Method and composition for chemical mechanical planarization of a metal or a metal alloy
View Patent ↗A composition and associated method for chemical mechanical planarization of a metal-containing substrate (e.g., a copper substrate) are described herein which afford high and tunable rates of metal removal as well as low dishing and erosion levels during CMP processing.
1. A method for chemical mechanical planarization of a surface having at least one feature thereon comprising a metal or a metal alloy, said method comprising the steps of:
A) placing a substrate having the surface having the at least one feature thereon comprising the metal or the metal alloy in contact with a polishing pad;
B) delivering a polishing composition to the surface comprising:
a) an abrasive;
b) a naphthalene imide derivative; and
c) an oxidizing agent; and
C) polishing the substrate with the polishing composition
wherein the naphthalene imide derivative comprises at least one selected from the group consisting of
Type 1 naphthalene imide derivative having the following formula:
where substituents R, X, R′, R″, and R″′ are independently from a hydrogen atom, a linear, branched, or cyclic alkyl group comprising from 1 to 20 carbon atoms, an alkoxy group, alkoxy, an alkyl thioether group, a cyano group, a carboxylic acid group, a carboxylic ester group, an ethylene glycol radical, an amino acid group, and an imine group;
Type 2 naphthalene imide derivative having the following formula:
where substituents R, X, R′, and R″ are independently from a hydrogen atom, a linear, branched, or cyclic alkyl group comprising from 1 to 20 carbon atoms, an alkoxy group, alkoxy, an alkyl thioether group, a cyano group, a carboxylic acid group, a carboxylic ester group, an ethylene glycol radical, an amino acid group, and an imine group;
and
Type 3 naphthalene imide derivative having the following formula:
where substituents R, X, and R′ are independently from a hydrogen atom, a linear, branched, or cyclic alkyl group comprising from 1 to 20 carbon atoms, an alkoxy group, alkoxy, an alkyl thioether group, a cyano group, a carboxylic acid group, a carboxylic ester group, an ethylene glycol radical, an amino acid group, and an imine group.
2. The method of claim 1 wherein the naphthalene imide derivate comprises the Type 1 naphthalene derivative having the following formula:
where substituents R, X, R′, R″, and R″′ are independently from a hydrogen atom, a linear, branched, or cyclic alkyl group comprising from 1 to 20 carbon atoms, an alkoxy group, alkoxy, an alkyl thioether group, a cyano group, a carboxylic acid group, a carboxylic ester group, an ethylene glycol radical, an amino acid group, and an imine group.
3. The method of claim 1 wherein the naphthalene imide derivate comprises the Type 2 naphthalene derivative having the following formula:
where substituents R, X, R′, and R″ are independently from a hydrogen atom, a linear, branched, or cyclic alkyl group comprising from 1 to 20 carbon atoms, an alkoxy group, alkoxy, an alkyl thioether group, a cyano group, a carboxylic acid group, a carboxylic ester group, an ethylene glycol radical, an amino acid group, and an imine group.
4. The method of claim 1 wherein the naphthalene imide derivated comprises the Type 3 naphthalene derivative having the following formula:
where substituents R, X, and R′ are independently from a hydrogen atom, a linear, branched, or cyclic alkyl group comprising from 1 to 20 carbon atoms, an alkoxy group, alkoxy, an alkyl thioether group, a cyano group, a carboxylic acid group, a carboxylic ester group, an ethylene glycol radical, an amino acid group, and an imine group.
5. A polishing composition comprising:
a) an abrasive;
b) a naphthalene imide derivative; and
c) an oxidizing agent.
wherein the naphthalene imide derivative is selected from the group consisting of
Type 1 naphthalene imide derivative having the following formula:
where substituents R, X, R′, R″, and R″′ are independently from a hydrogen atom, a linear, branched, or cyclic alkyl group comprising from 1 to 20 carbon atoms, an alkoxy group, alkoxy, an alkyl thioether group, a cyano group, a carboxylic acid group, a carboxylic ester group, an ethylene glycol radical, an amino acid group, and an imine group;
Type 2 naphthalene imide derivative having the following formula:
where substituents R, X, R′, and R″ are independently from a hydrogen atom, a linear, branched, or cyclic alkyl group comprising from 1 to 20 carbon atoms, an alkoxy group, alkoxy, an alkyl thioether group, a cyano group, a carboxylic acid group, a carboxylic ester group, an ethylene glycol radical, an amino acid group, and an imine group;
and
Type 3 naphthalene imide derivative having the following formula:
where substituents R, X, and R′ are independently from a hydrogen atom, a linear, branched, or cyclic alkyl group comprising from 1 to 20 carbon atoms, an alkoxy group, alkoxy, an alkyl thioether group, a cyano group, a carboxylic acid group, a carboxylic ester group, an ethylene glycol radical, an amino acid group, and an imine group.
6. The polishing composition of claim 5 wherein the naphthalene imide derivate comprises the Type 1 naphthalene derivative having the following formula:
where substituents R, X, R′, R″, and R″′ are independently from a hydrogen atom, a linear, branched, or cyclic alkyl group comprising from 1 to 20 carbon atoms, an alkoxy group, alkoxy, an alkyl thioether group, a cyano group, a carboxylic acid group, a carboxylic ester group, an ethylene glycol radical, an amino acid group, and an imine group.
7. The polishing composition of claim 5 wherein the naphthalene imide derivate comprises the Type 2 naphthalene derivative having the following formula:
where substituents R, X, R′, and R″ are independently from a hydrogen atom, a linear, branched, or cyclic alkyl group comprising from 1 to 20 carbon atoms, an alkoxy group, alkoxy, an alkyl thioether group, a cyano group, a carboxylic acid group, a carboxylic ester group, an ethylene glycol radical, an amino acid group, and an imine group.
8. The method of claim 5 wherein the naphthalene imide derivate comprises the Type 3 naphthalene derivative having the following formula:
where substituents R, X, and R′ are independently from a hydrogen atom, a linear, branched, or cyclic alkyl group comprising from 1 to 20 carbon atoms, an alkoxy group, alkoxy, an alkyl thioether group, a cyano group, a carboxylic acid group, a carboxylic ester group, an ethylene glycol radical, an amino acid group, and an imine group.