivatives
Patent:
5,086,178 →
Application:
07/585,765 →
Amino Replacements for Arsine, Antimony and Phosphine
Patent:
5,124,278 →
Application:
07/586,845 →
Deposition of Tungsten Films from Mixtures of Tungsten Hexafluoride, Organohydrosilanes and Hydrogen
Application:
07/616,288 →
Fluxing Agents Comprising Beta-Diketone and Beta-Ketoimine Ligands and a Process for Using the Same
Patent:
5,062,902 →
Application:
07/635,904 →
Process for the Chemical Vapor Deposition of Copper and Etching of Copper
Patent:
5,098,516 →
Application:
07/636,316 →
Gas Piston Liquid Flow Controller
Patent:
5,046,925 →
Application:
07/638,714 →
Emergency Security Device for Head of a Leaking Gas Cylinder
Patent:
5,086,804 →
Application:
07/644,550 →
Organic Stripping Composition
Application:
07/647,487 →
Volatile Liquid Precursors for the Chemical Vapor Deposition of Copper
Patent:
5,085,731 →
Application:
07/650,332 →
Process for Kinetic Gas-Solid Chromatographic Separations
Patent:
5,069,690 →
Application:
07/660,474 →
Cleaning Agents Comprising Beta-Ketoimine Ligands and a Process for Using the Same
Patent:
5,094,701 →
Application:
07/677,915 →
Etching Agents Comprising B-Diketone and B-Ketoimine Ligands and a Process for Using the Same
Patent:
5,221,366 →
Application:
07/677,918 →
Alkaline Stripping Compositions
Patent:
5,139,607 →
Application:
07/690,110 →
Polyvinyl Butyral Pellicle Compositions
Patent:
5,244,952 →
Application:
07/694,343 →
High Step Coverage Silicon Oxide Thin Films
Patent:
5,098,865 →
Application:
07/738,065 →
Deposition of Silicon Dioxide Films at Temperatures as Low as 100 Degree C by Lpcvd Using Organodisilane Sources
Patent:
5,204,141 →
Application:
07/762,101 →
Volatile Precursors for Copper Cvd
Patent:
5,187,300 →
Application:
07/764,566 →
Cleaning Agents for Fabricating Integrated Circuits and a Process for Using the Same
Patent:
5,213,622 →
Application:
07/777,818 →
Halogenated Carboxylic Acid Cleaning Agents for Fabricating Integrated Circuits and a Process for Using the Same
Patent:
5,213,621 →
Application:
07/777,821 →
Volatile Barium Precursor and Use of Precursor in Omcvd Process
Patent:
5,319,118 →
Application:
07/779,435 →
Volatile Liquid Precursors for the Chemical Vapor Deposition of Copper
Patent:
5,144,049 →
Application:
07/781,447 →
Diffusion Gas Diluter
Patent:
5,231,865 →
Application:
07/816,193 →
Apparatus and Method for Extracting Hydrogen
Patent:
5,205,841 →
Application:
07/862,802 →
Process for Selectively Depositing Copper Aluminum Alloy Onto a Substrate
Patent:
5,273,775 →
Application:
07/867,599 →
Apparatus to Clean Solid Surfaces Using a Cryogenic Aerosol
Application:
07/869,562 →
Process for Selectively Ortho-Fluorinating Substituted Aromatic Compounds
Patent:
5,233,074 →
Application:
07/891,516 →
Low Ozone Depleting Organic Chlorides for Use During Silicon Oxidation and Furnace Tube Cleaning
Patent:
5,288,662 →
Application:
07/898,857 →
Bulkhead Mounting Assembly
Patent:
5,230,536 →
Application:
07/910,947 →
Metal Deposition
Patent:
5,232,869 →
Application:
07/920,735 →
Apparatus to Clean Solid Surfaces Using a Cryogenic Aerosol
Patent:
5,209,028 →
Application:
07/958,417 →
Surface Cleaning Using an Argon or Nitrogen Aerosol
Patent:
5,294,261 →
Application:
07/970,346 →
Process for the Preparation of Trialkyl Gallium Compounds
Patent:
5,248,800 →
Application:
07/971,874 →
Purification of Tri-Alkyl Compounds of Group 3A Metals
Patent:
5,288,885 →
Application:
07/971,875 →
Process for the Preparation of Di-Alkyl Compounds of Group 2B Metals
Patent:
5,245,065 →
Application:
07/971,876 →
Gas Phase Cleaning Agents for Removing Metal Containing Contaminants from Integrated Circuit Assemblies and a Process for Using the Same
Patent:
5,332,444 →
Application:
07/982,196 →
Process for the Production of Permeation Resistant Containers
Patent:
5,244,615 →
Application:
07/985,665 →
Coaxial Conduit Bulkhead Mounting Assembly
Patent:
5,290,071 →
Application:
08/032,368 →
High Purity Bulk Chemical Delivery System
Patent:
5,359,787 →
Application:
08/049,042 →
Process for Improved Quality of Cvd Copper Films
Patent:
5,322,712 →
Application:
08/064,185 →
Method for Plasma Etching or Cleaning with Diluted NF3
Patent:
5,413,670 →
Application:
08/089,210 →
Nitrogen Trifluoride Thermal Cleaning Apparatus and Process
Application:
08/097,424 →
Furnace Tube Cleaning Process
Patent:
5,298,075 →
Application:
08/098,496 →
Inert Gas Delivery for Reflow Solder Furnaces
Patent:
5,364,007 →
Application:
08/135,383 →
Aqueous Stripping with Composition Containing Hydroxylamine and an Alkanolamine
Patent:
5,419,779 →
Application:
08/162,429 →
Process for Preparing Difluorinated Diazoniabicycloalkane Derivatives
Patent:
5,367,071 →
Application:
08/163,254 →
Fluorinated Diazabicycloalkane Derivatives
Patent:
5,473,065 →
Application:
08/163,257 →
Method of Selective Fluorination
Application:
08/187,422 →
Nitrogen Trifluoride Thermal Cleaning Apparatus and Process
Application:
08/216,895 →
Apparatus for Containment and Scrubbing of Toxic Gas from a Leakage Location and Method Therefor
Patent:
5,482,536 →
Application:
08/226,318 →
High Purity Bulk Chemical Delivery System
Patent:
5,539,998 →
Application:
08/303,986 →
Method of Selective Fluorination
Patent:
5,442,084 →
Application:
08/330,635 →
Process for the Preparation of Trialkyl Compounds of Group 3A Metals
Patent:
5,473,090 →
Application:
08/360,845 →
Low Temperature Deposition of Silicon Dioxide Using Organosilanes
Application:
08/368,571 →
Stripping Composition Having Monoethanolamine
Patent:
5,597,420 →
Application:
08/373,559 →
Photoresist Stripping Composition
Patent:
5,554,312 →
Application:
08/374,205 →
Stripping Compositions Containing Alkanolamine Compounds
Patent:
5,563,119 →
Application:
08/378,489 →
Predecomposition of Organic Chlorides for Silicon Processing
Patent:
5,599,425 →
Application:
08/384,087 →
Nitrogen Trifluoride Thermal Cleaning Apparatus and Process
Patent:
5,797,195 →
Application:
08/390,612 →
Integrated Container Moulding and Filling Facility
Patent:
5,671,591 →
Application:
08/432,398 →
Organic Stripping Composition
Application:
08/433,677 →
Chemical Vapor Deposition (Cvd) of Silicon Dioxide Films Using Oxygen- Silicon Source Reactants and a Free Radical Promoter
Patent:
5,637,351 →
Application:
08/439,349 →
Organic Stripping Composition
Patent:
5,496,491 →
Application:
08/446,435 →
Method for the Growth of Industrial Crystals
Patent:
5,614,019 →
Application:
08/454,775 →
Adsorbent for Removal of Trace Oxygen from Inert Gases
Patent:
5,536,302 →
Application:
08/475,111 →
Nonfunctionalized Poly(Arylene Ethers)
Patent:
5,874,516 →
Application:
08/502,508 →
Nonfunctionalized Poly(Arylene Ether) Dielectrics
Patent:
5,658,994 →
Application:
08/502,511 →
Organic Stripping Composition
Application:
08/590,883 →
Process for Nitrogen Trifluoride Synthesis
Patent:
5,637,285 →
Application:
08/593,779 →
Enhanced Sensitivity for Oxygen and Other Interactive Gases in Sample Gases Using Gas Chromatography
Patent:
5,612,489 →
Application:
08/601,627 →
Plasma Etch with Trifluoroacetic Acid and Derivatives
Patent:
5,626,775 →
Application:
08/645,439 →
Ultra High Purity Delivery System for Liquefied Compressed Gases
Patent:
5,644,921 →
Application:
08/651,311 →
Surfactants for Heterogeneous Processes in Liquid or Supercritical CO2
Patent:
5,733,964 →
Application:
08/667,132 →
Process for Improved Quality of Cvd Copper Films
Patent:
35,614 →
Application:
08/667,254 →
Low Temperature Deposition of Silicon Dioxide Using Organosilanes
Patent:
5,744,196 →
Application:
08/678,277 →
Fluorochemical Recovery and Recycle Using Membranes
Patent:
5,730,779 →
Application:
08/741,843 →
Basic Stripping and Cleaning Composition
Patent:
5,709,756 →
Application:
08/744,013 →
Stripping and Cleaning Composition
Patent:
5,698,503 →
Application:
08/745,754 →
Method and Apparatus for Constant Composition Delivery of Hydride Gases for Semiconductor Processing
Patent:
5,925,232 →
Application:
08/761,563 →
Polish Process and Slurry for Planarization
Patent:
5,876,490 →
Application:
08/789,229 →
Method for the Growth of Industrial Crystals
Patent:
5,753,038 →
Application:
08/821,484 →
Aqueous Stripping and Cleaning Compositions Containing Hydroxylamine and Use Thereof
Patent:
5,928,430 →
Application:
08/855,880 →
Purification of Organosilanes of Group 13 (Iiia) and 15 (Va) Impurities
Patent:
5,902,893 →
Application:
08/858,800 →
Gas Dissolution Under Pressure
Patent:
5,862,946 →
Application:
08/891,313 →
Chemical Mechanical Polishing Composition
Patent:
5,891,205 →
Application:
08/911,076 →
Abatement of NF3 Using Small Particle Fluidized Bed
Patent:
6,106,790 →
Application:
08/914,085 →
A Process to Form Mesostructured Films
Patent:
5,858,457 →
Application:
08/937,407 →
Thermally Stable Aminosulfur Trifluorides
Patent:
6,207,860 →
Application:
08/939,635 →
Fluorination with Aminosulfur Trifluorides
Patent:
6,080,886 →
Application:
08/939,940 →
Method and Apparatus for Making Ultra-Pure Hydrogen
Patent:
5,955,044 →
Application:
08/941,530 →
Silicon Nitride from Bis(Tertiarybutylamino)Silane
Patent:
5,874,368 →
Application:
08/942,996 →
Solvent Purge Mechanism
Patent:
5,964,230 →
Application:
08/944,907 →
Aquenous Stripping and Cleaning Compositions
Patent:
5,988,186 →
Application:
08/951,424 →
Method for Removal of Moisture from Gaseous Hcl
Patent:
5,958,356 →
Application:
08/964,783 →
Abatement of NF3 with Metal Oxalates
Patent:
5,910,294 →
Application:
08/971,545 →
Method for High Rate Deposition of Tungsten
Patent:
6,204,174 →
Application:
08/977,831 →
Aqueous Stripping and Cleaning Compositions
Patent:
5,997,658 →
Application:
09/004,937 →
Surface Tension Reduction with N,N'-Dialkylalkylenediamines
Patent:
6,103,799 →
Application:
09/009,099 →
Imidazolate Sulfuryl Difluorides
Patent:
5,939,546 →
Application:
09/020,582 →
Functional Groups for Thermal Crosslinking of Polymeric Systems
Patent:
6,060,170 →
Application:
09/030,039 →
Bulk Vessel Heater Skid for Liquefied Compressed Gases
Patent:
6,025,576 →
Application:
09/034,876 →
Chemical Mechanical Polishing Composition and Process
Patent:
6,117,783 →
Application:
09/043,505 →
Recovery of Perfluorinated Compounds from the Exhaust of Semiconductor Fabs Using Membrane and Adsorption in Series
Patent:
5,976,222 →
Application:
09/046,092 →
Method and Apparatus for Constant Composition Delivery of Hydride Gases for Semiconductor Processing
Patent:
6,080,297 →
Application:
09/077,704 →
Gas Phase Removal of SIO2/Metals from Silicon
Patent:
6,159,859 →
Application:
09/093,975 →
Deposition of Silicon Dioxide and Silicone Oxynitride Using Bis (Tertiarybutylamino) Silane
Patent:
5,976,991 →
Application:
09/095,818 →
Control Vent System for Ultra-High Purity Delivery System for Liquefied Compressed Gases
Patent:
6,085,548 →
Application:
09/138,489 →
Composition and Method for Selectively Etching a Silicon Nitride Film
Patent:
6,162,370 →
Application:
09/141,897 →
Dynamic Blending Gas Delivery System and Method
Patent:
6,217,659 →
Application:
09/174,196 →
Nanoporous Polymer Films for Extreme Low and Interlayer Dielectrics
Patent:
6,187,248 →
Application:
09/196,452 →
Regeneration of Metal Cvd Precursors
Patent:
6,046,364 →
Application:
09/206,427 →
Apparatus and Method for Detecting Particles in Reactive and Toxic Gases
Patent:
6,469,780 →
Application:
09/217,113 →
Chemical Mechanical Polishing Composition and Process
Patent:
6,635,186 →
Application:
09/226,996 →
Method of Clean a Wafer Carrier
Patent:
6,248,177 →
Application:
09/227,702 →
Low Surface Tension, Low Viscosity, Aqueous, Acidic Compositions Containing Fluoride and Organic, Polar Solvents for Removal of Photoresist and Organic and Inorganic Etch Residues at Room Temperature
Abatement of F2 Using Small Particle Fluidized Bed
Patent:
6,352,676 →
Application:
09/251,083 →
Synthesis of Metal Oxide and Oxynitride
Patent:
6,616,972 →
Application:
09/256,933 →
Solvent Purge Mechanism
Patent:
6,138,691 →
Application:
09/318,003 →
Process for Removing Contaminant from a Surface and Composition Useful Therefor
Patent:
6,147,002 →
Application:
09/318,814 →
Method for Purification of Acids for Use in Semiconductor Processing
Application:
09/319,589 →
Slurry Composition and Method of Chemical Mechanical Polishing Using Same
Patent:
6,251,150 →
Application:
09/321,036 →
Production of Metal-Ligand Complexes
Patent:
6,096,913 →
Application:
09/329,417 →
Composites of Powdered Fillers and Polymer Matrix
Liquid Precursor Mixtures for Deposition of Multicomponent Metal Containing Materials
Patent:
6,238,734 →
Application:
09/350,074 →
Stripping and Cleaning Compositions
Application:
09/377,398 →
Storage and Safe Delivery of Hazardous Specialty Gases by Acid/Base Reactions with Ionic Polymers
Patent:
6,277,342 →
Application:
09/379,007 →
Vacuum Preparation of Hydrogen Halidle Drier
Patent:
6,221,132 →
Application:
09/417,668 →
Chemical Delivery System with Ultrasonic Fluid Sensors
Patent:
6,264,064 →
Application:
09/418,084 →
Process for the Synthesis of Dialkyl, Diaryl, and Arylalkyl Aminosulfur Trifluorides
Patent:
6,096,922 →
Application:
09/432,724 →
Processes for Improved Surface Properties Incorporating Compressive Heating of Reactive Gases
Patent:
6,462,142 →
Application:
09/432,980 →
Mesoporous Films Having Reduced Dielectric Constants
Application:
09/455,999 →
Use of Alkylated Polyamines in Photoresist Developers
Patent:
6,268,115 →
Application:
09/478,483 →
Chemical Mechanical Polishing Composition and Process
Patent:
6,313,039 →
Application:
09/481,050 →
Cyclic ureas in photoresist developers
Patent:
6,238,849 →
Application:
09/481,063 →
Fluorination with Aminosulfur Trifluorides
Patent:
6,222,064 →
Application:
09/483,751 →
Process for Removing Contaminant from a Surface and Composition Useful Thereful
Patent:
6,673,757 →
Application:
09/533,114 →
Cleaning compositions and use thereof containing ammonium hydroxide and fluorosurfactant
Patent:
6,358,899 →
Application:
09/534,303 →
Thermally stable aminosulfur trifluorides
Patent:
6,242,645 →
Application:
09/535,682 →
Process for generating useful electrophiles from common anions and their application in electrophilic rections with organic substrates
Patent:
6,270,843 →
Application:
09/535,756 →
Reclamation and Separation of Perfluorocarbons Using Condensatoin
Patent:
6,383,257 →
Application:
09/542,995 →
Low voc cleanroom cleaning wipe
Application:
09/544,921 →
Liquid Precursor Mixtures for Deposition of Multicomponent Metal Containing Materials
Patent:
6,503,561 →
Application:
09/546,452 →
Process for Metal Metalloid Oxides and Nitrides with Compositional Gradients
Patent:
6,537,613 →
Application:
09/546,867 →
Purification of nitrogen trifluoride by continuous cryogenic distillation
Patent:
6,276,168 →
Application:
09/566,075 →
Process for Concentrating Fluorine Compounds
Patent:
6,457,327 →
Application:
09/567,164 →
Method of Improving the Performance of an Ion Mobility Spectometer Used to Detect Trace Atmospheric Impurities in Gases
Patent:
6,639,214 →
Application:
09/567,387 →
Selective Polishing with Slurries Containing Polyelectrolytes
Patent:
6,964,923 →
Application:
09/577,347 →
Process and Apparatus for Removing Particles from High Purity Gas Systems
Patent:
6,436,170 →
Application:
09/602,933 →
Synthesis of 2-Deoxy-2-Fluoro-Arabinose Derivatives
Patent:
6,462,191 →
Application:
09/615,877 →
High purity preparation of florinated 1,3-dicarbonyls using bdm (bis-fluoroxydifluoromethane)
Patent:
6,307,105 →
Application:
09/619,604 →
Sub-Atmospheric Gas Delivery Method and Apparatus
Patent:
7,013,916 →
Application:
09/641,933 →
Composition and method for selectively etching a silicon nitride film
Patent:
6,303,514 →
Application:
09/652,416 →
Chemical delivery system with spill containment door
Patent:
6,276,404 →
Application:
09/661,750 →
Photoresist Stripper/Cleaner Compositions Containing Aromatic Acid Inhibitors
Patent:
6,558,879 →
Application:
09/668,929 →
Multiple Contents Container Assembly for Ultrapure Solvent Purging
Patent:
6,837,251 →
Application:
09/675,376 →
Deposition of Titanium Amides
Patent:
6,602,783 →
Application:
09/676,426 →
Removing Fluorine from Semiconductor Processing Exhaust Gas
Patent:
6,514,471 →
Application:
09/702,189 →
Mesoporous Films Having Reduced Dielectric Constants
Patent:
6,592,980 →
Application:
09/711,573 →
Method and apparatus for the preparation of high purity phosphine or other gas
Application:
09/720,663 →
Method for Cleaning Etcher Parts
Compositions for chemical mechanical planarization of tungsten
Application:
09/757,559 →
Publication:
US 2002/0125460
Organosilicon precursors for interlayer dielectric films with low dielectric constants
Application:
09/761,269 →
Synthesis of vicinal difluoro aromatics via reductive defluorination of tetrafluoro aromatic compounds
Application:
09/767,636 →
High purity chemical container with external level sensor and removable dip tube
Application:
09/781,855 →
Publication:
US 2002/0108670
Continuous preparation of high purity Bis(fluoroxy)difluoromethane (BDM) at elevated pressure
Application:
09/782,268 →
Publication:
US 2002/0156321
Chemical-Mechanical Planarization Using Ozone
Active Fluoride Catalysts for Fluorination Reactions
Volatile Precursors for Deposition of Metals and Metal-Containing Films
Application:
09/791,409 →
Publication:
US 2002/0013487
Dynamic Blending Gas Delivery System and Method
Apparatus for detecting liquid dry conditions for liquefied compressed gases
Application:
09/816,293 →
Publication:
US 2002/0174893
Gas control device and method of supplying gas
Application:
09/825,491 →
Publication:
US 2001/0029979
High Purity Chemical Container with External Level Sensor and Liquid Sump
Aqueous Buffered Fluoride-Containing Etch Residue Removers and Cleaners
Application:
09/881,552 →
Publication:
US 2003/0022800
Adsorbent Based Gas Delivery System with Integrated Purifier
Wafer Container Washing Apparatus
Process for Removing Contaminant from a Surface and Composition Useful Therefor
Gas control device and method of supplying gas
Application:
09/907,020 →
Publication:
US 2001/0039961
Stripping and cleaning compositions
Application:
09/929,158 →
Publication:
US 2002/0068684
Gas control device and method of supplying gas
Application:
09/929,858 →
Publication:
US 2002/0096211
Solventless Purgeable Diaphragm Valved Manifold for Low Vapor Pressure Chemicals
Patent:
6,431,229 →
Application:
09/938,883 →
Organosilicon Precursors for Interlayer Dielectric Films with Low Dielectric Constants
Compositions for Chemical Mechanical Planarization of Tantalum and Tantalum Nitride
Systems and Methods for Conditioning Ultra High Purity Gas Bulk Containers
High Flow Rate Transportable Uhp Gas Supply System
Chemical mechanical polishing compositions
Application:
09/985,870 →
Publication:
US 2002/0111024
Vapor Delivery from a Low Vapor Pressure Liquefied Compressed Gas
Patent:
6,474,077 →
Application:
10/015,495 →
Removal of Thiothionylfluoride from Sulfur Tetrafluoride
Integrated dynamic blending apparatus
Application:
10/016,076 →
Publication:
US 2002/0054956
Compositions for Chemical Mechanical Planarization of Copper
Stabilizers to Inhibit the Polymerization of Substituted Cyclotetrasiloxane
Use of Water and Acidic Water to Purify Liquid Mocvd Precursors
Patent:
6,534,666 →
Application:
10/037,739 →
Aqueous Stripping and Cleaning Composition
Cabinet for Chemical Delivery with Solvent Purging
Poly(Arylene Ether) Polymer with Low Temperature Crosslinking Grafts and Adhesive Comprising the Same
Purification of Hexafluoro-1,3-Butadiene
Patent:
6,544,319 →
Application:
10/050,352 →
Purification of Group Ivb Metal Halides
Compositions of chemical mechanical planarization slurries contacting noble-metal-featured substrates
Catalytic composition for chemical-mechanical polishing, method of using same, and substrate treated with same
Application:
10/074,757 →
Publication:
US 2003/0162398
Cvd Chamber Cleaning Using Mixed Pfcs from Capture/Recycle
Product Delivery System for Stationary or Portable Bulk Containers
Transportation and Storage of Ultra-High Purity Products
Process for the Reduction or Elimination of NH3/Hf Byproduct in the Manufacture of Nitrogen Trifluoride
Sulfurpentafluoride Compounds and Methods for Making and Using Same
Patent:
6,479,645 →
Application:
10/104,214 →
Helical built-in purifier for gas supply cylinders
Application:
10/120,708 →
Publication:
US 2003/0192430
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
Purgeable Manifold for Low Vapor Pressure Chemicals Containers
Patent:
6,648,034 →
Application:
10/155,726 →
Low Dielectric Materials and Methods for Making Same
Deposition of Titanium Amides
Preparation of Metal Imino/Amino Complexes for Metal Oxide and Metal Nitride Thin Films
Patent:
6,552,209 →
Application:
10/179,818 →
Process and Apparatus for Removing Particles from High Purity Gas Systems
Compositons for Removing Etching Residue and Use Thereof
Patent:
6,677,286 →
Application:
10/191,060 →
Adsorbent for Water Removal from Ammonia
Fluid containment vessels with chemically resistant coatings
Application:
10/191,726 →
Publication:
US 2004/0005420
Vessel with Optimized Purge Gas Flow and Method Using Same
Synthesis of Vicinal Difluoro Aromatics and Intermediates Thereof
Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials
Application:
10/198,509 →
Publication:
US 2004/0014327
Process solutions containing acetylenic diol surfactants
Application:
10/218,087 →
Publication:
US 2004/0029395
Ionic Additives for Extreme Low Dielectric Constant Chemical Formulations
Single Source Mixtures of Metal Siloxides
Plasma Cleaning Gas with Lower Global Warming Potential Than SF6
Cleaning of processing chambers with dilute NF3 plasmas
Application:
10/238,803 →
Publication:
US 2004/0045577
Process for Recovery, Purification, and Recycle of Argon
Gel-Free Colloidal Abrasive Polishing Compositions and Associated Methods
Processing of semiconductor components with dense processing fluids and ultrasonic energy
Application:
10/253,054 →
Publication:
US 2004/0055621
Novel Light Emitting Layers for Led Devices Based on High Tg Polymer Matrix Compositions
Dense Phase Processing Fluids for Microelectronic Component Manufacture
Compositions Substrate for Removing Etching Residue and Use Thereof
Manifold Valve Position Indicator and Operator Alerting System
Patent:
6,681,791 →
Application:
10/256,158 →
Mesoporous Films Having Reduced Dielectric Constants
Negative Ion Atmospheric Pressure Ionization and Selected Ion Mass Spectrometry Using a 63NI Electron Source
Adsorbent for Moisture Removal from Fluorine-Containing Fluids
Patent:
6,709,487 →
Application:
10/278,131 →
Wafer Container Washing Apparatus
Process for atomic layer deposition of metal films
Application:
10/287,903 →
Non-Thermal Process for Forming Porous Low Dielectric Constant Films
Method for nitrogen trifluoride production
Application:
10/299,482 →
Publication:
US 2004/0096386
Composition and Associated Methods for Chemical Mechanical Planarization Having High Selectivity for Metal Removal
Volatile Precursors for Deposition of Metals and Metal-Containing Films
Cerium Oxide Slurry, and Method of Manufacturing Substrate
Reducing surface tension and oxidation potential of tin-based solders
Application:
10/337,700 →
Publication:
US 2004/0129764
Process solutions containing surfactants
Application:
10/339,709 →
Publication:
US 2004/0029396
Process for the Production and Purification of Bis(Tertiary-Butylamino)Silane
Process for producing ammonia with ultra-low metals content
Application:
10/349,065 →
Publication:
US 2003/0108473
Process for the Synthesis of BRSF5
Process for Purifying Fluoroxy Compounds
Synthesis of Vicinal Difluoro Aromatics and Intermediates Thereof
Catalyst Attached to Solid and Used to Promote Free Radical Formation in Cmp Formulations
Mechanical Enhancement of Dense and Porous Organosilicate Materials by Uv Exposure
Fenton's reagent composition for chemical-mechanical polishing, method of using same, and substrate treated with same
Application:
10/393,542 →
Publication:
US 2004/0025444
Chemical Mechanical Polishing Composition and Process
Method for enhancing deposition rate of chemical vapor deposition films
Application:
10/404,190 →
Publication:
US 2004/0197474
Low Dielectric Materials and Methods for Making Same
Application:
10/404,195 →
Publication:
US 2005/0260420
Separation of C2F6 from CF4 by Adsorption on Activated Carbon
Patent:
6,669,760 →
Application:
10/409,230 →
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
Method for Etching High Dielectric Constant Materials and for Cleaning Deposition Chambers for High Dielectric Constant Materials
Application:
10/410,803 →
Publication:
US 2004/0011380
Reactive Liquid Based Gas Storage and Delivery Systems
Precursors for metal containing films
Application:
10/420,369 →
Publication:
US 2004/0215030
Methods for Depositing Metal Films on Diffusion Barrier Layers by Cvd or Ald Processes
Intra-cylinder tubular pressure regulator
Application:
10/439,565 →
Publication:
US 2003/0213521
Deposition of copper films
Application:
10/441,242 →
Publication:
US 2004/0009665
Compositions Suitable for Removing Photoresist, Photoresist Byproducts and Etching Residue, and Use Thereof
Process of Cvd of Hf and Zr Containing Oxynitride Films
Composition Comprising an Oxidizing and Complexing Compound
Chemical Mechanical Polishing Composition and Process
Periodic Acid Compositions for Polishing Ruthenium/Low K Substrates
Stabilizers to Inhibit the Polymerization of Substituted Cyclotetrasiloxane
High Purity Chemical Container with Diptube and Level Sensor Terminating in Lowest Most Point of Concave Floor
Systems and Methods for Conditioning Ultra High Purity Gas Bulk Containers
Process Solutions Containing Surfactants
Catalytic Composition for Chemical-Mechanical Polishing, Method of Using Same, and Substrate Treated with Same
Composition for Chemical-Mechanical Polishing and Method of Using Same
Unsaturated oxygenated fluorocarbons for selective aniostropic etch applications
Application:
10/619,911 →
Publication:
US 2005/0011859
Use of Hypofluorites, Fluoroperoxides, and/or Fluorotrioxides as Oxidizing Agent in Fluorocarbon Etch Plasmas
Application:
10/619,922 →
Publication:
US 2005/0014383
Poly(Arylene Ether)S Bearing Grafted Hydroxyalkyls for Use in Electrically Conductive Adhesives
Multiple Contents Container Assembly for Ultrapure Solvent Purging
Non-Thermal Process for Forming Porous Low Dielectric Constant Films
Mechanical Enhancement of Dense and Porous Organosilicate Materials by Uv Exposure
Processing of semiconductor substrates with dense fluids comprising acetylenic diols and/or alcohols
Application:
10/635,046 →
Publication:
US 2005/0029492
Process for Removing Contaminant from a Surface and Composition Useful Therefor
Process for Production of Isotopes
Compositions for Chemical Mechanical Planarization of Tantalum and Tantalum Nitride
Additives to Prevent Degradation of Alkyl-Hydrogen Siloxanes
Purgeable Container for Low Vapor Pressure Chemicals
Selective Polishing with Slurries Containing Polyelectrolytes
Monitoring of Ultra-High Purity Product Storage Tanks During Transportation
Chemical-mechanical planarization composition having PVNO and associated method for use
Application:
10/683,231 →
Publication:
US 2005/0079803
Tunable Composition and Method for Chemical-Mechanical Planarization with Aspartic Acid/Tolyltriazole
Bicine/tricine containing composition and method for chemical-mechanical planarization
Application:
10/683,233 →
Publication:
US 2005/0076579
Chemical-Mechanical Planarization Composition with Nitrogen Containing Polymer and Method for Use
Polishing composition and use thereof
Application:
10/683,553 →
Publication:
US 2005/0076580
Chemical Mechanical Polishing Composition and Process
Method for Nitrogen Trifluoride Production
Abrasive-free chemical mechanical polishing composition and polishing process containing same
Application:
10/689,043 →
Publication:
US 2004/0134873
Process Solutions Containing Surfactants Used as Post-Chemical Mechanical Planarization Treatment
Cmp Method for Copper, Tungsten, Titanium, Polysilicon, and Other Substrates Using Organosulfonic Acids as Oxidizers
Particulate or Particle-Bound Chelating Agents
Precursors for Depositing Silicon Containing Films and Processes Thereof
Purification of perfluoromethane
Application:
10/696,529 →
Publication:
US 2005/0096490
Aqueous Polyurethane Dispersion and Method for Making and Using Same
Removal of Sulfur-Containing Impurities from Volatile Metal Hydrides
Method for Etching High Dielectric Constant Materials and for Cleaning Deposition Chambers for High Dielectric Constant Materials
Compositions for Removing Etching Residue and Use Thereof
Process for Removing Water from Ammonia
Purification of Hydride Gases
Composition and associated method for oxide chemical mechanical planarization
Application:
10/730,527 →
Publication:
US 2004/0144038
Processing of Substrates with Dense Fluids Comprising Acetylenic Diols and/or Alcohols
Composition and method used for chemical mechanical planarization of metals
Application:
10/744,285 →
Publication:
US 2004/0175942
High reliability gas mixture back-up system
Application:
10/753,134 →
Publication:
US 2006/0130896
Surface Modified Colloidal Abrasives, Including Stable Bimetallic Surface Coated Silica Sols for Chemical Mechanical Planarization
Process for the Purification of NF3
Process for Producing 1,1-Difluorovinyl Cycloaliphatic Compounds
Copper Cvd Precursors with Enhanced Adhesion Properties
Patent:
6,838,573 →
Application:
10/768,370 →
Precursors for depositing silicon-containing films and processes thereof
Application:
10/780,183 →
Publication:
US 2005/0181633
Chemical-mechanical planarization using ozone
Application:
10/783,651 →
Publication:
US 2004/0161938
Bridged Carbocyclic Compounds and Methods of Making and Using Same
Transmission of Ultrasonic Energy into Pressurized Fluids
Process for Purification of Germane
Method for Removing Titanium Dioxide Deposits from a Reactor
Process Solutions Containing Surfactants
Diffusion Barrier Layers and Processes for Depositing Metal Films Thereupon by Cvd or Ald Processes
Process and Composition for Removing Residues from the Microstructure of an Object
Mechanical Enhancer Additives for Low Dielectric Films
Burner and Process for Combustion of a Gas Capable of Reacting to Form Solid Products
Liquid Media Containing Lewis Acidic Reactive Compounds for Storage and Delivery of Lewis Basic Gases
Aqueous Buffered Fluoride-Containing Etch Residue Removers and Cleaners
Storage and Delivery Systems for Gases Held in Liquid Medium
Composition for removing photoresist and/or etching residue from a substrate and use thereof
Method and Vessel for the Delivery of Precursor Materials
Composition and Associated Methods for Chemical Mechanical Planarization Having High Selectivity for Metal Removal
Passivating ALD reactor chamber internal surfaces to prevent residue buildup
Application:
10/920,541 →
Publication:
US 2006/0040054
Process for Recovery, Purification, and Recycle of Argon
Silicon nitride from aminosilane using PECVD
Application:
10/929,755 →
Publication:
US 2006/0045986
Multiple Contents Container Assembly for Ultrapure Solvent Purging
Compositions for the Removal of Organic and Inorganic Residues
Removal of Transition Metal Ternary and/or Quaternary Barrier Materials from a Substrate
Process for the Production of Nitrogen Trifluoride
Ionic Liquid Based Mixtures for Gas Storage and Delivery
Low Dielectric Materials and Methods for Making Same
Liquid Media Containing Lewis Basic Reactive Compounds for Storage and Delivery of Lewis Acidic Gases
Alumina Abrasive for Chemical Mechanical Polishing
Poly(Arylene Ether) Polymer with Low Temperature or Uv Crosslinking Grafts and Dielectric Comprising the Same
Silicon Thin Film Transistors and Solar Cells on Plastic Substrates
Application:
10/984,107 →
Publication:
US 2005/0101160
Selective Purification of Mono-Terpenes for Removal of Oxygen Containing Species
Electro-optic assemblies and materials for use therein
Application:
10/984,251 →
Publication:
US 2005/0124751
Compositions and Methods for Rapidly Removing Overfilled Substrates
Novel Light Emitting Layers for Led Devices Based on High Tg Polymer Matrix Compositions
Xenon Recovery System
Compositions comprising tannic acid as corrosion inhibitor
Application:
11/000,147 →
Publication:
US 2006/0116313
Method and Apparatus for Utilizing a Sequence Interpreter Approach to Control Logic of a Programmable Logic Controller
Precursors for Silica or Metal Silicate Films
Low Defectivity Product Slurry for Cmp and Associated Production Method
Patent:
6,979,252 →
Application:
11/030,503 →
Bicine/tricine containing composition and method for chemical-mechanical planarization
Application:
11/032,593 →
Publication:
US 2005/0194563
Aqueous Based Residue Removers Comprising Fluoride
Organometallic Complexes and Their Use as Precursors to Deposit Metal Films
Patent:
7,064,224 →
Application:
11/051,140 →
Preparation of metal silicon nitride films via cyclic deposition
Application:
11/057,446 →
Publication:
US 2006/0182885
Compositions for Preparing Low Dielectric Materials Containing Solvents
Application:
11/060,371 →
Publication:
US 2005/0196974
Alkaline post-chemical mechanical planarization cleaning compositions
Application:
11/065,080 →
Publication:
US 2005/0205835
Method for removing a residue from a chamber
Application:
11/070,994 →
Publication:
US 2006/0196525
Aerosol Misted Deposition of Low Dielectric Organosilicate Films
Method for removing a substance from a substrate using electron attachment
Application:
11/095,580 →
Publication:
US 2005/0241671
Chemical-mechanical planarization composition having PVNO and associated method for use
Application:
11/101,815 →
Publication:
US 2005/0215183
Cabinet for Chemical Delivery with Solvent Purging and Removal
Volatile Metal Beta-Ketoiminate and Metal Beta-Diiminate Complexes
Volatile Metal Beta-Ketoiminate Complexes
Patent:
7,034,169 →
Application:
11/111,455 →
Enhanced Purge Effect in Gas Conduit
Precursors for Cvd Silicon Carbo-Nitride and Silicon Nitride Films
Polishing Method to Reduce Dishing of Tungsten on a Dielectric
Aqueous Stripping and Cleaning Composition
Method for cleaning a process chamber
Application:
11/140,463 →
Publication:
US 2005/0279382
Composition for Stripping and Cleaning and Use Thereof
Chemical Mechanical Polishing Composition and Process
Ionic Liquid Based Mixtures for Gas Storage and Delivery
Chemical-Mechanical Planarization Composition Having Benzenesulfonic Acid and Per-Compound Oxidizing Agents, and Associated Method for Use
Porous Low Dielectric Constant Compositions and Methods for Making and Using Same
Composition and Associated Method for Catalyzing Removal Rates of Dielectric Films During Chemical Mechanical Planarization
Aqueous Cleaning Composition and Method for Using Same
Aqueous cleaning composition for removing residues and method using same
Free Radical-Forming Activator Attached to Solid and Used to Enhance Cmp Formulations
Method for Depositing Zinc Oxide at Low Temperatures and Products Formed Thereby
Selective etching of titanium nitride with xenon difluoride
Application:
11/285,056 →
Publication:
US 2007/0117396
Semiconductor Cleaning Solution
Aqueous Based Residue Removers Comprising Fluoride
Ph Buffered Aqueous Cleaning Composition and Method for Removing Photoresist Residue
System and Method Comprising Same for Measurement and/or Analysis of Particles in Gas Stream
Cleaning Formulations
Application:
11/342,414 →
Publication:
US 2007/0179072
Method for defining a feature on a substrate
Application:
11/350,322 →
Publication:
US 2006/0183055
Seal Installation Tool
Self-Contained Distillation Purifier/Superheater for Liquid-Fill Product Container and Delivery Systems
Low-dishing composition and method for chemical-mechanical planarization with branched-alkylphenol-substituted benzotriazole
Application:
11/374,714 →
Publication:
US 2006/0213868
Dihydroxy Enol Compounds Used in Chemical Mechanical Polishing Compositions Having Metal Ion Oxidizers
Turbomolecular pump system for gas separation
Application:
11/395,409 →
Publication:
US 2007/0227357
Dual-Flow Valve and Internal Processing Vessel Isolation System
Cleaning of contaminated articles by aqueous supercritical oxidation
Application:
11/403,749 →
Publication:
US 2007/0240740
Free Radical-Forming Activator Attached to Solid and Used to Enhance Cmp Formulations
Analysis of a reactive gas such as silane for particle generating impurities
Application:
11/430,614 →
Publication:
US 2007/0261559
Compositions Substrate for Removing Etching Residue and Use Thereof
Contact Methods for Formation of Lewis Gas/Liquid Systems and Recovery of Lewis Gas Therefrom
Process for Producing Silicon Oxide Films from Organoaminosilane Precursors
Process for Separating Components of a Multi-Component Feed Stream
Composition for Removal of Residue Comprising Cationic Salts and Methods Using Same
Compositions for Preparing Low Dielectric Materials
Compositions for Preparing Low Dielectric Materials
Stabilizers to Inhibit the Polymerization of Substituted Cyclotetrasiloxane
Surface Modified Colloidal Abrasives, Including Stable Bimetallic Surface Coated Silica Sols for Chemical Mechanical Planarization
Component Heater
Additives to Prevent Degradation of Alkyl-Hydrogen Siloxanes
Chemical-Mechanical Planarization Composition Having Ketooxime Compounds and Associated Method for Use
Cmp Composition of Boron Surface-Modified Abrasive and Nitro-Substituted Sulfonic Acid and Method of Use
Precursors for Depositing Silicon Containing Films
Stabilization of Nitrogen-Containing and Oxygen-Containing Organosilanes Using Weakly Basic Ion-Exchange Resins
Stabilizer-Fenton's reaction metal-vinyl pyridine polymer-surface-modified chemical mechanical planarization composition and associated method
Application:
11/516,002 →
Publication:
US 2007/0075042
Hybrid Process for Depositing Electrochromic Coating
Process Solutions Containing Surfactants Used as Post-Chemical Mechanical Planarization Treatment
Process Solutions Containing Surfactants
Process solutions containing surfactants
Application:
11/520,983 →
Publication:
US 2007/0010412
Ti, Ta, Hf, Zr and Related Metal Silicon Amides for Ald/Cvd of Metal-Silicon Nitrides, Oxides or Oxynitrides
Electro-Optic Display and Materials for Use Therein
Leak Containment Apparatus for Reactive Gases
Method and Composition for Restoring Dielectric Properties of Porous Dielectric Materials
Formulation for Removal of Photoresist, Etch Residue and Barc
Method and slurry for reducing corrosion on tungsten during chemical mechanical polishing
Application:
11/643,307 →
Publication:
US 2008/0149591
Compositions for chemical mechanical planarization of copper
Application:
11/643,309 →
Publication:
US 2008/0148652
Method and slurry for tuning low-k versus copper removal rates during chemical mechanical polishing
Application:
11/643,519 →
Publication:
US 2008/0149884
Cleaning Composition for Semiconductor Substrates
Method and Apparatus for Achieving Maximum Yield in the Electrolytic Preparation of Group Iv and V Hydrides
Synthesis of Pentahalosulfur Peroxides and Monoxides
Patent:
7,416,717 →
Application:
11/688,324 →
Materials and Methods of Forming Controlled Void
Method for Immobilizing Ligands and Organometallic Compounds on Silica Surface, and Their Application in Chemical Mechanical Planarization
Method for removal of flux and other residue in dense fluid systems
Application:
11/702,317 →
Publication:
US 2007/0137675
Preparation of organic compounds bearing a trifluoromethyl group on a quaternary carbon
Application:
11/702,742 →
Publication:
US 2008/0188689
Top coat for lithography processes
Application:
11/706,243 →
Publication:
US 2007/0196773
Metal Complexes of Polydentate Beta-Ketoiminates
Methods for Depositing Metal Films Onto Diffusion Barrier Layers by Cvd or Ald Processes
Composition and Method for Photoresist Removal
Photoimprintable Low Dielectric Constant Material and Method for Making and Using Same
Application:
11/740,410 →
Publication:
US 2008/0264672
Wick Systems for Complexed Gas Technology
Semiconductor Manufacture Employing Isopropanol Drying
Application:
11/752,606 →
Publication:
US 2008/0289660
Thin Film Transistors with Poly(Arylene Ether) Polymers as Gate Dielectrics and Passivation Layers
Method Of Purifying Organosilicon Compositions Used As Precursors In Chemical Vapor Desposition
Application:
11/753,073 →
Publication:
US 2008/0188679
Low-Impurity Organosilicon Product As Precursor For CVD
Application:
11/753,153 →
Publication:
US 2007/0287849
High Flow GaCl3 Delivery
Application:
11/756,091 →
Publication:
US 2008/0018004
Protection of Industrial Equipment from Network Storms Emanating from a Network System
Oxopentafluorosulfanyl-Substituted Alicyclic Compounds
Application:
11/761,447 →
Publication:
US 2008/0312464
Curing Dielectric Films Under A Reducing Atmosphere
Application:
11/764,485 →
Publication:
US 2007/0299239
Electro-Optic Displays, and Materials for Use Therein
Low Temperature Sol-Gel Silicates As Dielectrics or Planarization Layers For Thin Film Transistors
Application:
11/773,570 →
Publication:
US 2008/0012074
Fluoride-Modified Silica Sols for Chemical Mechanical Planarization
Soft Insert Gasket
Solid Source Container With Inlet Plenum
Stripper Containing an Acetal or Ketal for Removing Post-Etched Photo-Resist, Etch Polymer and Residue
Application:
11/868,469 →
Publication:
US 2008/0096785
Stabilizers To Inhibit The Polymerization of Substituted Cyclotetrasiloxane
Application:
11/872,221 →
Publication:
US 2008/0042105
Splashguard and Inlet Diffuser for High Vacuum, High Flow Bubbler Vessel
Methods For Depositing Metal Films On Diffusion Barrier Layers By CVD Processes
Application:
11/939,224 →
Publication:
US 2008/0075855
Process Solutions Containing Surfactants
Application:
11/940,374 →
Publication:
US 2008/0063984
Deposition Of Metal Films On Diffusion Layers By Atomic Layer Deposition And Organometallic Precursor Complexes Therefor
Application:
11/941,157 →
Publication:
US 2009/0130466
Organosilane Compounds for Modifying Dielectrical Properties of Silicon Oxide and Silicon Nitride Films
Application:
11/941,532 →
Publication:
US 2008/0124946
Devices and Methods for Performing Inspections, Repairs, and/or Other Operations Within Vessels
Vessels With Personnel Access Provisions
Metal Complexes of Tridentate Beta-Ketoiminates
Cyclic Chemical Vapor Deposition of Metal-Silicon Containing Films
Divided Electrochemical Cell and Low Cost High Purity Hydride Gas Production Process
Application:
11/961,396 →
Publication:
US 2009/0159454
Quaternary Trifluoromethylcyclohexane Derivatives for Liquid Crystals
Activated Chemical Process for Enhancing Material Properties of Dielectric Films
Plasma Enhanced Cyclic Chemical Vapor Deposition of Silicon-Containing Films
Application:
12/030,186 →
Publication:
US 2008/0207007
Stabilizers for the Stabilization of Unsaturated Hydrocarbon-Based Precursor
Semi-Aqueous Stripping and Cleaning Composition Containing Aminobenzenesulfonic Acid
Process for Removing Contaminant from a Surface and Composition Useful Therefor Description
Metal Precursor Solutions For Chemical Vapor Deposition
Application:
12/058,200 →
Publication:
US 2008/0254218
Tellurium (Te) Precursors for Making Phase Change Memory Materials
Group 2 Metal Precursors For Depositing Multi-Component Metal Oxide Films
Application:
12/113,397 →
Publication:
US 2008/0286464
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
Application:
12/115,087 →
Publication:
US 2008/0268177
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
Low Temperature Thermal Conductive Inks
Stabilizers for the Stabilization of Unsaturated Hydrocarbon-based Precursor
Process for Selectively Depositing Copper Thin Films on Substrates with Copper and Ruthenium Areas via Vapor Deposition
Plasma enhanced cyclic deposition method of metal silicon nitride film
Application:
12/157,631 →
Publication:
US 2008/0318443
Removal of Trace Arsenic Impurities from Triethylphosphate (Tepo)
Precursors for Depositing Silicon-Containing Films and Methods for Making and Using Same
Method for Chemical Mechanical Planarization of Chalcogenide Materials
Materials for Adhesion Enhancement of Copper Film on Diffusion Barriers
Method for Chemical Mechanical Planarization of Chalcogenide Materials
Method for Chemical Mechanical Planarization of A Metal-containing Substrate
Application:
12/195,840 →
Publication:
US 2009/0061630
Compositions and Methods for Rapidly Removing Overfilled Substrates
Cyclopentene As A Precursor For Carbon-Based Films
Application:
12/211,197 →
Publication:
US 2009/0087796
Composition and method used for chemical mechanical planarization of metals
Application:
12/213,141 →
Publication:
US 2008/0254629
Free radical-forming activator attached to solid and used to enhance CMP formulations
Application:
12/232,712 →
Publication:
US 2009/0029553
Method for Forming Through-base Wafer Vias in Fabrication of Stacked Devices
Application:
12/242,002 →
Publication:
US 2010/0081279
Antireflective Coatings
Application:
12/244,426 →
Publication:
US 2009/0096106
Antireflective Coatings for Photovoltaic Applications
Metal Complexes of Tridentate Beta-Ketoiminates
Preparation of A Metal-containing Film Via ALD or CVD Processes
Application:
12/255,128 →
Publication:
US 2009/0130414
Polishing Slurry for Copper Films
Copper Precursors for Thin Film Deposition
Mechanical Enhancement of Dense and Porous Organosilicate Materials by Uv Exposure
Group 2 Metal Precursors for Depositing Multi-Component Metal Oxide Films
Group 2 Metal Precursors For Deposition Of Group 2 Metal Oxide Films
Application:
12/266,806 →
Publication:
US 2010/0119726
Precursors for Cvd Silicon Carbo-Nitride Films
Tellurium Precursors for Gst Films in an Ald or Cvd Process
Compositions for Removing Residue from a Substrate and Use Thereof
Patent:
42,128 →
Application:
12/321,730 →
Electro-Optic Display and Materials for Use Therein
Dihydroxy Enol Compounds Used in Chemical Mechanical Polishing Compositions Having Metal Ion Oxidizers
Antimony Precursors for Gst Films in Ald/Cvd Processes
Selective Etching and Formation of Xenon Difluoride
Electrically Conductive Films Formed from Dispersions Comprising Polythiophenes and Ether Containing Polymers
Stripper for Dry Film Removal
Stripper For Copper/Low k BEOL Clean
Application:
12/400,332 →
Publication:
US 2009/0229629
Adhesion to Copper and Copper Electromigration Resistance
Splashguard for High Flow Vacuum Bubbler Vessel
Preparation of Metal Oxide Thin Film via Cyclic Cvd or Ald
Chemical-Mechanical Planarization Composition Having Benzenesulfonic Acid and Per-Compound Oxidizing Agents, and Associated Method for Use
Free Radical-Forming Activator Attached to Solid and Used to Enhance CMP Formulations
Application:
12/419,625 →
Publication:
US 2009/0250656
Binary and Ternary Metal Chalcogenide Materials and Method of Making and Using Same
Compositions for Chemical-Mechanical Planarization of Noble-Metal-Featured Substrates, Associated Methods, and Substrates Produced by Such Methods
Method and Composition for Post-CMP Cleaning of Copper Interconnects Comprising Noble Metal Barrier Layers
Application:
12/437,045 →
Publication:
US 2009/0291873
Cross Purge Valve and Container Assembly
Process Stability of Nbde Using Substituted Phenol Stabilizers
Fixture Drying Apparatus and Method
Low Temperature Deposition of Silicon-Containing Films
Aminosilanes for Shallow Trench Isolation Films
Ionic Liquid Based Mixtures for Gas Storage and Delivery
Process for Inhibiting Corrosion and Removing Contaminant from a Surface During Wafer Dicing and Composition Useful Therefor
Selective Etching of Silicon Dioxide Compositions
High Coordination Sphere Group 2 Metal B-Diketiminate Precursors
Compositions for Preparing Low Dielectric Materials Containing Solvents
Application:
12/538,510 →
Publication:
US 2009/0298671
Process for Restoring Dielectric Properties
Process and System for Providing Acetylene
Method for Removal of Carbon From An Organosilicate Material
Application:
12/575,772 →
Publication:
US 2010/0151206
Amino Vinylsilane Precursors for Stressed SiN Films
Volatile Group 2 Metal 1,3,5-Triazapentadienate Compounds
Application:
12/613,952 →
Publication:
US 2010/0130779
Dielectric Barrier Deposition Using Oxygen Containing Precursor
Wet Clean Compositions for Cowp and Porous Dielectrics
Precursors for Depositing Group 4 Metal-Containing Films
Combination, Method, and Composition for Chemical Mechanical Planarization of A Tungsten-Containing Substrate
Method and Composition for Chemical Mechanical Planarization of a Metal
Method and Composition for Chemical Mechanical Planarization of a Metal or a Metal Alloy
Method for Preparing Metal Complexes of Polydentate Beta-Ketoiminates
Dielectric Films Comprising Silicon and Methods for Making Same
Chemical vapor deposition method
Method for Making a Chlorosilane
Recovery of NF3 from Adsorption Operation
Dielectric Barrier Deposition Using Nitrogen Containing Precursor
Volatile Group 2 Metal Precursors
Formulations and Method for Post-Cmp Cleaning
Semi-Aqueous Stripping and Cleaning Formulation for Metal Substrate and Methods for Using Same
Process Solutions Containing Surfactants
Water-Rich Stripping and Cleaning Formulation and Method for Using Same
Liquid Composition Containing Aminoether for Deposition of Metal-Containing Films
Additives to Silane for Thin Film Silicon Photovoltaic Devices
Electrodes for Electrolytic Germane Process
Method and Composition for Chemical Mechanical Planarization of a Metal-Containing Substrate
Method for Exposing Through-Base Wafer Vias for Fabrication of Stacked Devices
Application:
12/888,872 →
Publication:
US 2011/0237079
Aqueous Buffered Fluoride-Containing Etch Residue Removers and Cleaners
Application:
12/893,639 →
Publication:
US 2011/0015108
Process for Separating Components of a Multi-Component Feed Stream
Application:
12/900,530 →
Publication:
US 2011/0247979
Group 4 Metal Precursors for Metal-Containing Films
Methods for Deposition of Group 4 Metal Containing Films
Application:
12/904,461 →
Publication:
US 2011/0256314
Liquid Precursor for Depositing Group 4 Metal Containing Films
Process Solutions Containing Surfactants
Application:
12/959,067 →
Publication:
US 2011/0171583
Method for Forming Through-Base Wafer Vias for Fabrication of Stacked Devices
Solvent Free Aqueous Polyurethane Dispersions and Methods of Making and Using the Same
Methods for Depositing Silicon Dioxide or Silicon Oxide Films Using Aminovinylsilanes
Method for Chemical Mechanical Planarization of a Copper-Containing Substrate
Low K Precursors Providing Superior Integration Attributes
Process for Producing Silicon and Oxide Films from Organoaminosilane Precursors
Electrolytic Apparatus, System and Method for the Safe Production of Nitrogen Trifluoride
Method and Equipment for Selectively Collecting Process Effluent
Method for Chemical Mechanical Planarization of a Tungsten-Containing Substrate
Methods to Prepare Silicon-Containing Films
Volatile Imidazoles and Group 2 Imidazole Based Metal Precursors
Method of Making a Multicomponent Film
Amidate Precursors For Depositing Metal Containing Films
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
Precursors for Cvd Silicon Carbo-Nitride Films
Method and Slurry for Tuning Low-K Versus Copper Removal Rates During Chemical Mechanical Polishing
Application:
13/052,457 →
Publication:
US 2011/0165777
Polymeric Compositions Comprising Per(Phenylethynyl) Arene Derivatives
Cylinder Surface Treated Container For Monochlorosilane
System for Performing Inspections, Repairs, and/or Other Operations Within Vessels
Stabilizers for the Stabilization of Unsaturated Hydrocarbon-Based Precursor
Organoaminosilane Precursors and Methods for Depositing Films Comprising Same
Complexes Of Imidazole Ligands
Chemical Mechanical Planarization Composition And Method With Low Corrosiveness
Binary and Ternary Metal Chalcogenide Materials and Method of Making and Using Same
Method for Wafer Dicing and Composition Useful Thereof
Multidentate Ketoimine Ligands for Metal Complexes
Low-Impurity Organosilicon Product as Precursor for Cvd
Method and Apparatus for Achieving Maximum Yield in the Electrolytic Preparation of Group IV and V Hydrides
Composition for Stripping and Cleaning and Use Thereof
Recovering of Xenon by Adsorption Process
Solenoid Bypass for Continuous Operation of Pneumatic Valve
Aminosilanes and Methods for Making Same
Application:
13/251,684 →
Publication:
US 2012/0277457
Methods For Using Porogens For Low K Porous Organosilica Glass Films
Compositions and Methods for Texturing of Silicon Wafers
Application:
13/296,836 →
Publication:
US 2012/0295447
Metal-Enolate Precursors For Depositing Metal-Containing Films
Application:
13/299,448 →
Publication:
US 2013/0011579
Cmp Slurry/Method for Polishing Ruthenium and Other Films
Novel Metal Complexes for Metal-Containing Film Deposition
Splashguard For High Flow Vacuum Bubbler Vessel
Solenoid Bypass System for Continuous Operation of Pneumatic Valve
Fluorine Based Chamber Clean With Nitrogen Trifluoride Backup
Application:
13/353,729 →
Publication:
US 2013/0017644
Process and System for Providing Acetylene
Group IV Metal Complexes For Metal-Containing Film Deposition
Complexes Of Imidazole Ligands
Plasma Enhanced Cyclic Chemical Vapor Deposition of Silicon- Containing Films
Cleaning Formulations and Method of Using the Cleaning Formulations
Metal-Enolate Precursors For Depositing Metal-Containing Films
Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films with Low Dielectric Constants
Method of Making a Multicomponent Film
Organoaminosilane Precursors and Methods for Making and Using Same
Compositions and Methods for Texturing of Silicon Wafers
Application:
13/475,632 →
Publication:
US 2013/0130508
Method and Composition for Chemical Mechanical Planarization of a Metal-Containing Substrate
Application:
13/529,503 →
Publication:
US 2013/0153820
Method and Composition for Chemical Mechanical Planarization of a Metal or a Metal Alloy
Composition for Removing Photoresist and/or Etching Residue From a Substrate and Use Thereof
Application:
13/562,993 →
Publication:
US 2012/0295828
Precursors for GST Films in ALD/CVD Processes
Application:
13/572,973 →
Publication:
US 2013/0210217
Precursors for Photovoltaic Passivation
Application:
13/595,419 →
Publication:
US 2013/0220410
Oxygen Containing Precursors for Photovoltaic Passivation
Application:
13/610,311 →
Publication:
US 2013/0247971
Methods for Depositing Silicon Carbo-Nitride Film
Halogenated Organoaminosilane Precursors and Methods for Depositing Films Comprising Same
Low Temperature Deposition of Silicon-Containing Films
Low-Impurity Organosilicon Product as Precursor for Cvd
Divided Electrochemical Cell and Low Cost High Purity Hydride Gas Production Process
Application:
13/721,608 →
Publication:
US 2014/0008240
Catalyst and Formulations Comprising Same for Alkoxysilanes Hydrolysis Reaction in Semiconductor Process
Alkoxyaminosilane Compounds and Applications Thereof
Materials and Methods of Forming Controlled Void
Silicon Precursors and Compositions Comprising Same for Depositing Low Dielectric Constant Films
Application:
13/773,931 →
Publication:
US 2013/0260575
Method and Composition for Chemical Mechanical Planarization of a Metal
Catalyst Synthesis for Organosilane Sol-Gel Reactions
Application:
13/795,636 →
Publication:
US 2013/0243968
Chemical Mechanical Polishing Composition Having Chemical Additives and Methods for Using Same
Onsite Ultra High Purity Chemicals or Gas Purification
Group 2 Imidazolate Formulations for Direct Liquid Injection
Application:
13/848,808 →
Publication:
US 2013/0260025
High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films
Anodes for the Electrolytic Production of Nitrogen Trifluoride and Fluorine
Application:
13/859,263 →
Publication:
US 2014/0110267
Vessel with Filter
Methods for Depositing Films with Organoaminodisilane Precursors
Organoaminodisilane Precursors and Methods for Depositing Films Comprising Same
Method and Apparatus for Removing Contaminants from Nitrogen Trifluoride
Application:
13/913,069 →
Publication:
US 2013/0341178
Chemical Mechanical Polishing Slurry Compositions and Method Using the Same for Copper and Through-Silicon Via Applications
Combination, Method, and Composition for Chemical Mechanical Planarization of a Tungsten-Containing Substrate
Method for Removal of Carbon from an Organosilicate Material
Application:
13/936,557 →
Publication:
US 2013/0295334
Water-Rich Stripping and Cleaning Formulation and Method for Using Same
Methods of Forming Non-Oxygen Containing Silicon-Based Films
Process for Producing Silicon and Oxide Films from Organoaminosilane Precursors
Cleaning Formulations
Chemical Mechanical Polishing (Cmp) Composition for Shallow Trench Isolation (Sti) Applications and Methods of Making Thereof
Method of Making a Multicomponent Film
Application:
14/032,985 →
Publication:
US 2014/0024173
Stripping and Cleaning Compositions for Removal of Thick Film Resist
Application:
14/043,330 →
Publication:
US 2014/0100151
Anodes for the Electrolytic Production of Nitrogen Trifluoride and Fluorine
Application:
14/046,261 →
Publication:
US 2014/0110269
Barrier Chemical Mechanical Planarization Composition and Method Thereof
Application:
14/051,969 →
Publication:
US 2015/0104940
Amino Vinylsilane Precursors for Stressed SiN Films
Application:
14/070,957 →
Publication:
US 2014/0065844
Alkoxysilylamine Compounds and Applications Thereof
Cleaning Lead-Frames to Improve Wirebonding Process
Application:
14/113,350 →
Compositions and Processes for Depositing Carbon-Doped Silicon-Containing Films
Chemical Mechanical Planarization for Tungsten-Containing Substrates
Application:
14/142,087 →
Publication:
US 2014/0273458
System and Method for Tungsten Hexafluoride Recovery and Reuse
Application:
14/149,318 →
Publication:
US 2014/0196664
Ultrasonic Liquid Level Sensing Systems
Ultrasonic Liquid Level Sensing Systems
Volatile Imidazoles and Group 2 Imidazole Based Metal Precursors
Application:
14/191,730 →
Publication:
US 2014/0242795
Methods to Prepare Silicon-Containing Films
Method for Wafer Dicing and Composition Useful Thereof
Dielectric Films Comprising Silicon And Methods For Making Same
Application:
14/204,577 →
Publication:
US 2014/0183706
Splashguard and Inlet Diffuser for High Vacuum, High Flow Bubbler Vessel
Application:
14/205,601 →
Publication:
US 2014/0193578
Splashguard and Inlet Diffuser for High Vacuum, High Flow Bubbler Vessel
Slurry Supply and/or Chemical Blend Supply Apparatuses, Processes, Methods of Use and Methods of Manufacture
Metal Compound Coated Colloidal Particles Process for Making and Use Therefor
Application:
14/224,839 →
Publication:
US 2014/0315386
Method of Making a Multicomponent Film
Low K Precursors Providing Superior Integration Attributes
Process for Making Trisilylamine
Organoaminosilane Precursors and Methods for Making and Using Same
Aza-Polysilane Precursors and Methods for Depositing Films Comprising Same
Process for Recovery and Purification of Nitrous Oxide
Materials and Methods of Forming Controlled Void
Volatile Dihydropyrazinly and Dihydropyrazine Metal Complexes
Compositions and Methods for Making Silicon Containing Films
Barrier Materials for Display Devices
Compositions and Methods Using Same for Flowable Oxide Deposition
Purification of Nitrogen Trifluoride By Pressure Swing Adsorption
Chemical Mechanical Polishing (CMP) Composition for Shallow Trench Isolation (STI) Applications and Methods of Making Thereof
Organoaminosilane Precursors and Methods for Depositing Films Comprising Same
Methods for Depositing Silicon Nitride Films
System and Method for Xenon Recovery
Barrier Chemical Mechanical Planarization Composition and Method Thereof
Organoaminodisilane Precursors and Methods for Depositing Films Comprising Same
CMP Slurry/Method for Polishing Ruthenium and Other Films
Composition for Titanium Nitride Hard Mask and Etch Residue Removal
Electrolytic Apparatus, System and Method for the Efficient Production of Nitrogen Trifluoride
System and Method for Gas Recovery and Reuse
Precursors for CVD Silicon Carbo-Nitride Films
Chemical Mechanical Polishing Slurry Compositions and Method Using the Same for Copper and Through-Silicon Via Applications
Precursors For GST Films In ALD/CVD Processes
Application:
14/603,878 →
Publication:
US 2015/0140790
Organoaminosilanes and Methods for Making Same
Titanium Nitride Hard Mask and Etch Residue Removal
Patent:
9,222,018 →
Application:
14/642,831 →
Compositions and Methods for the Deposition of Silicon Oxide Films
Application:
14/661,652 →
Publication:
US 2015/0275355
Chemical Mechanical Polishing (Cmp) Composition for Shallow Trench Isolation (Sti) Applications and Methods of Making Thereof
Alkyl-Alkoxysilacyclic Compounds
Diptube Design for a Host Ampoule
Copper Corrosion Inhibition System
Chemical Mechanical Polishing (CMP) of Colbalt-Containing Substrate
Method and Composition for Providing Pore Sealing Layer on Porous Low Dielectric Constant Films
Application:
14/820,982 →
Publication:
US 2016/0049293
Divided Electrochemical Cell and Low Cost High Purity Hydride Gas Production Process
Ultrasonic Liquid Level Sensing Systems
Method and Precursors for Manufacturing 3D Devices
Chemical Mechanical Polishing Slurry for Reducing Corrosion and Method of Use Therefor
Application:
14/884,104 →
Publication:
US 2016/0122590
Silicon-Based Films and Methods of Forming the Same
Alkoxyaminosilane Compounds and Applications Thereof
Method of Making a Multicomponent Film
Onsite Ultra High Purity Chemicals or Gas Purification
Composition and Method Used for Chemical Mechanical Planarization of Metals
Organoaminosilanes and Methods for Making Same
Vessels with Personnel Access Provisions
Semi-Aqueous Photoresist or Semiconductor Manufacturing Residue Stripping and Cleaning Composition with Improved Silicon Passivation
Stripping Compositions Having High WN/W Etching Selectivity
Etchant Solutions and Method of Use Thereof
Composite Abrasive Particles For Chemical Mechanical Planarization Composition and Method of Use Thereof
Low Dishing Copper Chemical Mechanical Planarization
Process for Making Trisilylamine
Dishing Reducing in Tungsten Chemical Mechanical Polishing
Bisaminoalkoxysilane Compounds and Methods for Using Same to Deposit Silicon-Containing Films
Stripping and Cleaning Compositions for Removal of Thick Film Resist
Application:
15/018,564 →
Publication:
US 2016/0152930
Chemical Mechanical Polishing (Cmp) Composition for Shallow Trench Isolation (Sti) Applications and Methods of Making Thereof
Metal Compound Chemically Anchored Colloidal Particles and Methods of Production and Use Thereof
Methods for Depositing Films with Organoaminodisilane Precursors
Selectively Removing Titanium Nitride Hard Mask and Etch Residue Removal
Boron-Containing Compounds, Compositions, and Methods for the Deposition of a Boron Containing Films
Ultrasonic Liquid Level Sensing Systems
Composition for Treating Surface of Substrate, Method and Device
Vessel and Method for Delivery of Precursor Materials
High Purity Tungsten Hexachloride and Method for Making Same
Tin Hard Mask and Etch Residual Removal
Container for Chemical Precursors in a Deposition Process
Barrier Chemical Mechanical Planarization Slurries Using Ceria-Coated Silica Abrasives
Composite Abrasive Particles for Chemical Mechanical Planarization Composition and Method of Use Thereof
Methods For Depositing Group 13 Metal or Metalloid Nitride Films
Photoresist Cleaning Composition Used in Photolithography and a Method for Treating Substrate Therewith
Compositions and Processes for Depositing Carbon-Doped Silicon-Containing Films
High Temperature Atomic Layer Deposition Of Silicon Oxide Thin Films
Cleaning Formulations
Stop-On Silicon Containing Layer Additive
Etching Compositions and Methods for Using Same
Vessel With Filter
Application:
15/419,395 →
Publication:
US 2017/0137936
Plasma Etch with Trifluoroacetic Acid and Derivatives
Application:
60/006,890 →
Argon Recovery from Silicon Crystal Furnace
Application:
60/012,439 →
Gas Dissolution Under Pressure
Application:
60/021,676 →
Chemical Mechanical Polishing Composition and Process
Application:
60/023,299 →
Method for Purification of Citric Acid and Ammonium Citrate for Use in Semiconductor Processing
Application:
60/032,588 →
Purification, Analysis and Deposition of Titanium Amides
Application:
60/157,866 →
Volatile precursors for copper CVD
Application:
60/194,285 →
Multiple contents reservoir container for ultrapure solvent purging
Application:
60/213,092 →
Multiple contents reservoir container for ultrapure solvent purging
Application:
60/215,796 →
Gel-free colloidal abrasive polishing compositions
Application:
60/329,482 →
Deposition of a porous insulating film with a dielectric constant of 2.5 or below
Application:
60/373,104 →
Apparatus and method of research for creating and testing thin films
Application:
60/384,258 →
Composition and associated method for oxide chemical mechanical planarization
Application:
60/432,358 →
Composition and method used for chemical mechanical planarization of metals
Application:
60/437,826 →
Precursors for depositing silicon containing films and processes thereof
Application:
60/442,183 →
Mechanical enhancer additives for low dielectric films
Application:
60/474,266 →
Periodic acid compositions for polishing noble metal/high K substrates
Application:
60/494,954 →
Periodic acid compositions for polishing ruthenium substrates
Application:
60/494,955 →
Method and apparatus for the delivery of solid materials
Application:
60/496,187 →
Removal of transition metal containing barrier materials from a substrate
Application:
60/507,224 →
Alumina abrasive for chemical mechanical polishing
Application:
60/514,020 →
Poly(arylene ether) polymer with low temperature or UV crosslinking grafts and dielectric comprising the same
Application:
60/516,565 →
Silicon thin film transistors and solar cells on plastic substrates
Application:
60/519,507 →
Alumina abrasive for chemical mechanical polishing
Application:
60/526,107 →
Cleaning CVD chambers following deposition of porogen-containing materials
Application:
60/538,832 →
Compositions for preparing low dielectric materials containing improved solvents
Application:
60/549,251 →
Alkaline post-CMP cleaning solution
Application:
60/554,638 →
Polishing method to reduce dishing of tungsten on a dielectric
Application:
60/572,127 →
Composition and method comprising same for removing residue from a substrate
Application:
60/580,001 →
Method for characterizing porous low dielectric constant films
Application:
60/583,924 →
Composition for stripping and cleaning and use thereof
Application:
60/584,733 →
Method and apparatus for the delivery of solid materials
Application:
60/587,295 →
Method for removing carbon-containing residues from a substrate
Application:
60/590,628 →
Low defectivity product slurry for CMP and associated production method
Application:
60/600,315 →
Porous low dielectric constant compositions and methods for making and using same
Application:
60/613,937 →
Volatile copper(I) beta-ketoiminate complexes
Application:
60/640,338 →
Composition and associated method for catalyzing removal rates of dielectric films during chemical mechanical planarization
Application:
60/642,225 →
System and method comprising same for measurement and/or analysis of particles in gas stream
Application:
60/649,490 →
Method for defining a feature on a substrate
Application:
60/652,875 →
Low-dishing composition and method for chemical-mechanical planarization with branched-alkylphenol-substituted benzotriazole
Application:
60/664,338 →
High-stability composition and method for chemical-mechanical planarization with low potential for metal contamination/defectivity
Application:
60/664,930 →
Dual-flow valve and internal processing vessel isolation system
Application:
60/672,290 →
Dihydroxy enol compounds used in chemical mechanical polishing compositions having metal ion oxidizers
Application:
60/674,678 →
Composition for removal of residue comprising cationic salts and methods using same
Application:
60/693,205 →
Chemical-mechanical planarization composition having ketooxime compounds and associated method for use
Application:
60/711,241 →
CMP composition of boron surface-modified abrasive and nitro-substituted sulfonic acid and method of use
Application:
60/712,773 →
System and method for reducing particle formation in a gas feed stream during pressure reduction
Application:
60/723,619 →
Stabilizer-Fenton's reaction metal-vinyl pyridine polymer-surface-modified chemical mechanical planarization composition and associated method
Application:
60/723,822 →
Ti, Ta, Hf, Zr and related metal silicon amides for ALD/CVD of metal-silicon nitrides, oxides or oxynitrides
Application:
60/724,757 →
Top coat for lithography processes
Application:
60/776,610 →
Method and apparatus for achieving maximum yield in the electrolytic preparation of group IV and V and hydrides
Application:
60/791,840 →
Fluoride-modified silica sols for chemical mechanical planarization
Application:
60/792,629 →
Materials and methods of forming controlled voids
Application:
60/792,793 →
Metal complexes of polydentate beta-ketoiminates
Application:
60/794,820 →
Composition and method for photoresist removal
Application:
60/809,085 →
Diethylsilane as a silicon source in the deposition of metal silicate films
Application:
60/809,255 →
Thin film transistors with poly(arylene ether) polymers as gate dielectrics and passivation layers
Application:
60/810,534 →
High flow GaCI3 delivery
Application:
60/812,560 →
DEMS product as precursor for CVD
Application:
60/813,087 →
Curing dielectric films under a reducing atmosphere
Application:
60/816,896 →
Low temperature sol-gel silicates as dielectrics or planarization layers in thin film transistors
Application:
60/831,161 →
Stripper containing an acetal or ketal for removing post-etched photo-resist, etch polymer and residue
Application:
60/852,758 →
Solid source container with inlet plenum
Application:
60/853,014 →
Use of organosilane compounds to modify silicon oxide, nitride or carbide films
Application:
60/861,327 →
Cyclic chemical vapor deposition of metal-silicon containing films
Application:
60/874,653 →
Splashguard for high vacuum, high flow bubbler vessel
Application:
60/875,200 →
Volatile liquid copper precursors for thin film applications
Application:
60/878,027 →
Activated Chemical Process for Enhancing Material Properties of Dielectric Films
Application:
60/890,137 →
Method of purifying organosilicon compositions used as precursors in chemical vapor deposition
Application:
60/899,458 →
Quaternary trifluoromethylcyclohexane derivatives for liquid crystals
Application:
60/899,679 →
Plasma enhanced cyclic chemical vapor deposition of silicon nitride
Application:
60/903,734 →
Inlet Diffuser for High Vacuum, High Flow Bubbler Vessel
Application:
60/908,376 →
Metal Precursor Solutions For Chemical Vapor Deposition
Application:
60/911,970 →
Tellurium (Te) Precursors for Making Phase Change Memory Materials
Application:
60/913,798 →
Strontium and Barium Precursors For Depositing Barium, Strontium Titanate Films
Application:
60/938,233 →
Low Temperature Thermal Conductive Inks
Application:
60/942,007 →
Process For Forming Continuous Copper Thin Films Via Vapor Deposition
Application:
60/945,415 →
Process For Forming Continuous Copper Thin Films Via Vapor Deposition
Application:
60/945,748 →
Reverse Shallow Trench Isolation Process
Application:
60/956,232 →
Method and Composition For Chemical Mechanical Planarization of Chalcogenide Materials
Application:
60/968,916 →
Method and Composition For Chemical Mechanical Planarization of Copper
Application:
60/968,920 →
Method and Composition For Chemical Mechanical Planarization of Chalcogenide Materials
Application:
60/968,924 →
Cyclopentene as a Precursor for Carbon-Based Films
Application:
60/975,683 →
Antireflective Coatings
Application:
60/979,585 →
Copper Precursors For Thin Film Deposition
Application:
60/985,428 →
Preparation of A Metal-Containing Film Via ALD or CVD Processes
Application:
60/986,469 →
Tellurium Precursors for GST Films In An ALD or CVD Process
Application:
60/990,386 →
Stabilizers for the Stabilization of Unsaturated Hydrocarbon-based Precursor
Application:
61/015,028 →
Methods for in-Situ Chamber Cleaning Process for High Volume Manufacture or Semiconductor Materials
Application:
61/015,498 →
Antimony Precursors for GST Films in ALD Process
Application:
61/023,989 →
Stripper For Dry Film Removal
Application:
61/034,592 →
Stripper For Copper/Low-k BEOL Clean
Application:
61/036,707 →
Gas Phase Process to Improve Adhesion to Copper and Copper Electromigration Resistance
Application:
61/038,874 →
Preparation of Metal Oxide Thin Film Via Cyclic CVD or ALD
Application:
61/044,270 →
Formation of Binary and Ternary Metal Chalcogenide Materials and the Application Process for Phase Change Memory
Application:
61/051,403 →
Method and Composition For Post-CMP Cleaning of Copper Interconnects Comprising Noble Metal Barrier Layers
Application:
61/055,288 →
Process Stability of NBDE Using Substituted Phenol Stabilizers
Application:
61/056,734 →
Fixture Drying Procedure and Apparatus
Application:
61/056,755 →
Method of Forming Silicon Nitride or Silicon Oxynitride at Low Temperature
Application:
61/057,891 →
Low Temperature Deposition of Silicon-Containing Films
Application:
61/058,374 →
Adhesion to Copper and Copper Electromigration Resistance
Application:
61/074,843 →
Aminosilanes For Shallow Trench Isolation Films
Application:
61/080,058 →
Process for Inhibiting Corrosion and Removing Contaminant from a Surface During Wafer Dicing and Composition Useful Therefor
Application:
61/080,474 →
High Coordination Sphere Group 2 Metal B-Diketiminate Precursors
Application:
61/086,341 →
Polymeric Compositions Comprising Per(Phenylethynyl) Arene Derivatives
Application:
61/088,176 →
Process For Restoring Dielectric Constant
Application:
61/089,654 →
Cross Purge Valve and Container Assembly
Application:
61/091,155 →
Selective Etching of Silicon Dioxide Compositions
Application:
61/092,916 →
Process and System for Providing Acetylene
Application:
61/097,352 →
Amino Vinylsilane Precursors for Stressed SiN Films
Application:
61/113,624 →
Volatile Group 2 Metal 1,3,5-Triazapentadienate Compounds
Application:
61/116,653 →
Dielectric Barrier Deposition Using Oxygen Containing Precursor
Application:
61/118,769 →
Precursors for Depositing Group 4 Metal-Containing Films
Application:
61/121,336 →
Method for Removal of Carbon From An Organosilicate Material
Application:
61/121,666 →
Wet Clean Compositions for CoWP and Porous Dielectrics
Application:
61/138,244 →
Combination, Method, and Composition for Chemical Mechanical Planarization of A Tungsten-Containing Substrate
Application:
61/140,216 →
Method and Composition for Chemical Mechanical Planarization of A Metal
Application:
61/141,310 →
Method and Composition for Chemical Mechanical Planarization of A Metal or A Metal Alloy
Application:
61/141,706 →
Method for Preparing Metal Complexes of Polydentate Beta-Ketoiminates
Application:
61/159,237 →
Dielectric Films Comprising Silicon and Methods for Making Same
Application:
61/159,939 →
Chemical Vapor Deposition Method
Application:
61/162,947 →
Method for Making A Chlorosilane
Application:
61/169,414 →
Dielectric Barrier Deposition Using Nitrogen Containing Precursor
Application:
61/177,821 →
Volatile Group 2 Metal Precursors
Application:
61/182,186 →
Method of Forming Strontium Titanate Films
Application:
61/183,889 →
Surface Charge Modifiers in Cleaning Chemistries
Application:
61/223,526 →
Semi-Aqueous Stripping and Cleaning Formulation for Metal Substrate and Methods for Using Same
Application:
61/231,393 →
Water-Rich Stripping and Cleaning Formulation and Method for Using Same
Application:
61/238,268 →
Liquid Composition Containing Aminoether For Deposition of Metal-Containing Films
Application:
61/240,359 →
Liquid Composition Containing Aminoether For Deposition of Metal-Containing Films
Application:
61/240,436 →
Additives to Silane to Improve DEP Rate and Absorber Film Quality for Thin Film Silicon PV
Application:
61/241,466 →
Method and Composition for Chemical Mechanical Planarization of a Metal-Containing Substrate
Application:
61/245,312 →
Method for Exposing Through-Base Wafer Vias For Fabrication of Stacked Devices
Application:
61/247,104 →
Method for Exposing Through-Base Wafer Vias For Fabrication of Stacked Devices
Application:
61/247,149 →
Group 4 Metal Precursors Containing Ketoester and/or Ketoamide Ligands for Deposition of Group 4 Metal-Containing Films
Application:
61/254,253 →
Liquid Precursor for Depositing Group 4 Metal-Containing Films
Application:
61/267,102 →
Method for Forming Through-Base Wafer Vias For Fabrication of Stacked Devices
Application:
61/286,099 →
Solvent Free Aqueous Polyurethane Dispersions and Methods of Making and Using the Same
Application:
61/286,211 →
Method for Chemical Mechanical Planarization of A Copper-Containing Substrate
Application:
61/288,895 →
Low K Precursors Providing Integration Damage Resistance
Application:
61/289,490 →
Method and Equipment for Selectively Collecting Process Effluent
Application:
61/298,949 →
Methods to Prepare Silicon-Containing Films
Application:
61/301,375 →
Volatile Imidazoles and Group 2 Imidazole Based Metal Precursors
Application:
61/301,824 →
Method for chemical mechanical planarization of a tungsten-containing substrate
Application:
61/304,574 →
Method of Making A Multicomponent Film
Application:
61/307,222 →
Amidate Ligand Precursors For Depositing Metal Containing Films
Application:
61/307,962 →
Organoaminosilane Precursors and Methods for Depositing Films Comprising Same
Application:
61/350,750 →
Cylinder Surface Treatment for Monochlorosilane
Application:
61/353,870 →
Imidazolate Metal And Metalloid Complexes
Application:
61/354,023 →
Chemical Mechanical Planarization Composition and Method with Low Corrosiveness
Application:
61/358,309 →
Method for Wafer Dicing and Composition Useful Thereof
Application:
61/362,896 →
Low K Precursors Providing Integration Damage Resistance
Application:
61/366,671 →
Volatile Imidazoles and Group 2 Imidazole Based Metal Precursors
Application:
61/369,448 →
Multidentate Ketoimine Ligands for Metal Complexes
Application:
61/370,924 →
Recovering of Xenon by Adsorption Process
Application:
61/388,279 →
Aminosilanes and Methods for Making Same
Application:
61/392,180 →
Compositions and Methods for Texturing of Silicon Wafers
Application:
61/416,998 →
Metal-Enolate Precursors for Depositing Metal-Containing Films
Application:
61/418,055 →
CMP Slurry/Method for Polishing Ruthenium and Other Films
Application:
61/427,857 →
Novel Metal Complexes for Metal-Containing Film Deposition
Application:
61/436,000 →
Method for Recovering High-Value Components from Waste Gas Streams
Application:
61/440,176 →
Group IV Metal Complexes for Metal-Containing Film Deposition
Application:
61/440,469 →
Fluorine Based Chamber Clean With Nitrogen Trifluoride Backup
Application:
61/444,353 →
Cleaning Formulations
Application:
61/453,282 →
Cleaning Lead-Frames to Improve Wirebonding Process
Application:
61/478,582 →
Organoaminosilane Precursors and Methods for Making and Using Same
Application:
61/489,486 →
Process For Carbon-Doped Silicon-Containing Films And Formulations Therefor
Application:
61/493,031 →
Compositions and Methods for Texturing of Silicon Wafers
Application:
61/530,760 →
Precursors for Photovoltaic Passivation
Application:
61/531,749 →
Oxygen Containing Precursors for Photovoltaic Passivation
Application:
61/536,748 →
Halogenated Organoaminosilane Precursors and Methods for Depositing Films Comprising Same
Application:
61/539,717 →
Catalyst for Alkoxysilanes Hydrolysis Reaction in Semiconductor Process
Application:
61/587,388 →
Novel Alkoxyaminosilane Compounds and Applications Thereof
Application:
61/591,318 →
Low Temperature Silicon Containing Films
Application:
61/608,955 →
Barrier Materials For Display Devices
Application:
61/609,045 →
Catalyst Synthesis for Organosilane Sol-Gel Reactions
Application:
61/611,808 →
Silicon Precursors and Compositions Comprising Same For Depositing Low Dielectric Constant Films
Application:
61/616,628 →
Silicon Precursors and Compositions Comprising Same For Depositing Low Dielectric Constant Films
Application:
61/617,351 →
Group 2 Imidazolate Formulations for Direct Liquid Injection
Application:
61/618,019 →
High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films
Application:
61/623,217 →
Chemical Mechanical Polishing Composition Having Chemical Additives and Methods for Using Same
Application:
61/645,222 →
Vessel With Filter
Application:
61/652,236 →
Organoaminodisilane Precursors and Methods for Depositing Films Comprising Same
Application:
61/654,508 →
Method and Apparatus for Removing Contaminants
Application:
61/662,698 →
Non-Oxygen Containing Silicon-Based Films and Methods of Forming the Same
Application:
61/677,267 →
Catalyst for Alkoxysilanes Hydrolysis Reaction in Semiconductor Process
Application:
61/706,809 →
Chemical Mechanical Polishing Composition Having Chemical Additives and Methods for Using Same
Application:
61/710,252 →
Stripping and Cleaning Compositions for Removal of Thick Film Resist
Application:
61/710,901 →
Anodes for the Electrolytic Production of Nitrogen Trifluoride and Fluorine
Application:
61/716,259 →
Chemical Polishing Composition for Shallow Trench Isolation (STI) Applications and Methods of Making Thereof
Application:
61/716,471 →
Cleaning Formulations
Application:
61/717,152 →
Slurry Supply Apparatus, Methods of Use and Methods of Manufacture
Application:
61/725,863 →
Tris(alkoxysilyl)amine Compounds and Application Thereof
Application:
61/735,793 →
System and Method for Tungsten Hexafluoride Recovery and Reuse
Application:
61/753,635 →
Vessel With Filter
Application:
61/764,851 →
Chemical Mechanical Planarization for Tungsten-Containing Substrates
Application:
61/777,165 →
Anodes for the Electrolytic Production of Nitrogen Trifluoride and Fluorine
Application:
61/790,810 →
Slurry Supply Apparatus, Methods of Use and Methods of Manufacture
Application:
61/802,950 →
Method of Making a Multicomponent Film
Application:
61/810,919 →
Metal Compound Coated Colloidal Particals Process for Making and Use Therefor
Application:
61/813,950 →
Cleaning Formulations
Application:
61/817,134 →
Ultrasonic Liquid Level Sensing Systems
Application:
61/823,625 →
Aza-Polysilane Precursors and Methods for Depositing Films Comprising Same
Application:
61/839,536 →
Process for Making Trisilylamine
Application:
61/840,940 →
Stripping and Cleaning Compositions for Removal of Thick Film Resist
Application:
61/841,596 →
Volatile dihydropyrazinly and dihydropyrazine metal complexes
Application:
61/858,799 →
Slurry Supply Apparatus, Methods of Use and Methods of Manufacture
Application:
61/861,739 →
Compositions and Methods Using Same for Flowable Oxide Deposition
Application:
61/868,632 →
Organoaminosilane Precursors and Methods for Depositing Films Comprising Same
Application:
61/880,261 →
System and Method for Xenon Recovery
Application:
61/886,383 →
Methods for Depositing Silicon Nitride Films
Application:
61/886,406 →
Slurry Supply and/or Chemical Blend Supply Apparatuses, Methods of Use and Methods of Manufacture
Application:
61/899,560 →
Titanium Nitride Hard Mask and Etch Residue Removal
Application:
61/918,943 →
System and Method for Gas Recovery and Reuse
Application:
61/926,649 →
Electrolytic Apparatus, System and Method for the Efficient Production of Nitrogen Trifluoride
Application:
61/944,911 →
Organoaminosilanes and Methods for Making Same
Application:
61/946,164 →
Low Temperature Atomic Layer Deposition of Silicon Oxide Thin Films
Application:
61/970,602 →
Use Of Alkyl-Alkoxysilacyclic Compounds As A Structure-Forming Precursors To Provide Porous Organosilica Glass Films With Low Dielectric Constants
Application:
62/012,724 →
Diptube Design for a Host Ampoule
Application:
62/016,367 →
Copper Corrosion Inhibition System
Application:
62/024,046 →
Titanium Nitride Hard Mask and Etch Residue Removal
Application:
62/028,539 →
Chemical Mechanical Polishing (CMP) of Colbalt-Containing Substrate
Application:
62/029,145 →
Pore Sealing Processes for Porous Ultra Low-K Dielectric Pdems
Application:
62/037,392 →
Ultrasonic Liquid Level Sensing Systems
Application:
62/043,668 →
Slurry Supply Apparatus and Method
Application:
62/061,538 →
Compositions and Methods Using Same for Flowable Oxide Chemical Vapor Deposition
Application:
62/068,248 →
Chemical Mechanical Polishing Slurry for Reducing Corrosion and Method of Use Therefor
Application:
62/073,636 →
Silicon-Based Films and Methods of Forming the Same
Application:
62/074,219 →
Valve Block Having Minimal Deadleg
Application:
62/080,281 →
Ultrasonic Liquid Level Sensing Systems
Application:
62/081,266 →
Semi-Aqueous Photoresist or Semiconductor Manufacturing Residue Stripping and Cleaning Composition with Improved Silicon Passivation
Application:
62/095,857 →
Etchant Solutions and Method of Use Thereof
Application:
62/097,408 →
Stripping Compositions Having High WN/W Etching Selectivity
Application:
62/097,647 →
Composite Abrasive Particles for Chemical Mechanical Planarization Composition and Method of Use Thereof
Application:
62/102,319 →
Method and Precursors for Manufacturing 3D Devices
Application:
62/109,381 →
Compositions and Methods Using Same for Carbon Doped Silicon Oxide
Application:
62/113,024 →
Dishing Reducing in Tungsten Chemical Mechanical Polishing
Application:
62/115,264 →
Bis(Organoamino)Alkoxysilane Compounds and Applications Thereof
Application:
62/115,729 →
Methods for Depositing Organosilicate Glass Films for Use as Resistive Random Access Memory
Application:
62/130,251 →
Solid State Catalyst for Chemical Mechanical Planarization
Application:
62/136,706 →
Boron-Containing Compounds, Compositions, and Methods for the Deposition of a Boron Containing Films
Application:
62/140,570 →
Cleaning Formulations
Application:
62/140,751 →
Selectively Removing Titanium Nitride Hard Mask and Etch Residue Removal
Application:
62/140,846 →
Method of Treating Surface of Patterned Substrate
Application:
62/141,657 →
Compositions and Methods Using Same for Carbon Doped Silicon Oxide
Application:
62/142,546 →
High Purity Tungsten Hexachloride and Method for Making Same
Application:
62/149,155 →
Vessel and Method for Delivery of Precursor Materials
Application:
62/149,548 →
Low Dishing Cu CMP Slurries
Application:
62/153,213 →
Composition for TiN Hard Mask and Etch Residue Removal
Application:
62/155,794 →
Container for Chemical Precursors in a Deposition Process
Application:
62/160,933 →
TiN Hard Mask and Etch Residue Removal
Application:
62/164,293 →
Barrier Cmp Slurries Using Ceria-Coated Silica Abrasives
Application:
62/171,360 →
Halidosilane Compounds and Compositions and Processes for Depositing Silicon-Containing Films Using Same
Application:
62/180,382 →
Halidosilane Compounds and Compositions and Processes for Depositing Silicon-Containing Films Using Same
Application:
62/181,494 →
Method and Precursors for Manufacturing 3D Devices
Application:
62/183,985 →
Methods for Depositing Group 13 Metal or Metalloid Nitride Films
Application:
62/196,494 →
Methods for Depositing Silicon Nitride Films
Application:
62/199,593 →
Photoresist Cleaning Composition Used in Photolithography and a Method For Treating Substrate therewith
Application:
62/201,352 →
Methods for Depositing a Conformal Group 13-Doped Metal or Metalloid Silicon Nitride Film
Application:
62/217,296 →
Composite Abrasive Particles for Chemical Mechanical Planarization Composition and Method of Use Thereof
Application:
62/221,379 →
Cleaning Formulations
Application:
62/222,259 →
Stop-On-Nitride Additive
Application:
62/233,251 →
Methods for Depositing a Conformal Metal or Metalloid Silicon Nitride Film
Application:
62/237,899 →
Etching Compositions and Methods for Using Same
Application:
62/259,870 →
Compositions and Methods Using Same for Deposition of Silicon-Containing Film
Application:
62/270,259 →
High Temperature Atomic Layer Deposition of Silicon-Containing Films
Application:
62/280,886 →
TiN Hard Mask and Etch Residue Removal
Application:
62/281,658 →
Chemical Mechanical Planarization of Silicon Containing Materials
Application:
62/286,606 →
Compositions and Methods Using Same for Deposition of Silicon-Containing Film
Application:
62/300,312 →
Etching Compositions and Methods for Using Same
Application:
62/300,382 →
Composite Particles, Method of Refining and Use Thereof
Application:
62/316,089 →
Delivery Container with Flow Distributor
Application:
62/335,396 →
Chemical Mechanical Polishing (CMP) of Cobalt-Containing Substrate
Application:
62/350,844 →
Additives for Barrier Chemical Mechanical Planarization
Application:
62/357,571 →
High Purity Ethylenediamine for Semiconductor Applications
Application:
62/364,959 →
Compositions and Methods Using Same for Carbon Doped Silicon Containing Films
Application:
62/367,260 →
Precursors And Flowable CVD Methods For Making Low-K Films To Fill Surface Features
Application:
62/381,222 →
Compositions and Methods for the Deposition of Silicon Oxide Films
Application:
62/396,410 →
Compositions and Methods for the Deposition of Silicon Oxide Films
Application:
62/408,167 →
Precursors and Flowable CVD Methods for Making Low-K Films to Fill Surface Features Features
Application:
62/415,756 →
Use of Sillyl Bridged Alkyl Compounds for Dense OSG Films
Application:
62/416,302 →
Compositions and Methods for the Deposition of Silicon Oxide Films
Application:
62/417,619 →