Granted Patent
Utility
US 6,303,514 · App. 09/652,416
Composition and method for selectively etching a silicon nitride film
Inventors:
Thomas Burkley Hackett, Zach Hatcher, III
Patented Case
View Patent ↗
Granted: Oct 16, 2001
Filed: Aug 31, 2000
Inventors
Thomas Burkley Hackett
Zach Hatcher, III
Assignee (at issue)
Ashland, Inc.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.