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App. No. 10/198,509 · Confirmation No. 6739

Method for etching high dielectric constant materials and for cleaning deposition chambers for high dielectric constant materials

Expressly Abandoned -- During Examination View Publication ↗
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2004-05-03 LET. Miscellaneous Incoming Letter 1 View
2004-04-02 ABN Abandonment 3 View
2004-04-02 EXIN Examiner Interview Summary Record (PTOL - 413) 2 View
2004-03-23 CTNF Non-Final Rejection 14 View
2004-03-23 1449 List of References cited by applicant and considered by examiner 1 View
2004-03-23 892 List of references cited by examiner 2 View
2004-03-23 FWCLM Index of Claims 1 View
2004-03-23 SRFW Search information including classification, databases and other search related notes 1 View
2004-03-19 SRNT Examiner's search strategy and results 1 View
2004-03-15 SRNT Examiner's search strategy and results 2 View
2002-07-18 TRNA Transmittal of New Application 3 View
2002-07-18 SPEC Specification 17 View
2002-07-18 CLM Claims 4 View
2002-07-18 ABST Abstract 1 View
2002-07-18 DRW Drawings-only black and white line drawings 1 View
2002-07-18 OATH Oath or Declaration filed 4 View
2002-07-18 WFEE Fee Worksheet (SB06) 1 View
2002-07-18 WFEE Fee Worksheet (SB06) 1 View
2002-07-18 IDS Information Disclosure Statement (IDS) Form (SB08) 1 View
2002-07-18 FOR Foreign Reference 56 View
2002-07-18 FOR Foreign Reference 72 View
2002-07-18 FOR Foreign Reference 44 View
2002-07-18 FOR Foreign Reference 28 View
2002-07-18 FOR Foreign Reference 36 View
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Quick Facts
App. No.
10/198,509
Filed
2002-07-18
Pub. No.
US20040014327A1
Art Unit
1763